A complete model of Metal-Semiconductor-Metal Photodetector(MSM-PD) is presented. It can be used in any circuit simulators. Simulated DC characteristics for a GaAs MSM-PD are in good agreement with reported results.
Metal-semiconductor-metal photodetectors on semi-insulating Ga As with interdigital electrodes showed significant enhancement in the spectral response in the near-infrared region as the electrode spacing is reduced. T...Metal-semiconductor-metal photodetectors on semi-insulating Ga As with interdigital electrodes showed significant enhancement in the spectral response in the near-infrared region as the electrode spacing is reduced. The photocurrent for the device with 5 μm interdigital spacing is five orders of magnitude higher than the dark current, and the room temperature detectivity is on the order of 2.4 × 1012cm Hz1∕2W-1at 5 V bias. Furthermore,the spectral response of this device possesses strong dependence on the polarization of incident light showing potential plasmonic effects with only microscale dimensions. These experimental data were analyzed using optical simulation to confirm the response of the devices.展开更多
A two-dimensional model of a metal-semiconductor-metal （MSM） ZnO-based photodetector （PD） is developed. The PD is based on a drift diffusion model of a semiconductor that allows the calculation of potential distri...A two-dimensional model of a metal-semiconductor-metal （MSM） ZnO-based photodetector （PD） is developed. The PD is based on a drift diffusion model of a semiconductor that allows the calculation of potential distribution inside the structure, the transversal and longitudinal distributions of the electric field, and the distribution of carrier concentration. The ohmicity of the contact has been confirmed. The dark current of MSM PD based ZnO for different structural dimensions are likewise calculated. The calculations are comparable with the experimental results. Therefore, the influence with respect to parameters s （finger spacing） and w （finger width） is studied, which results in the optimization of these parameters. The best optimization found to concur with the experimental results is s = 16 μm, w = 16 μm, l = 250 μm, L = 350 μm, where l is the finger length and L is the length of the structure. This optimization provides a simulated dark current eaual to 24.5 nA at the polarization of 3 V.展开更多
In this work,β-Ga_(2)O_(3)thin films were grown on SiO_(2)substrate by atomic layer deposition(ALD)and annealed in N_(2)atmosphere to enhance the crystallization quality of the thin films,which were verified from X-r...In this work,β-Ga_(2)O_(3)thin films were grown on SiO_(2)substrate by atomic layer deposition(ALD)and annealed in N_(2)atmosphere to enhance the crystallization quality of the thin films,which were verified from X-rays diffraction(XRD).Based on the grownβ-Ga_(2)O_(3)thin films,vertical metal-semiconductor-metal(MSM)interdigital photodetectors(PDs)were fabricated and investigated.The PDs have an ultralow dark current of 1.92 pA,ultra-high photo-to-dark current ratio(PDCR)of 1.7×10^(6),and ultra-high detectivity of 4.25×10^(14)Jones at a bias voltage of 10 V under 254 nm deep ultraviolet(DUV).Compared with the horizontal MSM PDs under the same process,the PDCR and detectivity of the fabricated vertical PDs are increased by 1000 times and 100 times,respectively.In addition,the vertical PDs possess a high responsivity of 34.24 A/W and an external quantum efficiency of 1.67×10^(4)%,and also exhibit robustness and repeatability,which indicate excellent performance.Then the effects of electrode size and external irradiation conditions on the performance of the vertical PDs continued to be investigated.展开更多
Unintentionally doped AlGaN thin films are grown on c-plane(0001) sapphire substrate by metal-organic chemical vapor deposition, and low-temperature AlN is deposited onto sapphire substrate used as a bu?er layer. AlGa...Unintentionally doped AlGaN thin films are grown on c-plane(0001) sapphire substrate by metal-organic chemical vapor deposition, and low-temperature AlN is deposited onto sapphire substrate used as a bu?er layer. AlGaN metal-semiconductor-metal ultraviolet photodetectors with Ni/Au interdigitated contact electrodes are then fabricated by lift-off technology. The dark current of the AlGaN photodetectors is 5.61×10-9 A at 2-V applied bias and the peak response occurrs at 294 nm.展开更多
文摘A complete model of Metal-Semiconductor-Metal Photodetector(MSM-PD) is presented. It can be used in any circuit simulators. Simulated DC characteristics for a GaAs MSM-PD are in good agreement with reported results.
基金supported by the Air Force Office of Scientific Research (Grant No. FA9550-10-1-0136)NASA (Grant No. 242026-1BBX11AQ36A)+1 种基金supported by a University of Arkansas Honors College Undergraduate Research grantthe Microelectronics–Photonics program at the University of Arkansas for the COMSOL license
文摘Metal-semiconductor-metal photodetectors on semi-insulating Ga As with interdigital electrodes showed significant enhancement in the spectral response in the near-infrared region as the electrode spacing is reduced. The photocurrent for the device with 5 μm interdigital spacing is five orders of magnitude higher than the dark current, and the room temperature detectivity is on the order of 2.4 × 1012cm Hz1∕2W-1at 5 V bias. Furthermore,the spectral response of this device possesses strong dependence on the polarization of incident light showing potential plasmonic effects with only microscale dimensions. These experimental data were analyzed using optical simulation to confirm the response of the devices.
文摘A two-dimensional model of a metal-semiconductor-metal （MSM） ZnO-based photodetector （PD） is developed. The PD is based on a drift diffusion model of a semiconductor that allows the calculation of potential distribution inside the structure, the transversal and longitudinal distributions of the electric field, and the distribution of carrier concentration. The ohmicity of the contact has been confirmed. The dark current of MSM PD based ZnO for different structural dimensions are likewise calculated. The calculations are comparable with the experimental results. Therefore, the influence with respect to parameters s （finger spacing） and w （finger width） is studied, which results in the optimization of these parameters. The best optimization found to concur with the experimental results is s = 16 μm, w = 16 μm, l = 250 μm, L = 350 μm, where l is the finger length and L is the length of the structure. This optimization provides a simulated dark current eaual to 24.5 nA at the polarization of 3 V.
基金the Natural Science Basic Research Program in Shaanxi Province of China(2023-JC-YB-574)the National Natural Science Foundation of China(62304178)。
文摘In this work,β-Ga_(2)O_(3)thin films were grown on SiO_(2)substrate by atomic layer deposition(ALD)and annealed in N_(2)atmosphere to enhance the crystallization quality of the thin films,which were verified from X-rays diffraction(XRD).Based on the grownβ-Ga_(2)O_(3)thin films,vertical metal-semiconductor-metal(MSM)interdigital photodetectors(PDs)were fabricated and investigated.The PDs have an ultralow dark current of 1.92 pA,ultra-high photo-to-dark current ratio(PDCR)of 1.7×10^(6),and ultra-high detectivity of 4.25×10^(14)Jones at a bias voltage of 10 V under 254 nm deep ultraviolet(DUV).Compared with the horizontal MSM PDs under the same process,the PDCR and detectivity of the fabricated vertical PDs are increased by 1000 times and 100 times,respectively.In addition,the vertical PDs possess a high responsivity of 34.24 A/W and an external quantum efficiency of 1.67×10^(4)%,and also exhibit robustness and repeatability,which indicate excellent performance.Then the effects of electrode size and external irradiation conditions on the performance of the vertical PDs continued to be investigated.
基金supported by the National Natural Science Foundation of China(No.61006052)the Fundamental Research Funds for the Central Universities(No.K5051325009)
文摘Unintentionally doped AlGaN thin films are grown on c-plane(0001) sapphire substrate by metal-organic chemical vapor deposition, and low-temperature AlN is deposited onto sapphire substrate used as a bu?er layer. AlGaN metal-semiconductor-metal ultraviolet photodetectors with Ni/Au interdigitated contact electrodes are then fabricated by lift-off technology. The dark current of the AlGaN photodetectors is 5.61×10-9 A at 2-V applied bias and the peak response occurrs at 294 nm.
