Solution-processed n-type organic semiconductor micro/nanocrystals （OSMCs） are fundamental elements for developing low-cost, large-area, and all organic logic/complementary circuits. However, the development of air-...Solution-processed n-type organic semiconductor micro/nanocrystals （OSMCs） are fundamental elements for developing low-cost, large-area, and all organic logic/complementary circuits. However, the development of air-stable, highly aligned n-channel OSMC arrays for realizing high-performance devices lags far behind their p-channel counterparts. Herein, we present a simple one-step slope-coating method for the large-scale, solution-processed fabrication of highly aligned, air-stable, n-channel ribbon-shaped single-crystalline N,N＇-bis（2- phenylethyl）-perylene-3,4：9,10-tetracarboxylic diimide （BPE-PTCDI） arrays. The slope and pattemed photoresist （PR） stripes on the substrate are found to be crucial for the formation of large-area submicron ribbon arrays. The width and thickness of the BPE-PTCDI submicron ribbons can be finely tuned by controlling the solution concentration as well as the slope angle. The resulting BPE-PTCDI submicron ribbon arrays possess an optimum electron mobility up to 2.67 cm2.V-l.s-1 （with an average mobility of 1.13 cm2.V-l-s-1）, which is remarkably higher than that of thin film counterparts and better than the performance reported previously for single-crystalline BPE-PTCDI-based devices. Moreover, the devices exhibit robust air stability and remain stable after exposing in air over 50 days. Our study facilitates the development of air-stable, n-channel organic field-effect transistors （OFETs） and paves the way towards the fabrication of high-performance, organic single crystal-based integrated circuits.展开更多
文摘Solution-processed n-type organic semiconductor micro/nanocrystals （OSMCs） are fundamental elements for developing low-cost, large-area, and all organic logic/complementary circuits. However, the development of air-stable, highly aligned n-channel OSMC arrays for realizing high-performance devices lags far behind their p-channel counterparts. Herein, we present a simple one-step slope-coating method for the large-scale, solution-processed fabrication of highly aligned, air-stable, n-channel ribbon-shaped single-crystalline N,N＇-bis（2- phenylethyl）-perylene-3,4：9,10-tetracarboxylic diimide （BPE-PTCDI） arrays. The slope and pattemed photoresist （PR） stripes on the substrate are found to be crucial for the formation of large-area submicron ribbon arrays. The width and thickness of the BPE-PTCDI submicron ribbons can be finely tuned by controlling the solution concentration as well as the slope angle. The resulting BPE-PTCDI submicron ribbon arrays possess an optimum electron mobility up to 2.67 cm2.V-l.s-1 （with an average mobility of 1.13 cm2.V-l-s-1）, which is remarkably higher than that of thin film counterparts and better than the performance reported previously for single-crystalline BPE-PTCDI-based devices. Moreover, the devices exhibit robust air stability and remain stable after exposing in air over 50 days. Our study facilitates the development of air-stable, n-channel organic field-effect transistors （OFETs） and paves the way towards the fabrication of high-performance, organic single crystal-based integrated circuits.
