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Novel optical lithography using silver superlens
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作者 秦海燕 李璇 申溯 《Chinese Optics Letters》 SCIE EI CAS CSCD 2008年第2期149-151,共3页
This work has demonstrated that with silver superlens, the resolution of conventional optical lithography can be improved significantly. Experimental and simulative results are given to verify the facts that the resol... This work has demonstrated that with silver superlens, the resolution of conventional optical lithography can be improved significantly. Experimental and simulative results are given to verify the facts that the resolution and the pattern fidelity are sensitive to the contact tightness between layers. 展开更多
关键词 PMMA Novel optical lithography using silver superlens very NM
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