Droplet behavior in the wave-type flow channel is discussed,especially with the secondary droplet gen- eration due to impingement of droplets on the wall considered.A numerical method is suggested to simulate the drop...Droplet behavior in the wave-type flow channel is discussed,especially with the secondary droplet gen- eration due to impingement of droplets on the wall considered.A numerical method is suggested to simulate the droplet behavior in the flow field.Calculations are compared with experimental data on the pressure drop and sepa- rating efficiency.Good agreement exists between the calculations and air-water experiments.The numerical method developed gives a reasonable description of the droplet deposition and secondary droplet generation,and it can be applied to predict the performance of wave-type vane separators.展开更多
A novel wet vapor photoresist stripping technology is developed as an alternative to dry plasma ashing and wet stripping. Experiments using this technology to strip hard baked SU-8 photoresist, aurum and chromium film...A novel wet vapor photoresist stripping technology is developed as an alternative to dry plasma ashing and wet stripping. Experiments using this technology to strip hard baked SU-8 photoresist, aurum and chromium film are carried out. Then the images of stripping results are shown and the mechanism is analyzed and discussed. The most striking result of this experiment is that the spraying mixture of steam and water droplets can strip pho- toresist and even metal film with ease.展开更多
基金Supported by the National Key Laboratory of Bubble Physics&Natural Circulation(No.51482150104JW0502).
文摘Droplet behavior in the wave-type flow channel is discussed,especially with the secondary droplet gen- eration due to impingement of droplets on the wall considered.A numerical method is suggested to simulate the droplet behavior in the flow field.Calculations are compared with experimental data on the pressure drop and sepa- rating efficiency.Good agreement exists between the calculations and air-water experiments.The numerical method developed gives a reasonable description of the droplet deposition and secondary droplet generation,and it can be applied to predict the performance of wave-type vane separators.
基金Project supported by the National Natural Science Foundation of China(No.60976017)
文摘A novel wet vapor photoresist stripping technology is developed as an alternative to dry plasma ashing and wet stripping. Experiments using this technology to strip hard baked SU-8 photoresist, aurum and chromium film are carried out. Then the images of stripping results are shown and the mechanism is analyzed and discussed. The most striking result of this experiment is that the spraying mixture of steam and water droplets can strip pho- toresist and even metal film with ease.
