4-(2-Ferrocenylethenyl)-phenyl-POSS Fc-CH=CH-C6H6-(C5H9)7Si8O12 (FEPS, Fc: ferrocene), containing metal and C=C double bond, was firstly synthesized as a mixture of E/Z isomers by the Wittig reaction. The chemi...4-(2-Ferrocenylethenyl)-phenyl-POSS Fc-CH=CH-C6H6-(C5H9)7Si8O12 (FEPS, Fc: ferrocene), containing metal and C=C double bond, was firstly synthesized as a mixture of E/Z isomers by the Wittig reaction. The chemical structure of FEPS was characterized by FTIR, ^1H-, ^13C and ^29Si- NMR.展开更多
Polyvinylcarbazole(PVK) composites containing organic-inorganic hybrid polyhedral oligomeric silse-squioxane(POSS) PVK-POSS were prepared by free radical polymerization. POSS monomers reacted with vinylcarbazole a...Polyvinylcarbazole(PVK) composites containing organic-inorganic hybrid polyhedral oligomeric silse-squioxane(POSS) PVK-POSS were prepared by free radical polymerization. POSS monomers reacted with vinylcarbazole and were completely dispersed at molecular level in PVK matrix and PVK-POSS nanocomposites display higher glass transition temperature(Tg) in comparison with neat PVK. Optical properties of PVK/POSS nanocomposites were investigated by UV-spectrum and PL-spectrum and the results show that the PVK-POSS nanoparticles have a good interface effect and improve color purity effectively. The maximum absorption wavelength bathochromically shifts gradually with the increasing of the content of POSS. The luminescent intensity becomes higher and higher with the increase of POSS content, and reaches its maximum luminescent intensity when the POSS content is 3% (mass fraction), while some POSS-rich nanoparticles are present in matrix when contents of POSS are beyond 5%.展开更多
Octa(aminophenyl)silsesquioxane (OAPS) was prepared from octaphenyl silsesquioxane (OPS) in two steps, first nitration to obtain Octa(nitrophenyl)silsesquioxane (ONPS) then reduction by using the stable, inexpensive, ...Octa(aminophenyl)silsesquioxane (OAPS) was prepared from octaphenyl silsesquioxane (OPS) in two steps, first nitration to obtain Octa(nitrophenyl)silsesquioxane (ONPS) then reduction by using the stable, inexpensive, and readily available hydrazine hydrate as the reducing agent in the presence of Iron(III)Chloride catalyst with a yield of around 87%. Hydrazine is a two-electron reducing agent whereas nitro group is a four-electron reduction process. The activated carbon serves as an adsorbent and electrical conductor enabling the reaction to occur by acting as a mediator between a two-electron reagent and a four-electron process. Adsorption provides a reducing potential and a supply of electrons from many hydrazines making possible the initial four-electron process even though each individual hydrazine is a two-electron donor. The product was characterized by FTIR and 1H NMR. The time period for preparation of ONPS from octaphenyl silsesquioxane was considerably shortened to avoid double nitration of the aromatic rings.展开更多
The synthesis of T_8, T_ 10 and T_ 12 silsesquioxane cages from a range of starting materials: phenyl-cis-tetrol, 1,3-divinyltetraethoxydisiloxane and cyclopentyl T resins by using tetra n-butylammonium fluoride(TBA...The synthesis of T_8, T_ 10 and T_ 12 silsesquioxane cages from a range of starting materials: phenyl-cis-tetrol, 1,3-divinyltetraethoxydisiloxane and cyclopentyl T resins by using tetra n-butylammonium fluoride(TBAF) as the catalyst is described in this paper. The reaction yields obtained viathe current route are better compared to those viathe literature routes. Some of the cage compounds have been characterized by X-ray crystallography.展开更多
The flame-retarded polycarbonate(PC) has been made with octaphenyl polyhedral silsesquioxane(OPS) and/or caged bicyclic phosphate(Trimer).Thermal gravimetric analysis(TGA),Fourier-transform infrared(FTIR),TG...The flame-retarded polycarbonate(PC) has been made with octaphenyl polyhedral silsesquioxane(OPS) and/or caged bicyclic phosphate(Trimer).Thermal gravimetric analysis(TGA),Fourier-transform infrared(FTIR),TGA-FTIR,limiting oxygen index(LOI),and mechanical tests have been employed to characterize the modified PC.The additives of OPS and Trimer in PC have been proved to be effective flame-retardants because of the synergistic interaction between the elements of P and Si.The role of OPS and Trimer in PC degradation are different:OPS participates in the charring of PC,while Trimer makes PC degrade in advance.In addition,OPS and Trimer induced obvious differences in the mechanical properties of PC.展开更多
A novel poly(methyl methacrylate-co-polyhedral oligomeric silsesquioxane) hybrid nanocomposite was synthesized by free radical polymerization and characterized by 1H NMR, 29Si NMR, and TGA technologies. Compared wit...A novel poly(methyl methacrylate-co-polyhedral oligomeric silsesquioxane) hybrid nanocomposite was synthesized by free radical polymerization and characterized by 1H NMR, 29Si NMR, and TGA technologies. Compared with PMMA homopolymer, the nanocomposite has better thermal stability.展开更多
Layer-by-layer (LBL) self-assembly method was used to fabricate siliceous ultrathin films by using polyhedral oligomeric silsesquioxanes as building blocks. Ammonium salt of octasilsesquioxane acid (OSi8) and poly(dia...Layer-by-layer (LBL) self-assembly method was used to fabricate siliceous ultrathin films by using polyhedral oligomeric silsesquioxanes as building blocks. Ammonium salt of octasilsesquioxane acid (OSi8) and poly(diallyldimethylammonium chloride) (PDDA) were alternately assembled onto CaF2 slide to form nanocomposite multilayers. Linear build-up of the LBL films was confirmed by UV-Vis spectroscopy. IR spectrum suggests existence of OSi8 and PDDA in the LBL films. Atomic force microscopic surface topography of the LBL films indicates the OSi8 covers the entire surface of the topmost layer and shows a granular morphology.展开更多
Organic-inorganic hybrid</span><b> </b><span style="font-family:Verdana;">network polymers have been synthesized by addition reaction of a thiol-functionalized random type silsesquiox...Organic-inorganic hybrid</span><b> </b><span style="font-family:Verdana;">network polymers have been synthesized by addition reaction of a thiol-functionalized random type silsesquioxane (SQ109) and alkyl diacrylate or diisocyanate compounds. Thiol-ene reaction of SQ109 and 1,4-butanediol diacrylate (BDA) successfully yield porous polymer in toluene initiated by azobis</span></span><span style="font-family:Verdana;">(</span><span style="font-family:Verdana;">isobutyronitrile</span><span style="font-family:Verdana;">)</span><span style="font-family:Verdana;"> (AIBN) at 60</span><span style="font-family:Verdana;">°</span><span style="font-family:Verdana;">C. Morphology of the porous polymers was composed by connected globules, and the diameter of the globules decreased with increasing in the monomer concentration </span><span style="font-family:Verdana;">of</span><span style="font-family:Verdana;"> the reaction </span><span style="font-family:Verdana;">system</span><span style="font-family:""><span style="font-family:Verdana;">. By contrast, the reaction with 1,6-hexanediol diacrylate or </span><span style="font-family:Verdana;">1,5-hexadiene yielded homogeneous clear gels. Thermal analyses of SQ109-BDA</span><span style="font-family:Verdana;"> porous polymers indicated that thermal degradation of ester groups of BDA in the polymer network occurred at around 300</span></span><span style="font-family:Verdana;">°</span><span style="font-family:Verdana;">C. The porous polymer was also obtained </span><span style="font-family:Verdana;">by</span><span style="font-family:Verdana;"> the reaction </span><span style="font-family:Verdana;">using</span><span style="font-family:""><span style="font-family:Verdana;"> a photo-initiator (Irugacure184) at room temperature, and showed higher Young’s modulus than the corresponding porous polymer obtained with the reaction with AIBN due to the small size of </span><span style="font-family:Verdana;">the globules. Young’s modulus of SQ109-BDA porous polymer increased</span><span style="font-family:Verdana;"> with </span><span style="font-family:Verdana;">increasing in the monomer concentration </span></span><span style="font-family:Verdana;">of</span><span style="font-family:Verdana;"> the reaction systems. Thioliso</span><span style="font-family:""><span style="font-family:Verdana;">cyanate addition reactions between SQ109 </span><span style="font-family:Verdana;">and hexamethylene diisocyanate (HDI) or methylenediphenyl 4,4’-diisocyanate</span><span style="font-family:Verdana;"> (MDI) were investigated to obtain network polymers. The reactions in toluene yielded the corresponding homogeneous clear gels. By contrast the reactions in a mixed solvent of toluene (50 vol.%) and </span><i><span style="font-family:Verdana;">N,N</span></i><span style="font-family:Verdana;">-dimethylformamide (50 vol.%) produced porous polymers. The morphology of the porous polymers was composed by connected </span><span style="font-family:Verdana;">globules or aggregated particles. The size of globules and particles in the</span><span style="font-family:Verdana;"> SQ109-HDI porous polymers was larger </span><span style="font-family:Verdana;">than </span></span><span style="font-family:Verdana;">those</span><span style="font-family:Verdana;"> in the SQ109-MDI porous polymers. Thermal degradation of SQ109-HDI and SQ109-MDI porous polymers</span><span style="font-family:Verdana;"> started at round 260</span><span style="font-family:Verdana;">°</span><span style="font-family:""><span style="font-family:Verdana;">C and showed </span><span style="font-family:Verdana;">endothermic peak at around 350</span></span><span style="font-family:Verdana;">°</span><span style="font-family:Verdana;">C derived from degradation of </span><span style="font-family:Verdana;">thio-urethane bond.展开更多
Evaluating the comprehensive characteristics of extreme ultraviolet(EUV)photoresists is crucial for their application in EUV lithography,a key process in modern technology.This paper highlights the capabilities of the...Evaluating the comprehensive characteristics of extreme ultraviolet(EUV)photoresists is crucial for their application in EUV lithography,a key process in modern technology.This paper highlights the capabilities of the Shanghai Synchrotron Radiation Facility(SSRF)08U1B beamline in advancing this field.Specifically,it demonstrates how this beamline can create fringe patterns with a 15-nm half-pitch on a resist using synchrotron-based EUV lithography.This achievement is vital for evaluating EUV photoresists at the advanced 5-nm node.We provide a detailed introduction to the methods and experimental setup used at the SSRF 08U1B beamline to assess an EUV photoresist.A significant part of this research involved the fabrication of high-resolution hydrogen silsesquioxane mask gratings.These gratings,with an aspect ratio of approximately 3,were created using electron beam lithography on an innovative mask framework.This framework was crucial in eliminating the impact of zeroth-order light on interference patterns.The proposed framework propose offers a new approach to mask fabrication,particularly beneficial for achromatic Talbot lithography and multicoherent-beam interference applications.展开更多
基金We gratefully acknowledge the financial support of the National Natural Science Foundation of China(Project No.CN-20374007 and CN-50203002)Key Project of Science and Technology Foundation of Ministry of Education(03023).
文摘4-(2-Ferrocenylethenyl)-phenyl-POSS Fc-CH=CH-C6H6-(C5H9)7Si8O12 (FEPS, Fc: ferrocene), containing metal and C=C double bond, was firstly synthesized as a mixture of E/Z isomers by the Wittig reaction. The chemical structure of FEPS was characterized by FTIR, ^1H-, ^13C and ^29Si- NMR.
基金Beijing Natural Science Foundation(No.2072015)the National High Technology Research and Development Program of China(No.2006AA032563).
文摘Polyvinylcarbazole(PVK) composites containing organic-inorganic hybrid polyhedral oligomeric silse-squioxane(POSS) PVK-POSS were prepared by free radical polymerization. POSS monomers reacted with vinylcarbazole and were completely dispersed at molecular level in PVK matrix and PVK-POSS nanocomposites display higher glass transition temperature(Tg) in comparison with neat PVK. Optical properties of PVK/POSS nanocomposites were investigated by UV-spectrum and PL-spectrum and the results show that the PVK-POSS nanoparticles have a good interface effect and improve color purity effectively. The maximum absorption wavelength bathochromically shifts gradually with the increasing of the content of POSS. The luminescent intensity becomes higher and higher with the increase of POSS content, and reaches its maximum luminescent intensity when the POSS content is 3% (mass fraction), while some POSS-rich nanoparticles are present in matrix when contents of POSS are beyond 5%.
文摘Octa(aminophenyl)silsesquioxane (OAPS) was prepared from octaphenyl silsesquioxane (OPS) in two steps, first nitration to obtain Octa(nitrophenyl)silsesquioxane (ONPS) then reduction by using the stable, inexpensive, and readily available hydrazine hydrate as the reducing agent in the presence of Iron(III)Chloride catalyst with a yield of around 87%. Hydrazine is a two-electron reducing agent whereas nitro group is a four-electron reduction process. The activated carbon serves as an adsorbent and electrical conductor enabling the reaction to occur by acting as a mediator between a two-electron reagent and a four-electron process. Adsorption provides a reducing potential and a supply of electrons from many hydrazines making possible the initial four-electron process even though each individual hydrazine is a two-electron donor. The product was characterized by FTIR and 1H NMR. The time period for preparation of ONPS from octaphenyl silsesquioxane was considerably shortened to avoid double nitration of the aromatic rings.
文摘The synthesis of T_8, T_ 10 and T_ 12 silsesquioxane cages from a range of starting materials: phenyl-cis-tetrol, 1,3-divinyltetraethoxydisiloxane and cyclopentyl T resins by using tetra n-butylammonium fluoride(TBAF) as the catalyst is described in this paper. The reaction yields obtained viathe current route are better compared to those viathe literature routes. Some of the cage compounds have been characterized by X-ray crystallography.
基金Sponsored by the National High Technology Research and Development Program of China("863"Program)(2007AA03Z538)
文摘The flame-retarded polycarbonate(PC) has been made with octaphenyl polyhedral silsesquioxane(OPS) and/or caged bicyclic phosphate(Trimer).Thermal gravimetric analysis(TGA),Fourier-transform infrared(FTIR),TGA-FTIR,limiting oxygen index(LOI),and mechanical tests have been employed to characterize the modified PC.The additives of OPS and Trimer in PC have been proved to be effective flame-retardants because of the synergistic interaction between the elements of P and Si.The role of OPS and Trimer in PC degradation are different:OPS participates in the charring of PC,while Trimer makes PC degrade in advance.In addition,OPS and Trimer induced obvious differences in the mechanical properties of PC.
基金financially supported by the National Natural Science Foundation of China(Nos.50472038 and 90606011)Program for New Century Excellent Talents in University(NCET-04-0588)the Excellent Youth Fund of Anhui Province(No.04044060).
文摘A novel poly(methyl methacrylate-co-polyhedral oligomeric silsesquioxane) hybrid nanocomposite was synthesized by free radical polymerization and characterized by 1H NMR, 29Si NMR, and TGA technologies. Compared with PMMA homopolymer, the nanocomposite has better thermal stability.
文摘Layer-by-layer (LBL) self-assembly method was used to fabricate siliceous ultrathin films by using polyhedral oligomeric silsesquioxanes as building blocks. Ammonium salt of octasilsesquioxane acid (OSi8) and poly(diallyldimethylammonium chloride) (PDDA) were alternately assembled onto CaF2 slide to form nanocomposite multilayers. Linear build-up of the LBL films was confirmed by UV-Vis spectroscopy. IR spectrum suggests existence of OSi8 and PDDA in the LBL films. Atomic force microscopic surface topography of the LBL films indicates the OSi8 covers the entire surface of the topmost layer and shows a granular morphology.
文摘Organic-inorganic hybrid</span><b> </b><span style="font-family:Verdana;">network polymers have been synthesized by addition reaction of a thiol-functionalized random type silsesquioxane (SQ109) and alkyl diacrylate or diisocyanate compounds. Thiol-ene reaction of SQ109 and 1,4-butanediol diacrylate (BDA) successfully yield porous polymer in toluene initiated by azobis</span></span><span style="font-family:Verdana;">(</span><span style="font-family:Verdana;">isobutyronitrile</span><span style="font-family:Verdana;">)</span><span style="font-family:Verdana;"> (AIBN) at 60</span><span style="font-family:Verdana;">°</span><span style="font-family:Verdana;">C. Morphology of the porous polymers was composed by connected globules, and the diameter of the globules decreased with increasing in the monomer concentration </span><span style="font-family:Verdana;">of</span><span style="font-family:Verdana;"> the reaction </span><span style="font-family:Verdana;">system</span><span style="font-family:""><span style="font-family:Verdana;">. By contrast, the reaction with 1,6-hexanediol diacrylate or </span><span style="font-family:Verdana;">1,5-hexadiene yielded homogeneous clear gels. Thermal analyses of SQ109-BDA</span><span style="font-family:Verdana;"> porous polymers indicated that thermal degradation of ester groups of BDA in the polymer network occurred at around 300</span></span><span style="font-family:Verdana;">°</span><span style="font-family:Verdana;">C. The porous polymer was also obtained </span><span style="font-family:Verdana;">by</span><span style="font-family:Verdana;"> the reaction </span><span style="font-family:Verdana;">using</span><span style="font-family:""><span style="font-family:Verdana;"> a photo-initiator (Irugacure184) at room temperature, and showed higher Young’s modulus than the corresponding porous polymer obtained with the reaction with AIBN due to the small size of </span><span style="font-family:Verdana;">the globules. Young’s modulus of SQ109-BDA porous polymer increased</span><span style="font-family:Verdana;"> with </span><span style="font-family:Verdana;">increasing in the monomer concentration </span></span><span style="font-family:Verdana;">of</span><span style="font-family:Verdana;"> the reaction systems. Thioliso</span><span style="font-family:""><span style="font-family:Verdana;">cyanate addition reactions between SQ109 </span><span style="font-family:Verdana;">and hexamethylene diisocyanate (HDI) or methylenediphenyl 4,4’-diisocyanate</span><span style="font-family:Verdana;"> (MDI) were investigated to obtain network polymers. The reactions in toluene yielded the corresponding homogeneous clear gels. By contrast the reactions in a mixed solvent of toluene (50 vol.%) and </span><i><span style="font-family:Verdana;">N,N</span></i><span style="font-family:Verdana;">-dimethylformamide (50 vol.%) produced porous polymers. The morphology of the porous polymers was composed by connected </span><span style="font-family:Verdana;">globules or aggregated particles. The size of globules and particles in the</span><span style="font-family:Verdana;"> SQ109-HDI porous polymers was larger </span><span style="font-family:Verdana;">than </span></span><span style="font-family:Verdana;">those</span><span style="font-family:Verdana;"> in the SQ109-MDI porous polymers. Thermal degradation of SQ109-HDI and SQ109-MDI porous polymers</span><span style="font-family:Verdana;"> started at round 260</span><span style="font-family:Verdana;">°</span><span style="font-family:""><span style="font-family:Verdana;">C and showed </span><span style="font-family:Verdana;">endothermic peak at around 350</span></span><span style="font-family:Verdana;">°</span><span style="font-family:Verdana;">C derived from degradation of </span><span style="font-family:Verdana;">thio-urethane bond.
基金supported by the National Key Research and Development Program of China(Nos.2021YFA1601003,2017YFA0206002,2017YFA0403400)the National Natural Science Foundation of China(No.11775291)。
文摘Evaluating the comprehensive characteristics of extreme ultraviolet(EUV)photoresists is crucial for their application in EUV lithography,a key process in modern technology.This paper highlights the capabilities of the Shanghai Synchrotron Radiation Facility(SSRF)08U1B beamline in advancing this field.Specifically,it demonstrates how this beamline can create fringe patterns with a 15-nm half-pitch on a resist using synchrotron-based EUV lithography.This achievement is vital for evaluating EUV photoresists at the advanced 5-nm node.We provide a detailed introduction to the methods and experimental setup used at the SSRF 08U1B beamline to assess an EUV photoresist.A significant part of this research involved the fabrication of high-resolution hydrogen silsesquioxane mask gratings.These gratings,with an aspect ratio of approximately 3,were created using electron beam lithography on an innovative mask framework.This framework was crucial in eliminating the impact of zeroth-order light on interference patterns.The proposed framework propose offers a new approach to mask fabrication,particularly beneficial for achromatic Talbot lithography and multicoherent-beam interference applications.