Methods for Detection of Subsurface Damage:A Review

Subsurface damage is easily induced in machining of hard and brittle materials because of their particular mechani?cal and physical properties. It is detrimental to the strength,performance and lifetime of a machined part. To manu?facture a high quality part,it is necessary to detect and remove the machining induced subsurface damage by the subsequent processes. However,subsurface damage is often covered with a smearing layer generated in a machining process,it is rather di cult to directly observe and detect by optical microscopy. An e cient detection of subsur?face damage directly leads to quality improvement and time saving for machining of hard and brittle materials. This paper presents a review of the methods for detection of subsurface damage,both destructive and non?destructive. Although more reliable,destructive methods are typically time?consuming and confined to local damage infor?mation. Non?destructive methods usually su er from uncertainty factors,but may provide global information on subsurface damage distribution. These methods are promising because they can provide a capacity of rapid scan and detection of subsurface damage in spatial distribution.

Subsurface Damage in Scratch Testing of Potassium Dihydrogen Phosphate Crystal

Potassium dihydrogen phosphate （KDP） is an important electro-optic crystal, often used for frequency conversion and Pockels cells in large aperture laser systems. To investigate the influence of anisotropy to the depth of subsurface damage and the profiles of cracks in subsurface of KDP crystal, an experimental study was made to obtain the form of subsurface damage produced by scratches on KDP crystal in [100], [120] and [110] crystal directions on （001） crystal plane. The results indicated that there were great differences between depth and crack shape in different directions. For many slip planes in KDP, the plastic deformation and cracks generated under pressure in the subsurface were complex. Fluctuations of subsurface damage depth at transition point were attributed to the deformation of the surface which consumed more energy when the surface deformation changed from the mixed region of brittle and plastic to the complete brittle region along the scratch. Also, the process of subsurface damage from shallow to deep, from dislocation to big crack in KDP crystal with the increase of radial force and etch pit on different crystal plane were obtained. Because crystallographic orientation and processing orientation was different, etching pits on （100） crystal plane were quadrilateral while on （110） plane and （120） plane were trapezoidal and triangular, respectively.

Rapid subsurface damage detection of SiC using inductivity coupled plasma

This paper proposes a method for the rapid detection of subsurface damage(SSD)of Si C using atmospheric inductivity coupled plasma.As a plasma etching method operated at ambient pressure with no bias voltage,this method does not introduce any new SSD to the substrate.Plasma diagnosis and simulation are used to optimize the detection operation.Assisted by an Si C cover,a taper can be etched on the substrate with a high material removal rate.Confocal laser scanning microscopy and scanning electron microscope are used to analyze the etching results,and scanning transmission electron microscope(STEM)is adopted to confirm the accuracy of this method.The STEM result also indicates that etching does not introduce any SSD,and the thoroughly etched surface is a perfectly single crystal.A rapid SSD screening ability is also demonstrated,showing that this method is a promising approach for the rapid detection of SSD.

Identification of subsurface damage of 4H-SiC wafers by combining photo-chemical etching and molten-alkali etching

In this work,we propose to reveal the subsurface damage(SSD)of 4H-SiC wafers by photo-chemical etching and identify the nature of SSD by molten-alkali etching.Under UV illumination,SSD acts as a photoluminescence-black defect.The selective photo-chemical etching reveals SSD as the ridge-like defect.It is found that the ridge-like SSD is still crystalline 4H-SiC with lattice distortion.The molten-KOH etching of the 4H-SiC wafer with ridge-like SSD transforms the ridge-like SSD into groove lines,which are typical features of scratches.This means that the underlying scratches under mechanical stress give rise to the formation of SSD in 4H-SiC wafers.SSD is incorporated into 4H-SiC wafers during the lapping,rather than the chemical mechanical polishing(CMP).

Relationship between subsurface damage and surface roughness of ground optical materials

A theoretical model of relationship between subsurface damage and surface roughness was established to realize rapid and non-destructive measurement of subsurface damage of ground optical materials.Postulated condition of the model was that subsurface damage depth and peak-to-valley surface roughness are equal to depth of radial and lateral cracks in brittle surface induced by small-radius(radius≤200 μm)spherical indenter,respectively.And contribution of elastic stress field to the radial cracks propagation was also considered in the loading cycle.Subsurface damage depth of ground BK7 glasses was measured by magnetorheological finishing spot technique to validate theoretical ratio of subsurface damage to surface roughness.The results show that the ratio is directly proportional to load of abrasive grains and hardness of optical materials,while inversely proportional to granularity of abrasive grains and fracture toughness of optical materials.Moreover,the influence of the load and fracture toughness on the ratio is more significant than the granularity and hardness,respectively.The measured ratios of 80 grit and 120 grit fixed abrasive grinding of BK7 glasses are 5.8 and 5.4,respectively.

Subsurface Damage of Monocrystalline Germanium Wafers by Fixed and Free Abrasive Lappings

The subsurface damage(SSD)layers of monocrystalline germanium wafers lapped by three different ways were measured and compared by the method of nanoindentation and micro morphology.Three ways such as ice-fixed abrasive,thermosetting fixed abrasive and free abrasive lappings are adopted to lap monocrystalline germanium wafers.The SSD depth was measured by a nanoindenter,and the morphology of SSD layer was observed by an atomic force microscopy(AFM).The results show that the SSD layer of monocrystalline germanium wafer is mainly composed of soft corrosion layer and plastic scratch and crack growth layer.Compared with thermosetting fixed abrasive and free abrasive lappings,the SSD depth lapped with ice-fixed abrasive is shallower.Moreover,the SSD morphology of monocrystalline germanium wafer lapped with ice-fixed abrasive is superior to those of two other processing ways.

Correlation of polishing-induced shallow subsurface damages with laser-induced gray haze damages in fused silica optics

Laser-induced damage in fused silica optics greatly restricts the performances of laser facilities. Gray haze damage,which is always initiated on ceria polished optics, is one of the most important damage morphologies in fused silica optics.In this paper, the laser-induced gray haze damages of four fused silica samples polished with CeO2, Al2O3, ZrO2, and colloidal silica slurries are investigated. Four samples all present gray haze damages with much different damage densities.Then, the polishing-induced contaminant and subsurface damages in four samples are analyzed. The results reveal that the gray haze damages could be initiated on the samples without Ce contaminant and are inclined to show a tight correlation with the shallow subsurface damages.

Failure mode change and material damage with varied machining speeds:a review

High-speed machining(HSM) has been studied for several decades and has potential application in various industries, including the automobile and aerospace industries. However,the underlying mechanisms of HSM have not been formally reviewed thus far. This article focuses on the solid mechanics framework of adiabatic shear band(ASB) onset and material metallurgical microstructural evolutions in HSM. The ASB onset is described using partial differential systems. Several factors in HSM were considered in the systems, and the ASB onset conditions were obtained by solving these systems or applying the perturbation method to the systems. With increasing machining speed, an ASB can be depressed and further eliminated by shock pressure. The damage observed in HSM exhibits common features. Equiaxed fine grains produced by dynamic recrystallization widely cause damage to ductile materials, and amorphization is the common microstructural evolution in brittle materials. Based on previous studies, potential mechanisms for the phenomena in HSM are proposed. These include the thickness variation of the white layer of ductile materials. These proposed mechanisms would be beneficial to deeply understanding the various phenomena in HSM.

Hemispherical resonator with low subsurface damage machined by small ball-end fine diamond grinding wheel:A novel grinding technique

As for the ultra-precision grinding of the hemispherical fused silica resonator,due to the hard and brittle nature of fused silica,subsurface damage(SSD)is easily generated,which enormously influences the performance of such components.Hence,ultra-precision grinding experiments are carried out to investigate the surface/subsurface quality of the hemispherical resonator machined by the small ball-end fine diamond grinding wheel.The influence of grinding parameters on the surface roughness(SR)and SSD depth of fused silica samples is then analyzed.The experimental results indicate that the SR and SSD depth decreased with the increase of grinding speed and the decrease of feed rate and grinding depth.In addition,based on the material strain rate and the maximum undeformed chip thickness,the effect of grinding parameters on the subsurface damage mechanism of fused silica samples is analyzed.Furthermore,a multi-step ultra-precision grinding technique of the hemispherical resonator is proposed based on the interaction influence between grinding depth and feed rate.Finally,the hemispherical resonator is processed by the proposed grinding technique,and the SR is improved from 454.328 nm to 110.449 nm while the SSD depth is reduced by 94%from 40μm to 2.379μm.The multi-step grinding technique proposed in this paper can guide the fabrication of the hemispherical resonator.

Microstructure studies of the grinding damage in monocrystalline silicon wafers

The depth and nature of the subsurface damage in a silicon wafer will limit the performance of IC components. Damage microstructures of the silicon wafers ground by the #325, #600, and #2000 grinding wheels was analyzed. The results show that many microcracks, fractures, and dislocation rosettes appear in the surface and subsurface of the wafer ground by the #325 grinding wheel. No obvious microstructure change exists. The amorphous layer with a thickness of about 100 nm, microcracks, high density dislocations, and polycrystalline silicon are observed in the subsurface of the wafer ground by the #600 grinding wheel. For the wafer ground by the #2000 grinding wheel, an amorphous layer of about 30 nm thickness, a polycrystalline silicon layer, a few dislocations, and an elastic deformation layer exist. In general, with the decrease in grit size, the material removal mode changes from micro-fracture mode to ductile mode gradually.

Understanding of Earthquake Damage Pattern through Geomorphological Approach: A Case Study of 2006 Earthquake in Bantul, Yogyakarta, Indonesia

The last major earthquake in Bantul causing severe damage occurred on May 27th, 2006. The damages in the flat area of Bantul had a certain pattern. The damages pattern controlled the subsurface characteristic below the flat area. Understanding earthquake damage pattern through geo-morphological approach is important for earthquake hazard analysis. The techniques of remote sensing and Geographical Information Systems were applied to analyze earthquake damage pattern and geomorphological characteristics. Gravity analysis was used to identify the subsurface structure and the basement depth while geoelectric analysis was used to identify sediment depth. Moreover, spatial correlation analysis was used to identify the relationship between the earthquake damage, geomorphological characteristics, and subsurface characteristics. The results show that fluvial, marine, and aeolian landforms have low rock density value based on gravity analysis. These indicate that they were composed by thick unconsolidated material of quaternary alluvium. While denudational, structural, and solutional landforms composed by material of tertiary rocks have high rock density value. The severe damage occurred in the area that has a lower value of local gravity and deeper basement. In contrast, the slight damage occurred in the area that has higher values of local gravity and shallower basement. Moreover, the severe damage occurred in areas of thicker sediment that consist of unconsolidated material. Consequently, the area of unconsolidated material that has deeper basement and thicker sediment is prone to earthquake. They were located on fluvial, marine, and aeolian landforms.

基于改进SSD算法的路面破损检测

针对路面破损图像检测精度低、速度慢等问题,提出一种基于改进SSD的路面破损检测算法。该算法利用经过改进的Inception模块,使其替代SSD网络中的Conv4_3、FC7、Conv8、Conv9和Conv10层;针对路面裂缝、凹陷图像检测识别率低的问题,使用空洞卷积,在不丢失分辨率的情况下扩大感受野,提高浅层特征图对目标物体的特征提取能力。为使网络可以根据输入信息的多个尺度自适应调节接受域大小,在特征提取层引入SKNet。实验结果表明,改进后的方法在自制的路面特征数据集上的平均精度为89.52%,检测速度达到56.23 FPS,较改进前的算法在精度和检测速度方面分别提高了6.07%和13.21 FPS。基于SSD的改进算法不仅能有效识别路面破损特征,而且能有效提高识别速度并提升识别效率。

Subsurface damage and bending strength analysis for ultra-thin and flexible silicon chips

Subsurface damage(SSD) is an unavoidable problem in the precision mechanical grinding for preparing ultra-thin and flexible silicon chips. At present, there are relatively few studies on the relationship between SSD and the bending strength of ultra-thin chips under different grinding parameters. In this study, SSD including amorphization and dislocation is observed using a transmission electron microscope. Theoretical predictions of the SSD depth induced by different processing parameters are in good agreement with experimental data. The main reasons for SSD depth increase include the increase of grit size, the acceleration of feed rate, and the slowdown of wheel rotation speed. Three-point bending test is adopted to measure the bending strength of ultra-thin chips processed by different grinding conditions. The results show that increasing wheel rotation speed and decreasing grit size and feed rate will improve the bending strength of chips, due to the reduction of SSD depth. Wet etching and chemical mechanical polishing(CMP) are applied respectively to remove the SSD induced by grinding, and both contribute to providing a higher bending strength, but in comparison, CMP works better due to a smooth surface profile. This research aims to provide some guidance for optimizing the grinding process and fabricating ultra-thin chips with higher bending strength.

Effect of subsurface impurity defects on laser damage resistance of beam splitter coatings

The laser-induced damage threshold(LIDT)of plate laser beam splitter(PLBS)coatings is closely related to the subsurface absorption defects of the substrate.Herein,a two-step deposition temperature method is proposed to understand the effect of substrate subsurface impurity defects on the LIDT of PLBS coatings.Firstly,BK7 substrates are heat-treated at three different temperatures.The surface morphology and subsurface impurity defect distribution of the substrate before and after the heat treatment are compared.Then,a PLBS coating consisting of alternating HfO2–Al2O3 mixture and SiO2 layers is designed to achieve a beam-splitting ratio(transmittance to reflectance,s-polarized light)of approximately 50:50 at 1053 nm and an angle of incidence of 45◦,and it is prepared under four different deposition processes.The experimental and simulation results show that the subsurface impurity defects of the substrate migrate to the surface and accumulate on the surface during the heat treatment,and become absorption defect sources or nodule defect seeds in the coating,reducing the LIDT of the coating.The higher the heat treatment temperature,the more evident the migration and accumulation of impurity defects.A lower deposition temperature(at which the coating can be fully oxidized)helps to improve the LIDT of the PLBS coating.When the deposition temperature is 140◦C,the LIDT(s-polarized light,wavelength:1064 nm,pulse width:9 ns,incident angle:45◦)of the PLBS coating is 26.2 J/cm2,which is approximately 6.7 times that of the PLBS coating deposited at 200◦C.We believe that the investigation into the laser damage mechanism of PLBS coatings will help to improve the LIDT of coatings with partial or high transmittance at laser wavelengths.

基于改进SSD模型的道路病害检测研究

道路病害的准确检测可以及时定位并修复路面病害。对于保持良好的路况、交通运载、安全驾驶和出行等都具有重要的意义。为了提高现有人工智能道路裂缝检测精度和性能,提出一种基于不规则四边形标注框的改进SSD道路裂缝检测方法。该方法能够在裂缝检测过程中以较高的准确率检测出不同类型的道路裂缝。在建立的不规则四边形标注框数据集上,将改进算法与基于矩形预测框的SSD算法进行比较。实验结果表明,改进的SSD道路裂缝检测方法能够更好的根据裂缝形态进行检测,在检测精度方面有了较高的提升。

光学玻璃磨削亚表面损伤预测模型及DOE实验设计

为了掌握光学玻璃材料杯型砂轮研磨与表面粗糙度(SR)和亚表面损伤(SSD)机理,本文建立BK7光学玻璃杯型砂轮研磨表面粗糙度的预测模型,通过改变磨削参数来研究对表面粗糙度的影响。设计DOE试验,研究影响SR与SSD的显著性特征因子,并分析了各因子的交互作用。实验结果表明预测模型的可靠性,得到表面粗糙度的预测模型数据与实验数据的平均误差为5.47%。采用角抛光法,通过电子显微镜观测表面裂纹,并测量裂纹的深度。最后,基于Li的模型,建立基于磨削工艺参数的亚表面损伤的新预测模型。实验结果表明:实验和预测模型结果具有很好的一致性,模型数据与实验数据的平均误差为6.19%,并且新预测模型结果要优于Li的模型。

氧化镓单晶的磨削材料去除机理和损伤演化研究

为了探究氧化镓单晶在磨削过程中材料去除机理和亚表面损伤演化规律,通过变切深纳米划痕试验模拟单颗磨粒去除材料的过程来探究磨削过程中的材料去除机理,使用粒度分别为SD600、SD1500和SD5000的金刚石砂轮对氧化镓单晶进行磨削试验,分析磨削表面形貌和亚表面的损伤演化规律.使用扫描电子显微镜和透射电子显微镜作为主要表征手段,采用有限元法分析划痕过程中的应力分布.研究结果表明,氧化镓单晶在材料去除过程中沿不同晶向扩展的交错滑移带可能导致不规则的破碎坑,取向裂纹受到(-3-10)滑移面的严重影响.随着砂轮粒径的减小,磨削表面形貌表现为破碎坑和取向裂纹主导的脆性表面逐渐演化为完全塑性表面.

超声振动辅助抛光氮化镓分子动力学仿真分析

为了揭示超声振动辅助抛光(ultrasonic vibration-assisted polishing,UVAP)氮化镓(GaN)的微观机理,为优化超声参数实现GaN材料高效去除和改善表面质量提供指导意见。采用分子动力学(molecular dynamics,MD)模拟方法研究了超声振动条件下单个磨粒在氮化镓(GaN)材料表面的划擦行为,并分析了超声振动周期和幅值对GaN材料去除行为的影响。结果表明,随UVAP振动周期的增大,平均切向力不断减小,平均法向力先增大后减小,损伤层厚度先降低后逐渐趋于平缓。振动周期为40 ps时,去除原子数量为常规抛光的5.6倍,同时损伤层深度仅为15.85。而随着UVAP振幅的增加,平均切向力先减小后增大,平均法向力不断减小,划痕宽度和损伤层深度非线性增大。在振幅为8时,损伤层深度与常规抛光基本保持一致,且去除原子数量相比常规抛光提升了4.6倍。UVAP较常规抛光能够降低平均磨削力,增大划痕宽度,提升去除原子数量,具有优异的抛光效果。UVAP振动周期和振幅的增大均会增加划痕底部的位错类型。此外,位错总长度的大小主要受振幅的影响,而与振动周期基本无关。通过调控UVAP振动周期和振幅分别为40 ps和8,能够保证较好的表面质量和较高的材料去除效率。

单晶硅纳米磨削力热行为与亚表面损伤研究

纳米磨削作为实现单晶硅低损伤加工的技术之一被逐渐应用于硅片减薄中,但磨削过程中的力热行为及其对亚表面损伤形成的影响机制仍不清楚;因此,通过分子动力学仿真手段对单晶硅纳米磨削时的力热行为和亚表面损伤之间的联系进行研究。结果表明,单晶硅纳米磨削过程中切向磨削力对材料去除起主要作用,磨粒前下方区域的热量聚集和应力集中现象明显。在力热载荷作用下,非晶化和相变是单晶硅纳米磨削时亚表面损伤的主要形成机制。磨削力的增大会导致单晶硅去除过程中产生较大的亚表面损伤层,而一定的高温由于增强了单晶硅的韧性进而抑制了亚表面损伤层的形成。