Microstructure and optical absorption properties of Au/NiO thin films

Au nanoparticles dispersed NiO composite films were prepared by a chemical solution method.The phase structure,microstructure,surface chemical state,and optical absorption properties of the films were characterized by X-ray diffraction,transmission electron microscopy,X-ray photoelectron spectroscopy,and Uv-vis spectrometer.The results indicate that Au particles with the average diameters of 35-42 nm are approximately spherical and disperse in the NiO matrix.The optical absorption peaks due to the surface plasmon resonance of Au particles shift to the shorter wavelength and intensify with the increase of Au content.The bandwidth narrows when the Au content increases from 8.4wt% to 45.2wt%,but widens by further increasing the Au content from 45.2wt% to 60.5wt%.The band gap Eg increases with the increase of Au contents from 8.4wt% to 45.2wt%,but decreases by further increasing the Au content.

Ultraviolet Optical Properties and Structural Characteristics of Radio Frequency-Deposited HfO2 Thin Films

Hafnium oxide (HfO2) thin films were deposited on quartz substrate by radio frequency magnetron sputtering with power from 160 W to 240 W. The optical and microstructural properties of samples before and after annealing were characterized by XRD, XPS, UV-VISNIR spectrophotometer and ellipsometer. The results show optical transmittances with low absorption in wavelength range above λ=200 nm for all samples. The appropriate annealing can transfer the amorphous state of as-deposited films to the crystal film, contribute to the growth of nanocrystalline and compressive stress, optimize the stoichiometry of the film and systematically improve film density and the refractive index. In consideration of the stability of proper refractive index (>2) and high optical transmittance in UV band, HfO2 films deposited approximately at 220 W can be used in UV anti-reflection system.

Effects of the sputtering power on the crystalline structure and optical properties of the silver oxide films deposited using direct-current reactive magnetron sputtering

This paper reports that a series of silver oxide （AgzO） films are deposited on glass substrates by direct-current reactive magnetron sputtering at a substrate temperature of 250 ℃ and an oxygen flux ratio of 15：18 by modifying the sputtering power （SP）. The AgxO films deposited apparently show a structural evolution from cubic biphased （AgO ＋ Ag20） to cubic single-phased （Ag20）, and to biphased （Ag20 ＋ AgO） structure. Notably, the cubic single-phased Ag20 fihn is deposited at the SP = 105 W and an AgO phase with （220） orientation discerned in the Ag^O films deposited using the SP 〉 105 W. The transmissivity and refiectivity of the AgxO films in transparent region decrease with the increase the SP, whereas the absorptivity inversely increases with the increase of the SP. These results may be due to the structural evolution and the increasing film thickness. A redshift of the films＇ absorption edges determined in terms of Tauc formula clearly occurs from 3.1 eV to 2.73 eV with the increase of the SP.

Influence of Sn Low Doping on the Morphological, Structural and Optical Properties of ZnO Films Deposited by Sol Gel Dip-Coating

In this work, Undoped Zinc Oxide (ZnO) and Sndoped Zinc Oxide (ZnO:Sn) films have been deposited by sol-gel dip coating method, where the Sn/Zn atomic ratio was 3% and 5% in the solution. The effects of Sn incorporation on morphological, structural and optical properties of ZnO films were investigated. The Scanning Electron Microscopy (SEM) showed that the morphological surface of the films was affected by Sn low doping. The X-Ray Diffraction (XRD) patterns showed that all films have polycrystalline structures, and the doping incorporation has not lead to substantial changes in the structural characteristics of ZnO films. The crystallite size was calculated using the well-known Scherrer’s formula and found to be in the range of 23 - 40 nm. The measurements from UV-Visible Spectrophotometer (U-Vis) indicated that the highest average optical transmittance in the visible region was related to Undoped ZnO film, then the optical band gap and Urbach energy values of thin films were calculated. The X-Ray Photoelectron Spectroscopy (XPS) has demonstrated that Sn is incorporated in ZnO lattice.

Dual-phase coexistence enables to alleviate resistance drift in phase-change films

The amorphous phase-change materials with spontaneous structural relaxation leads to the resistance drift with the time for phase-change neuron synaptic devices. Here, we modify the phase change properties of the conventional Ge_2Sb_2Te_5(GST) material by introducing an SnS phase. It is found that the resistance drift coefficient of SnS-doped GST was decreased from 0.06 to 0.01. It can be proposed that the origin originates from the precipitation of GST nanocrystals accompanied by the precipitation of SnS crystals compared to single-phase GST compound systems. We also found that the decrease in resistance drift can be attributed to the narrowed bandgap from 0.65 to 0.43 eV after SnS-doping. Thus, this study reveals the quantitative relationship between the resistance drift and the band gap and proposes a new idea for alleviating the resistance drift by composition optimization, which is of great significance for finding a promising phase change material.

Interaction of RuO₂and Lead-Silicate Glass in Thick-Film Resistors

Results of investigation of X-ray diffraction, infrared and optical spectra of powders of the ruthenium dioxide, lead-silicate glass as well as their mixture before and after sintering are reported. Sintering conditions typical for thick film resistors were used. Intensity of main lines of RuO2 in X-ray diffraction patterns of sintered mixtures decreases and they slightly shift towards small angles. No new reflexes appear in these patterns. Absorbance of RuO2 in the range of 2.5-100 μm is proportional to and featureless. Infrared spectrum of lead-silicate glass has absorption bands of [SiO4]4- tetrahedra and Pb-O bonds only. Optical spectrum of RuO2 has wide absorption bands at 950 and 370 nm. Spectra of the mixture of RuO2 and glass powders before and after sintering are different indicating that there is interaction between them during the sintering process. Concentration of free charge carriers estimated from the optical spectra is about 1021 cm-3.

Effect of Substrates on the Properties of ZnO Thin Films Grown by Pulsed Laser Deposition

Polycrystalline zinc oxide (ZnO) thin films have been deposited at 450°C onto glass and silicon substrates by pulsed laser deposition technique (PLD). The used source was a KrF excimer laser (248 nm, 25 ns, 5 Hz, 2 J/cm2). The effects of glass and silicon substrates on structural and optical properties of ZnO films have been investigated. X-ray diffraction patterns showed that ZnO films are polycrystalline with a hexagonal wurtzite—type structure with a strong (103) orientation and have a good crystallinity on monocrystalline Si(100) substrate. The thickness and compositional depth profile were studied by Rutherford Backscattering spectrometry (RBS). The average transmittance of ZnO films deposited on glass substrate in the visible range is 70%.

Structure, Optical Property and Thermal Stability of Copper Nitride Films Prepared by Reactive Radio Frequency Magnetron Sputtering

Copper nitride （Cu3N） films were prepared by reactive radio frequency magnetron sputtering at various nitrogen partial pressures, and the films were annealed at different temperatures. The crystal structure of the films was identified by X-ray diffraction technique. The Cu3N films have a cubic anti-ReO3 structure, and lattice constant is 0.3855 nm. With increasing nitrogen partial pressure, the Cu3N films are strongly textured with the crystal direction [100]. The atomic force microscope images show that the films presence a smooth and compact morphology with nanocrystallites of about 70 nm in size. The films were further characterized by UV-visible spectrometer, and the optical band gap of the films was calculated from the Tauc equation. The typical value of optical band gap of the films is about 1.75 eV, and it increases with increasing nitrogen partial pressure. The thermal property of the films was measured by thermogravimetry, and the decomposition temperature of the films was about 530 K.

Structural, Optical, and Electrical Properties of Zn-Doped CdO Thin Films Fabricated by a Simplified Spray Pyrolysis Technique

Thin films of zinc-doped cadmium oxide with different Zn-doping levels（0, 2, 4, 6, and 8 at%） were deposited on glass substrates by employing an inexpensive, simplified spray technique using perfume atomizer at relatively low substrate temperature（375 °C） compared with the conventional spray method. The effect of Zn doping on the structural,morphological, optical, and electrical properties of the films was investigated. XRD patterns revealed that all the films are polycrystalline in nature having cubic crystal structure with a preferential orientation along the（1 1 1） plane irrespective of Zn-doping level. Zn-doping level causes a slight shift in the（1 1 1） diffraction peak toward higher angle. The crystallite size of the films was found to be in the range of 28–37 nm. The band gap value increases with Zn doping and reaches a maximum of 2.65 eV for the film coated with 6 at% Zn doping and for further higher doping concentration it decreases.Electrical studies indicate that Zn doping causes a reduction in the resistivity of the films and a minimum resistivity of15.69 X cm is observed for the film coated with 6 at% Zn.

Characterization and application in XRF of HfO_(2)-coated glass monocapillary based on atomic layer deposition

Coating a glass monocapillary x-ray optics with high-density film is a promising way to improve transmission characteristics. For a long time, it has been a challenge to coat a high-density film in the inside of monocapillary with an extremely high length-to-diameter ratio. In this work, Hf O2 film is deposited on the inner wall of a tapered glass monocapillary with length 9.9 cm, entrance diameter 596.4 μm, and exit diameter 402.3 μm by atomic layer deposition. The coated and uncoated monocapillaries are studied by the transmission process of x-rays with energy from 5 ke V to 100 ke V and the x-ray fluorescence(XRF) spectra of a Mo sample are detected. Improved transmission characteristics have been obtained for the Hf O2-coated monocapillary. The energy upper limit of focused x-rays increases from 18.1 ke V to 33.0 ke V and the ‘penetration halo’ is suppressed to some extent. The XRF spectrum presents two stronger peaks at ~ 17.4 ke V and~ 19.6 ke V which are considered as the characteristic x-rays of Mo Kα and Mo Kβ. These results reveal that more higher energy x-rays from the W x-ray tube are totally reflected on the inner wall of the Hf O2-coated glass monocapillary due to the increase of total reflection critical angle. This work is significant for more applications of monocapillary in higher energy x-ray field.

Thickness Dependent Physical Properties of Thermally Evaporated Nanocrystalline CdSe Thin Films

This paper presents a study on thickness dependent physical properties of cadmium selenide thin films. The films of thickness 445, 631 and 810 nm were deposited employing thermal evaporation technique on glass and ITO-coated glass substrates followed by thermal annealing in air atmosphere at 200 °C. These films were subjected to X-ray diffractometer, UV-Vis spectrophotometer, scanning electron microscopy（SEM） and electrometer for structural, optical,surface morphological and electrical analysis respectively. The structural analysis reveals that the films are nanocrystalline in nature with cubic phase and preferred orientation（111）. The crystallographic parameters such as lattice constant, interplanar spacing, grain size, internal strain, dislocation density, number of crystallites per unit area and texture coefficient are calculated and discussed. The optical band gap is found in the range 1.75-1.92 e V and observed to increase with thickness.The SEM study shows that the annealed films are uniform, fully covered and well defined. The electrical analysis shows that the conductivity is varied with film thickness and found within the order of semiconductor behavior.

Properties of CdTe nanocrystalline thin films grown on different substrates by low temperature sputtering

CdTe nanocrystalline thin films have been prepared on glass, Si and Al2O3 substrates by radio-frequency magnetron sputtering at liquid nitrogen temperature. The crystal structure and morphology of the films were charac-terized by X-ray diffraction （XRD） and field-emission scanning electron microscopy （FESEM）. The XRD examinations revealed that CdTe films on glass and Si had a better crystal quality and higher preferential orientation along the （111） plane than the Al2O3. FESEM observations revealed a continuous and dense morphology of CdTe films on glass and Si substrates. Optical properties of nanocrystalline CdTe films deposited on glass substrates for different deposited times were studied.

Magnetron sputtered Dy2O3 with chromium and copper contents for antireflective thin films with enhanced absorption

Dy2O3 is a rare earth oxide having a number of advanced applications in various fields including protective or antireflective coatings,Main objective of this novel research work is to check the effect of Cr and Cu addition on different properties of Dy2O3 and achievement of antireflective thin films with enhanced abso rption.Thin films of these materials we re deposited using DC magnetron with reactive cosputtering.XRD studies reveals the crystalline nature of thin films having Dy2O3(222)reflection in all samples with Cr2O3(116)and CuO(111)reflections in Cr and Cu containing compositions.Field emission scanning electron microscopy demonstrates the homogeneous deposition of thin films with uniform shape,size and distribution of grains.Refractive index,extinction coefficient and absorption coefficient significantly increase while optical reflectance decreases with Cr and Cu mediation corroborating an improved antireflective mechanism.The imaginary part of dielectric constant is found to increase slightly with low tangent loss for Cr containing composition co nsidered favorable for energy storage applications.

Substrate Temperature-Dependent Physical Properties of Thermally Evaporated Sn4Sb6S13 Thin Films

In this work, the homogenous thin films of sulfosalt Sn4Sb6S13 were successfully synthesized by the thermal evaporation technique onto coming 7059 glass substrates heated at various temperatures in the range of 30--200 ℃. The surface morphology and structural characteristics of Sn4Sb6S13 films were analyzed by atomic force microscopy, X-ray diffraction, and energy-dispersive X-ray, respectively. The X-ray diffraction analysis revealed that Sn4Sb6S13 thin films crystallized in monoclinic structure according to a preferential direction （6 11）. An improvement in the structural properties by increasing the substrate temperature was observed. The values of some important parameters such as absorption coefficient （x）, band gap （Eg）, refractive index （n）, extinction coefficient （k）, and dielectric constant （Eg） of thin film were determined. The absorption coefficient was larger than 105 cm-l in the visible range. The electron transition of Sn4Sb6S13 films was direct allowed with the values that decreased （2-1.69 eV） by increasing substrate temperature from 30 to 200 ℃,The dispersion data obeyed the single oscillator relation of the Wemple-DiDomenico model and Cauchy model. The electrical free carrier susceptibility and the carrier concentration of the effective mass ratio were estimated according to the model of Spitzer and Fan.

Synthesis and Characterization of Copper Doped Zinc Oxide Thin Films Deposited by RF/DC Sputtering Technique

Undoped and copper(Cu)doped zinc oxide(Zn_(1-x)Cu_(x)O,where x=0-0.065)nano crystal thin films have been deposited on glass substrate via RF/DC reactive co-sputtering technique.The aim of this work is to investigate the crystal structure of ZnO and Cu doped ZnO thin films and also study the effect of Cu doping on optical band gap of ZnO thin films.The identification and confirmation of the crystallinity,film thickness and surface morphology of the nano range thin films are confirmed by using X-ray diffractometer(XRD),scanning electron microscope and atomic force microscope.The XRD peak at a diffractive angle of 34.44°and Miller indices at(002)confirms the ZnO thin films.Crystallite size of undoped ZnO thin films is 27 nm and decreases from 27 nm to 22 nm with increasing the atomic fraction of Cu(x_(Cu))in the ZnO thin films from 0 to 6.5%respectively,which is calculated from XRD(002)peaks.The different bonding information of all deposited films was investigated by Fourier transform infrared spectrometer in the range of wave number between 400 cm^(-1) to 4000 cm^(-1).Optical band gap energy of all deposited thin films was analyzed by ultraviolet visible spectrophotometer,which varies from 3.35 eV to 3.19 eV with the increase of x_(Cu) from 0 to 6.5%respectively.Urbach energy of the deposited thin films increases from 115 meV to 228 meV with the increase of x_(Cu) from 0 to 6.5% respectively.

The effect of annealing temperature and the characteristics of p-n junction diodes based on sprayed polyaniline/ZnO thin films

Polyaniline,ZnO and polyaniline/ZnO nanocomposite thin films are coated on glass substrates using the spray pyrolysis technique.The samples are characterized by the XRD,SEM,EDAX,UV-Vis and I-V characteristics. The XRD analyses confirm that the spray-coated polyaniline and ZnO thin films have orthorhombic and hexagonal structures,respectively,and optical bandgap energy decreases from 3.81 to 3.41 eV with the addition of a Zn atom.SEM analysis of the polyaniline/ZnO nanocomposite thin films shows that there is an agglomeration of ZnO particles with uniform distribution in the polyaniline matrix,and the diode characteristics of the polyaniline /ZnO nanocomposite show weak rectification behavior.Parameters such as the ideality factor,reverse saturation current and barrier height are calculated from the I-V characteristics.

基于模拟退火算法的宽角度X射线超反射镜设计研究

应用于硬X射线波段的宽带多层膜光学元件——宽角度X射线超反射镜的设计可以归结为一个连续变量的多维多极值的全局优化问题。缺少一种有效的全局优化方法是阻碍解决这一难题的一个关键。模拟退火算法是一种简单而且通用的全局优化算法。结合光学多层膜的设计原理提出了利用模拟退火算法来进行宽角度X射线超反射镜设计的新方法。结合已有的方法选择了W和C作为膜层的膜对材料，设计出Cu的Kα线处角度范围0．9°～1．1°反射率达到20%的宽角度X射线超反射镜。并在此基础上采用改进的自适应模拟退火算法实现了Cu的Kα线处宽角度X射线超反射镜的理想设计结果。设计结果表明了模拟退火算法在多层膜最优化设计领域的正确性和有效性。