The deposition of organosilicone thin films from hexamethyldisiloxane（HMDSO） by using a dual-frequency （50 kHz/33 MHz） atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was ...The deposition of organosilicone thin films from hexamethyldisiloxane（HMDSO） by using a dual-frequency （50 kHz/33 MHz） atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was investigated.The topography was measured by using scanning electron microscopy.The chemical bond and composition of these films were analyzed by Fourier transform infrared spectroscopy （FTIR） and x-ray photoelectron spectroscopy.The results indicated that the as-deposited film was constituted by silicon,carbon,and oxygen elements,and FTIR suggested the films are organosilicon with the organic component （-CHx） and hydroxyl functional group（-OH） connected to the Si-O-Si backbone.Thin-film hardness was recorded by an MH-5-VM Digital Micro-Hardness Tester.Radio frequency power had a strong impact on film hardness and the hardness increased with increasing power.展开更多
为了对真空射流流场进行研究,应用Fluent软件并基于VOF（volume of fluid）方法、k-ε标准湍模型及PISO算法,对不同喷口直径及入射压力的直射式锥型流道喷嘴的射流流场速度和湍流运动分布进行了数值模拟分析.结果表明：1）入口压力相同...为了对真空射流流场进行研究,应用Fluent软件并基于VOF（volume of fluid）方法、k-ε标准湍模型及PISO算法,对不同喷口直径及入射压力的直射式锥型流道喷嘴的射流流场速度和湍流运动分布进行了数值模拟分析.结果表明：1）入口压力相同,喷嘴直径越大,射流与周围介质间的速度梯度越大,可促进射流的扩散和液滴破碎后的尺寸均匀分布;2）喷嘴直径一定,入口压力在10~15 MPa内,射流湍流强度分布达到最佳状态,射流流场较好;3）如果不考虑材料的溶解性,相对于三氯甲烷和四氯化碳,丙酮作为溶剂时的液体喷射雾化效果较好,适于制备质量较好的高分子薄膜.展开更多
基金supported by National Natural Science Foundation of China(Grant No.11165012,Grant No. 11665012)the Project of the Natural Science Foundation of GanSu(145RJZA159)
文摘The deposition of organosilicone thin films from hexamethyldisiloxane（HMDSO） by using a dual-frequency （50 kHz/33 MHz） atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was investigated.The topography was measured by using scanning electron microscopy.The chemical bond and composition of these films were analyzed by Fourier transform infrared spectroscopy （FTIR） and x-ray photoelectron spectroscopy.The results indicated that the as-deposited film was constituted by silicon,carbon,and oxygen elements,and FTIR suggested the films are organosilicon with the organic component （-CHx） and hydroxyl functional group（-OH） connected to the Si-O-Si backbone.Thin-film hardness was recorded by an MH-5-VM Digital Micro-Hardness Tester.Radio frequency power had a strong impact on film hardness and the hardness increased with increasing power.
文摘为了对真空射流流场进行研究,应用Fluent软件并基于VOF（volume of fluid）方法、k-ε标准湍模型及PISO算法,对不同喷口直径及入射压力的直射式锥型流道喷嘴的射流流场速度和湍流运动分布进行了数值模拟分析.结果表明：1）入口压力相同,喷嘴直径越大,射流与周围介质间的速度梯度越大,可促进射流的扩散和液滴破碎后的尺寸均匀分布;2）喷嘴直径一定,入口压力在10~15 MPa内,射流湍流强度分布达到最佳状态,射流流场较好;3）如果不考虑材料的溶解性,相对于三氯甲烷和四氯化碳,丙酮作为溶剂时的液体喷射雾化效果较好,适于制备质量较好的高分子薄膜.
