A 10 × 10 solar-blind ultraviolet(UV) imaging array with double-layer wire structure was prepared based on Ga_(2)O_(3) film grown by atomic layer deposition. These single detection units in the array exhibit exce...A 10 × 10 solar-blind ultraviolet(UV) imaging array with double-layer wire structure was prepared based on Ga_(2)O_(3) film grown by atomic layer deposition. These single detection units in the array exhibit excellent performance at 3 V: photo-todark current ratio(PDCR) of 5.5 × 10^(5), responsivity(R) of 4.28 A/W, external quantum efficiency(EQE) of 2.1 × 10^(3)%, detectivity(D*) of 1.5 × 10^(14) Jones, and fast response time. The photodetector array shows high uniformity under different light intensity and low operating bias. The array also has good temperature stability. Under 300 ℃, it still presents clear imaging and keeps high R of 34.4 and 6.45 A/W at 5 and 1 V, respectively. This work provides a new insight for the large-scale array of Ga_(2)O_(3) solarblind UV detectors.展开更多
Ga_(2)O_(3)-based avalanche photodetectors(APDs) have gained increasing attention because of their excellent photoelectric conversion capability in the UV solar-blind region. Integrating high-quality epitaxial Ga_(2)O...Ga_(2)O_(3)-based avalanche photodetectors(APDs) have gained increasing attention because of their excellent photoelectric conversion capability in the UV solar-blind region. Integrating high-quality epitaxial Ga_(2)O_(3) with p-type semiconductor remains an open challenge associated with the integration difficulty on alleviating its defects and dislocations. Herein,we construct an APD consisting of epitaxial β-Ga_(2)O_(3)/La_(0.8)Ca_(0.2)MnO_(3) heterostructure. The pn junction APDs exhibit a high responsivity of 568 A/W as well as an enhanced avalanche gain of up to 3.0 × 10~5 at a reverse bias voltage of 37.9 V. The integration capability demonstrated in this work provides exciting opportunities for further development of high-performance Ga_(2)O_(3)-based electronics and optoelectronics.展开更多
There is an emerging need for high-sensitivity solar-blind deep ultraviolet(DUV)photodetectors with an ultra-fast response speed.Although nanoscale devices based on Ga_(2)O_(3)nanostructures have been developed,their ...There is an emerging need for high-sensitivity solar-blind deep ultraviolet(DUV)photodetectors with an ultra-fast response speed.Although nanoscale devices based on Ga_(2)O_(3)nanostructures have been developed,their practical applications are greatly limited by their slow response speed as well as low specific detectivity.Here,the successful fabrication of two-/three-dimensional(2D/3D)graphene(Gr)/PtSe2/β-Ga_(2)O_(3)Schottky junction devices for high-sensitivity solar-blind DUV photodetectors is demonstrated.Benefitting from the high-quality 2D/3D Schottky junction,the vertically stacked structure,and the superior-quality transparent graphene electrode for effective carrier collection,the photodetector is highly sensitive to DUV light illumination and achieves a high responsivity of 76.2 mA/W,a large on/off current ratio of~105,along with an ultra-high ultraviolet(UV)/visible rejection ratio of 1.8×104.More importantly,it has an ultra-fast response time of 12µs and a remarkable specific detectivity of~1013 Jones.Finally,an excellent DUV imaging capability has been identified based on the Gr/PtSe2/β-Ga_(2)O_(3)Schottky junction photodetector,demonstrating its great potential application in DUV imaging systems.展开更多
： Back-illuminated AlxGal-xN-based dual-band solar-blind ultraviolet （UV） photodetectors （PDs） are realized by a three-terminal n-i-p-i-n heterojunction structure which is grown on sapphire substrate by metal org...： Back-illuminated AlxGal-xN-based dual-band solar-blind ultraviolet （UV） photodetectors （PDs） are realized by a three-terminal n-i-p-i-n heterojunction structure which is grown on sapphire substrate by metal organic chemical vapor deposition （MOCVD）. The two p-i-n junctions contained in the heterojunction structure can work separately and independently. Working in the photovoltaic mode, the PDs display peak responsivity of ～10.8 mA/W at 242 nm and ～5.0 mA/W at 257 nm, respectively. The two junctions with different size, whose diameters are 500 μm and 800 μm, exhibit almost the same leakage current of ～1.3× 10-9 A at a reverse bias of 10 V. Therefore, dark current densities of the two junctions are close to 6.6 × 10-7 A/cm2 and 2.6 × 10-7 A/cm2 at -10 V respectively.展开更多
Wide-bandgap semiconductors have demonstrated considerable potential for fabricating solar-blind ultraviolet (SBUV) photodetectors, which are extensively used in both civilian and military applications. Despite this p...Wide-bandgap semiconductors have demonstrated considerable potential for fabricating solar-blind ultraviolet (SBUV) photodetectors, which are extensively used in both civilian and military applications. Despite this promise, the limited variety of semiconductors with suitable bandgaps hampers the advancement of high-performance SBUV detectors. In this study, we synthesized CdPS_(3) transparent single crystals using the chemical vapor transport (CVT) method. Density functional theory (DFT) calculations suggest that the bandgap of CdPS_(3) decreases as the material’s thickness increases, a finding corroborated by subsequent absorption spectra and photoelectric response measurements. The as-prepared CdPS_(3) nanosheets were employed as channels in photodetectors, demonstrating outstanding photoelectric performance in the solar-blind ultraviolet range (at 254 and 275 nm) with high responsivity (0.3 A/W), high specific detectivity (5.5 × 10^(9) Jones), rapid response speed (2.6 ms/3.4 ms), and exceptionally low dark current (2 pA). It is noteworthy that these nanosheets exhibit almost no sensitivity to 365 nm and visible light irradiation, attributable to the direct carrier transition beyond the broad bandgap in CdPS_(3). Furthermore, high-quality imaging was achieved under different gate voltages using 275 nm ultraviolet light, underscoring the potential of CdPS_(3) as a new material for high-performance SBUV optoelectronic detection.展开更多
基金supported by Natural Science Basic Research Program of Shaanxi Province of China (No. 2023-JCYB-574)National Natural Science Foundation of China (Grant No. 62304178)。
文摘A 10 × 10 solar-blind ultraviolet(UV) imaging array with double-layer wire structure was prepared based on Ga_(2)O_(3) film grown by atomic layer deposition. These single detection units in the array exhibit excellent performance at 3 V: photo-todark current ratio(PDCR) of 5.5 × 10^(5), responsivity(R) of 4.28 A/W, external quantum efficiency(EQE) of 2.1 × 10^(3)%, detectivity(D*) of 1.5 × 10^(14) Jones, and fast response time. The photodetector array shows high uniformity under different light intensity and low operating bias. The array also has good temperature stability. Under 300 ℃, it still presents clear imaging and keeps high R of 34.4 and 6.45 A/W at 5 and 1 V, respectively. This work provides a new insight for the large-scale array of Ga_(2)O_(3) solarblind UV detectors.
基金supported by the National Natural Science Foundation of China (Nos. 12074044, 11874230, 52233014, and 12274243)the Fund of State Key Laboratory of Information Photonics and Optical Communications (No. IPOC2021ZT05)the Fundamental Research Funds for the Central Universities (BUPT)。
文摘Ga_(2)O_(3)-based avalanche photodetectors(APDs) have gained increasing attention because of their excellent photoelectric conversion capability in the UV solar-blind region. Integrating high-quality epitaxial Ga_(2)O_(3) with p-type semiconductor remains an open challenge associated with the integration difficulty on alleviating its defects and dislocations. Herein,we construct an APD consisting of epitaxial β-Ga_(2)O_(3)/La_(0.8)Ca_(0.2)MnO_(3) heterostructure. The pn junction APDs exhibit a high responsivity of 568 A/W as well as an enhanced avalanche gain of up to 3.0 × 10~5 at a reverse bias voltage of 37.9 V. The integration capability demonstrated in this work provides exciting opportunities for further development of high-performance Ga_(2)O_(3)-based electronics and optoelectronics.
基金the National Natural Science Foundation of China(Nos.U2004165,51702017,and 11974016)the Natural Science Foundation of Henan Province,China(No.202300410376)Research Grants Council of Hong Kong,China(No.GRF 152093/18E PolyU B-Q65N).
文摘There is an emerging need for high-sensitivity solar-blind deep ultraviolet(DUV)photodetectors with an ultra-fast response speed.Although nanoscale devices based on Ga_(2)O_(3)nanostructures have been developed,their practical applications are greatly limited by their slow response speed as well as low specific detectivity.Here,the successful fabrication of two-/three-dimensional(2D/3D)graphene(Gr)/PtSe2/β-Ga_(2)O_(3)Schottky junction devices for high-sensitivity solar-blind DUV photodetectors is demonstrated.Benefitting from the high-quality 2D/3D Schottky junction,the vertically stacked structure,and the superior-quality transparent graphene electrode for effective carrier collection,the photodetector is highly sensitive to DUV light illumination and achieves a high responsivity of 76.2 mA/W,a large on/off current ratio of~105,along with an ultra-high ultraviolet(UV)/visible rejection ratio of 1.8×104.More importantly,it has an ultra-fast response time of 12µs and a remarkable specific detectivity of~1013 Jones.Finally,an excellent DUV imaging capability has been identified based on the Gr/PtSe2/β-Ga_(2)O_(3)Schottky junction photodetector,demonstrating its great potential application in DUV imaging systems.
文摘： Back-illuminated AlxGal-xN-based dual-band solar-blind ultraviolet （UV） photodetectors （PDs） are realized by a three-terminal n-i-p-i-n heterojunction structure which is grown on sapphire substrate by metal organic chemical vapor deposition （MOCVD）. The two p-i-n junctions contained in the heterojunction structure can work separately and independently. Working in the photovoltaic mode, the PDs display peak responsivity of ～10.8 mA/W at 242 nm and ～5.0 mA/W at 257 nm, respectively. The two junctions with different size, whose diameters are 500 μm and 800 μm, exhibit almost the same leakage current of ～1.3× 10-9 A at a reverse bias of 10 V. Therefore, dark current densities of the two junctions are close to 6.6 × 10-7 A/cm2 and 2.6 × 10-7 A/cm2 at -10 V respectively.
基金financially supported by the National Natural Science Foundation of China(Nos.12174451 and 12274467)the Science and Technology Innovation Program of Hunan Province(No.2022RC1199)+1 种基金the Natural Science Foundation of Hunan Province of China(No.2021JJ40795)the High Performance Computing Center of Central South University,Central South University Graduate Student Independent Exploration and Innovation Project(No.2024ZZTS0454 and 2024ZZTS0778).
文摘Wide-bandgap semiconductors have demonstrated considerable potential for fabricating solar-blind ultraviolet (SBUV) photodetectors, which are extensively used in both civilian and military applications. Despite this promise, the limited variety of semiconductors with suitable bandgaps hampers the advancement of high-performance SBUV detectors. In this study, we synthesized CdPS_(3) transparent single crystals using the chemical vapor transport (CVT) method. Density functional theory (DFT) calculations suggest that the bandgap of CdPS_(3) decreases as the material’s thickness increases, a finding corroborated by subsequent absorption spectra and photoelectric response measurements. The as-prepared CdPS_(3) nanosheets were employed as channels in photodetectors, demonstrating outstanding photoelectric performance in the solar-blind ultraviolet range (at 254 and 275 nm) with high responsivity (0.3 A/W), high specific detectivity (5.5 × 10^(9) Jones), rapid response speed (2.6 ms/3.4 ms), and exceptionally low dark current (2 pA). It is noteworthy that these nanosheets exhibit almost no sensitivity to 365 nm and visible light irradiation, attributable to the direct carrier transition beyond the broad bandgap in CdPS_(3). Furthermore, high-quality imaging was achieved under different gate voltages using 275 nm ultraviolet light, underscoring the potential of CdPS_(3) as a new material for high-performance SBUV optoelectronic detection.
