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Ni/Pd-based ohmic contacts to p-GaN through p-InGaN/p^(+)-GaN contacting layers 被引量:3
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作者 Minglong Zhang Masao Ikeda +4 位作者 Siyi Huang Jianping Liu Jianjun Zhu Shuming Zhang Hui Yang 《Journal of Semiconductors》 EI CAS CSCD 2022年第9期81-86,共6页
Specific contact resistance to p-GaN was measured for various structures of Ni/Pd-based metals and thin(20-30 nm thick)p-InGaN/p^(+)-GaN contacting layers.The effects of surface chemical treatment and annealing temper... Specific contact resistance to p-GaN was measured for various structures of Ni/Pd-based metals and thin(20-30 nm thick)p-InGaN/p^(+)-GaN contacting layers.The effects of surface chemical treatment and annealing temperature were ex-amined.The optimal annealing temperature was determined to be 550°C,above which the sheet resistance of the samples de-graded considerably,suggesting that undesirable alloying had occurred.Pd-containing metal showed~35%lower com-pared to that of single Ni.Very thin(2-3.5 nm thick)p-InGaN contacting layers grown on 20-25 nm thick p^(+)-GaN layers exhib-ited one to two orders of magnitude smaller values of compared to that of p^(+)-GaN without p-InGaN.The current density de-pendence of,which is indicative of nonlinearity in current-voltage relation,was also examined.The lowest achieved through this study was 4.9×10^(-5)Ω·cm^(2)@J=3.4 kA/cm^(2). 展开更多
关键词 GAN ohmic contact specific contact resistance
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Transparent conducting indium-tin-oxide(ITO) film as full front electrode in Ⅲ–Ⅴ compound solar cell 被引量:1
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作者 代盼 卢建娅 +6 位作者 谭明 王青松 吴渊渊 季莲 边历峰 陆书龙 杨辉 《Chinese Physics B》 SCIE EI CAS CSCD 2017年第3期495-499,共5页
The application of transparent conducting indium-tin-oxide(ITO) film as full front electrode replacing the conventional bus-bar metal electrode in Ⅲ–Ⅴ compound GaInP solar cell was proposed. A high-quality, non-rec... The application of transparent conducting indium-tin-oxide(ITO) film as full front electrode replacing the conventional bus-bar metal electrode in Ⅲ–Ⅴ compound GaInP solar cell was proposed. A high-quality, non-rectifying contact between ITO and 10 nm N^+-GaAs contact layer was formed, which is benefiting from a high carrier concentration of the terrilium-doped N^+-GaAs layer, up to 2×10^(19)cm^(-3). A good device performance of the GaInP solar cell with the ITO electrode was observed. This result indicates a great potential of transparent conducting films in the future fabrication of larger area flexible Ⅲ–Ⅴ solar cell. 展开更多
关键词 full indium-tin-oxide(ITO) electrode specific contact resistance solar cell
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