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Effect of Annealing Temperature on the Formation of Silicides and the Surface Morphologies of PtSi Films 被引量:2
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作者 Jinghua YIN Meicheng LI +3 位作者 Yufeng ZHENG Zhong WANG Wei CAI Peilin WANG School of Materials Science and Engineering, Harbin institute of Technology, Harbin 150001, China 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2001年第1期39-40,共2页
The effect of annealing temperature on the formation of the PtSi phase. distribution of silicides and the surface morphologies of silicides films is investigated by XPS. AFM. It is shown that the phase sequences of t... The effect of annealing temperature on the formation of the PtSi phase. distribution of silicides and the surface morphologies of silicides films is investigated by XPS. AFM. It is shown that the phase sequences of the films change from Pt-Pt2Si-PtSi-Si to Pt+Pt2Si+PtSi-PtSi-Si or Pt+Pt2Si+PtSi-PtSi-st with an increase of annealing temperature and the reason for the formation of mixed layers is discussed. 展开更多
关键词 Effect of Annealing Temperature on the Formation of Silicides and the surface Morphologies of PtSi Films
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