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求解层间界面反平面剪切破坏的剪切梁模型(Ⅱ)——失稳特性 被引量:3
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作者 沈新普 泽鲁.穆荣日 《应用数学和力学》 CSCD 北大核心 2000年第11期1109-1116,共8页
在研究 (Ⅰ )的基础上 ,研究了剪切梁模型在裂纹萌生和失稳扩展阶段的行为特性 ,1)给出了软化失稳 (snap_through)和回折失稳 (snap_back)两种失稳行为发生的条件·  2 )对剪切梁在反平面剪切载荷及侧压力共同作用下的力学行为作... 在研究 (Ⅰ )的基础上 ,研究了剪切梁模型在裂纹萌生和失稳扩展阶段的行为特性 ,1)给出了软化失稳 (snap_through)和回折失稳 (snap_back)两种失稳行为发生的条件·  2 )对剪切梁在反平面剪切载荷及侧压力共同作用下的力学行为作了解析分析计算 ,给出了结构的位移—载荷全过程曲线·  3)讨论了失稳过程中的能量释放问题 ,并给出了回折失稳过程中结构对外界的能量释放的计算式· 展开更多
关键词 界面层 反平面剪切 破坏 剪切梁 失稳 软化失稳 回折失稳 损伤
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SHEAR BEAM MODEL FOR INTERFACE FAILURE UNDER ANTIPLANE SHEAR(Ⅱ)—INSTABILITY 被引量:1
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作者 沈新普 Zenon Mroz 《Applied Mathematics and Mechanics(English Edition)》 SCIE EI 2000年第11期1229-1236,共8页
Based on the (Ⅰ) of the present work, the behavior of shear beam model at crack initiation stage and at instable propagation stage was studied. The prime results include: 1) discriminant equation which clarifies the ... Based on the (Ⅰ) of the present work, the behavior of shear beam model at crack initiation stage and at instable propagation stage was studied. The prime results include: 1) discriminant equation which clarifies the mode of instability, snap_back or snap_through, was established; 2) analytical solution was given out for the double shear beam and the load_displacement diagram for monotonic loading was presented for a full process; and 3) the problem of the energy release induced by instability was discussed. 展开更多
关键词 interface layer antiplane shear FAILURE shear beam model INSTABILITY snap_through snap_back dam?
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Backside optimization for improving avalanche breakdown behavior of 4.5 kV IGBT
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作者 田晓丽 陆江 +3 位作者 滕渊 张文亮 卢烁今 朱阳军 《Journal of Semiconductors》 EI CAS CSCD 2015年第3期85-87,共3页
The static avalanche breakdown behavior of 4.5 kV high-voltage IGBT is studied by theory analysis and experiment. The avalanche breakdown behaviors of the 4.5 kV IGBTs with different backside structures are investigat... The static avalanche breakdown behavior of 4.5 kV high-voltage IGBT is studied by theory analysis and experiment. The avalanche breakdown behaviors of the 4.5 kV IGBTs with different backside structures are investigated and compared by using the curve tracer. The results show that the snap back behavior of the breakdown waveform is related to the bipolar PNP gain, which leads to the deterioration of the breakdown voltage. There are two ways to optimize the backside structure, one is increasing the implant dose of the N^+ buffer layer, the other is decreasing the implant dose of the P^+ collector layer. It is found that the optimized structure is effective in suppressing the snap back behavior and improving the breakdown characteristic of high voltage IGBT. 展开更多
关键词 avalanche breakdown snap back bipolar transistor gain high voltage IGBT
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