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Thermal Characterization of Lauric Acid and Stearic Acid Binary Eutectic Mixture in Latent Heat Thermal Storage Systems with Tube and Fins
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作者 丁磊 WANG Lixiong +2 位作者 Georgios Kokogiannakis Lü Yajun 周卫兵 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2017年第4期753-759,共7页
In order to obtain the suitable phase change material(PCM) with low phase change temperature and improve its heat transfer rate, experimental investigation was conducted. Firstly, different mass ratios of lauric aci... In order to obtain the suitable phase change material(PCM) with low phase change temperature and improve its heat transfer rate, experimental investigation was conducted. Firstly, different mass ratios of lauric acid(LA) and stearic acid(SA) eutectic mixtures were prepared and characterized by differential scanning calorimetry(DSC). Then, the performance of eutectic mixture during charging process under different fin widths in vertical condition, and performance during charging and discharging processes under different inlet temperature heat transfer fluid(HTF) in horizontal condition were investigated, respectively. The results revealed that the LA-SA eutectic mixture had the suitable phase change temperature and desired latent heat for low-temperature water floor heating system. Wide fins and high inlet temperature HTF significantly enhanced the transfer rate and decreased the melting time. 展开更多
关键词 LA-SA binary eutectic mixture thermal properties heat exchanger heat transfer mechanism
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Effects of thermal transport properties on temperature distribution within silicon wafer
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作者 王爱华 牛义红 +1 位作者 陈铁军 P.F.HSU 《Journal of Central South University》 SCIE EI CAS 2014年第4期1402-1410,共9页
A combined conduction and radiation heat transfer model was used to simulate the heat transfer within wafer and investigate the effect of thermal transport properties on temperature non-uniformity within wafer surface... A combined conduction and radiation heat transfer model was used to simulate the heat transfer within wafer and investigate the effect of thermal transport properties on temperature non-uniformity within wafer surface. It is found that the increased conductivities in both doped and undoped regions help reduce the temperature difference across the wafer surface. However, the doped layer conductivity has little effect on the overall temperature distribution and difference. The temperature level and difference on the top surface drop suddenly when absorption coefficient changes from 104 to 103 m-1. When the absorption coefficient is less or equal to 103 m-1, the temperature level and difference do not change much. The emissivity has the dominant effect on the top surface temperature level and difference. Higher surface emissivity can easily increase the temperature level of the wafer surface. After using the improved property data, the overall temperature level reduces by about 200 K from the basis case. The results will help improve the current understanding of the energy transport in the rapid thermal processing and the wafer temperature monitor and control level. 展开更多
关键词 silicon wafer thermal transport properties temperature distribution radiation heat transfer
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