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Low-Cost, High-Reflectivity Silicon-on-Reflector for Optoelectronic Device Application
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作者 李成 杨沁青 +1 位作者 王红杰 王启明 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第3期261-264,共4页
A silicon on reflector (SOR) substrate containing a thin crystal silicon layer and a buried Si/SiO 2 Bragg reflector is reported. The substrate, which is applied to optoelectronic devices, is fabricated by using Si... A silicon on reflector (SOR) substrate containing a thin crystal silicon layer and a buried Si/SiO 2 Bragg reflector is reported. The substrate, which is applied to optoelectronic devices, is fabricated by using Si based sol gel sticking and smart cut techniques. The reflectivity of the SOR substrate is close to unity at 1 3μm's wavelength under the normal incidence. 展开更多
关键词 silicon on reflector SiO 2/Si Bragg reflector smart cut technique optoelectronic device PHOTODETECTOR
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