A high performance 70nm CMOS device has been demonstrated for the first time in the continent, China. Some innovations in techniques are applied to restrain the short channel effect and improve the driving ability, ...A high performance 70nm CMOS device has been demonstrated for the first time in the continent, China. Some innovations in techniques are applied to restrain the short channel effect and improve the driving ability, such as 3nm nitrided oxide, dual poly Si gate electrode, novel super steep retrograde channel doping by heavy ion implantation, ultra shallow S/D extension formed by Ge PAI(Pre Amorphism Implantation) plus LEI(Low Energy Implantation), thin and low resistance Ti SALICIDE by Ge PAI and special cleaning, etc. The shortest channel length of the CMOS device is 70nm. The threshold voltages, G m and off current are 0 28V,490mS·mm -1 and 0 08nA/μm for NMOS and -0 3V,340mS·mm -1 and 0 2nA/μm for PMOS, respectively. Delays of 23 5ps/stage at 1 5V, 17 5ps/stage at 2 0V and 12 5ps/stage at 3V are achieved in the 57 stage unloaded 100nm CMOS ring oscillator circuits.展开更多
文摘A high performance 70nm CMOS device has been demonstrated for the first time in the continent, China. Some innovations in techniques are applied to restrain the short channel effect and improve the driving ability, such as 3nm nitrided oxide, dual poly Si gate electrode, novel super steep retrograde channel doping by heavy ion implantation, ultra shallow S/D extension formed by Ge PAI(Pre Amorphism Implantation) plus LEI(Low Energy Implantation), thin and low resistance Ti SALICIDE by Ge PAI and special cleaning, etc. The shortest channel length of the CMOS device is 70nm. The threshold voltages, G m and off current are 0 28V,490mS·mm -1 and 0 08nA/μm for NMOS and -0 3V,340mS·mm -1 and 0 2nA/μm for PMOS, respectively. Delays of 23 5ps/stage at 1 5V, 17 5ps/stage at 2 0V and 12 5ps/stage at 3V are achieved in the 57 stage unloaded 100nm CMOS ring oscillator circuits.
文摘设计了一个2 GHz全集成的CMOS功率放大器(PA),该PA的匹配网络采用片上变压器实现,片上变压器用来实现单端信号和差分信号之间的转换和输入、输出端的阻抗匹配。采用ADS Momentum软件对片上变压器进行电磁仿真,在2 GHz频点,输入、级间和输出变压器的功率传输效率分别为74.2%,75.5%和78.4%。该PA基于TSMC 65 nm CMOS模型设计,采用Agilent ADS软件进行电路仿真,仿真结果表明:在2.5 V供电电压、2 GHz工作频率点,PA的输入、输出完全匹配到50Ω(S11=–22.4 d B、S22=–13.5 d B),功率增益为33.2 d B,最高输出功率达到23.4 d Bm,最高功率附加效率(PAE)达到35.3%,芯片面积仅为1.01 mm2。
