Research on Electric Field Confinement Effect in Silicon LED Fabricated by Standard CMOS Technology

The wedge-shaped and leaf-type silicon light-emitting devices(LED)are designed and fabricated with the Singapore Chartered Semi Inc.'s dual-gate standard 0.35μm CMOS process.The basic structure of the two devices is N well-P+ junction.P+ area is the wedge-shaped structure,which is embedded in N well.The leaf-type silicon LED device is a combination of the three wedge-shaped LED devices.The main difference between the two devices is their different electrode distribution,which is mainly in order to analyze the application of electric field confinement(EFC).The devices' micrographs were measured with the Olympus IC test microscope.The forward and reverse bias electrical characteristics of the devices were tested.Light measurements of the devices show that the electrode layout is very important when the electric field confinement is applied.

A novel monolithic ultraviolet image sensor based on a standard CMOS process

We present a monolithic ultraviolet（UV） image sensor based on a standard CMOS process.A compact UV sensitive device structure is designed as a pixel for the image sensor.This UV image sensor consists of a CMOS pixel array,high-voltage switches,a readout circuit and a digital control circuit.A 16×16 image sensor prototype chip is implemented in a 0.18μm standard CMOS logic process.The pixel and image sensor were measured. Experimental results demonstrate that the image sensor has a high sensitivity of 0.072 V/（mJ/cm^2） and can capture a UV image.It is suitable for large-scale monolithic bio-medical and space applications.

An approach to the optical interconnect made in standard CMOS process

A standard CMOS optical interconnect is proposed, including an octagonal-annular emitter, a field oxide, metal 1-PSG/BPSG-metal 2 dual waveguide, and an ultra high-sensitivity optical receiver integrated with a fingered P＋/N-well/P-sub dual photodiode detector. The optical interconnect is implemented in a Chartered 3.3-V 0.35-μm standard analog CMOS process with two schemes for the research of the substrate noise coupling effect on the optical interconnect performance： with or without a GND-guardring around the emitter. The experiment results show that the optical interconnect can work at 100 kHz, and it is feasible to implement optical interconnects in standard CMOS processes.

A monolithic,standard CMOS,fully differential optical receiver with an integrated MSM photodetector

This paper presents a realization of a silicon-based standard CMOS,fully differential optoelectronic integrated receiver based on a metal–semiconductor–metal light detector（MSM photodetector）.In the optical receiver, two MSM photodetectors are integrated to convert the incident light signal into a pair of fully differential photogenerated currents.The optoelectronic integrated receiver was designed and implemented in a chartered 0.35μm, 3.3 V standard CMOS process.For 850 nm wavelength,it achieves a 1 GHz 3 dB bandwidth due to the MSM photodetector’s low capacitance and high intrinsic bandwidth.In addition,it has a transimpedance gain of 98.75 dBΩ, and an equivalent input integrated referred noise current of 283 nA from 1 Hz up to–3 dB frequency.

A low-phase-noise ring oscillator with coarse and fine tuning in a standard CMOS process

A low-phase-noise wideband ring oscillator with coarse and fine tuning techniques implemented in a standard 65 nm CMOS process is presented. Direct frequency modulation in the ring oscillator is analyzed and a switched capacitor array is introduced to produce the lower VCO gain required to suppress this effect. A two dimensional high-density stacked MOM-capacitor was adopted as the switched capacitor to make the proposed ring VCO compatible with standard CMOS processes. The designed ring VCO exhibits an output frequency from 480 to 1100 MHz, resulting in a tuning range of 78%, and the measured phase noise is -120 dBc/Hz @ 1 MHz at 495 MHz output. The VCO core consumes 3.84 mW under a 1.2 V supply voltage and the corresponding FOM is -169 dBc/Hz.

A Low-Power,Single-Poly,Non-Volatile Memory for Passive RFID Tags

Single-poly,576bit non-volatile memory is designed and implemented in an SMIC 0.18μm standard CMOS process for the purpose of reducing the cost and power of passive RFID tag chips. The memory bit cell is designed with conventional single-poly pMOS transistors, based on the bi-directional Fowler-Nordheim tunneling effect, and the typical program/erase time is 10ms for every 16bits. A new ,single-ended sense amplifier is proposed to reduce the power dissipation in the current sensing scheme. The average current consumption of the whole memory chip is 0.8μA for the power supply voltage of 1.2V at a reading rate of 640kHz.

A high efficiency charge pump circuit for low power applications

A high efficiency charge pump circuit is designed and realized. The charge transfer switch is biased by the additional capacitor and transistor to eliminate the influence of the threshold voltage. Moreover, the bulk of the switch transistor is dynamically biased so that the threshold voltage gets lower when it is turned on during charge transfer and gets higher when it is turned off. As a result, the efficiency of the charge pump circuit can be improved. A test chip has been implemented in a 0.18μm 3.3 V standard CMOS process. The measured output voltage of the eight-pumpingstage charge pump is 9.8 V with each pumping capacitor of 0.5 pF at an output current of 0.18 μA, when the clock frequency is 780 kHz and the supply voltage is 2 V. The charge pump and the clock driver consume a total current of 2.9 μA from the power supply. This circuit is suitable for low power applications.