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Recent Advances and Perspectives of Lewis Acidic Etching Route:An Emerging Preparation Strategy for MXenes 被引量:4
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作者 Pengfei Huang Wei-Qiang Han 《Nano-Micro Letters》 SCIE EI CAS CSCD 2023年第5期187-235,共49页
Since the discovery in 2011,MXenes have become the rising star in the field of two-dimensional materials.Benefiting from the metallic-level conductivity,large and adjustable gallery spacing,low ion diffusion barrier,r... Since the discovery in 2011,MXenes have become the rising star in the field of two-dimensional materials.Benefiting from the metallic-level conductivity,large and adjustable gallery spacing,low ion diffusion barrier,rich surface chemistry,superior mechanical strength,MXenes exhibit great application prospects in energy storage and conversion,sensors,optoelectronics,electromagnetic interference shielding and biomedicine.Nevertheless,two issues seriously deteriorate the further development of MXenes.One is the high experimental risk of common preparation methods such as HF etching,and the other is the difficulty in obtaining MXenes with controllable surface groups.Recently,Lewis acidic etching,as a brand-new preparation strategy for MXenes,has attracted intensive attention due to its high safety and the ability to endow MXenes with uniform terminations.However,a comprehensive review of Lewis acidic etching method has not been reported yet.Herein,we first introduce the Lewis acidic etching from the following four aspects:etching mechanism,terminations regulation,in-situ formed metals and delamination of multi-layered MXenes.Further,the applications of MXenes and MXene-based hybrids obtained by Lewis acidic etching route in energy storage and conversion,sensors and microwave absorption are carefully summarized.Finally,some challenges and opportunities of Lewis acidic etching strategy are also presented. 展开更多
关键词 Lewis acidic etching MXenes Etching mechanism Termination regulation In-situ formed metals DELAMINATION Application
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Design and implementation of a 3-A source and sink linear regulator for bus terminators
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作者 李演明 毛翔宇 +1 位作者 文常保 温立民 《Journal of Semiconductors》 EI CAS CSCD 2012年第10期122-128,共7页
According to the requirements of the bus terminal regulator,a linear regulator with 3-A source-sink current ability is presented.The use of the NMOS pass transistor and load current feedback technique enhances the sys... According to the requirements of the bus terminal regulator,a linear regulator with 3-A source-sink current ability is presented.The use of the NMOS pass transistor and load current feedback technique enhances the system current ability and response speed.The method of adaptive zero compensation realizes loop stability over the whole load range for either source or sink loop.Furthermore,the transconductance matching technique reduces the shoot-through current through the output stage to less than 3μA.The regulator has been fabricated with a 0.6-μm 30 V BCD process successfully,and the area size is about 1 mm;.With a 20μF output capacitor, the maximum transient output-voltage variation is within 3.5%of the output voltage with load step changes of±2 A/lμs.At the load range of±3 A,the variation of output voltage is less than±15 mV. 展开更多
关键词 bus termination regulator linear regulator fast response power management IC
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