NiTi shape memory alloys（SMA） have many biomedical applications due to their excellent mechanical and biocompatible properties. However, nickel in the alloy may cause allergic and toxic reactions, which limit some a...NiTi shape memory alloys（SMA） have many biomedical applications due to their excellent mechanical and biocompatible properties. However, nickel in the alloy may cause allergic and toxic reactions, which limit some applications. In this work, titanium oxynitride films were deposited on NiTi samples by high vacuum magnetron sputtering for various nitrogen and oxygen gas flow rates. The x-ray diffraction（XRD） and x-ray photoelectron spectroscopy（XPS） results reveal the presence of different phases in the titanium oxynitride thin films. Energy dispersive spectroscopy（EDS） elemental mapping of samples after immersion in simulated body fluids（SBF） shows that Ni is depleted from the surface and cell cultures corroborate the enhanced biocompatibility in vitro.展开更多
Gallium-titanium-zinc oxide(GTZO) transparent conducting oxide(TCO) thin films were deposited on glass substrates by radio frequency magnetron sputtering. The dependences of the microstructure and optoelectronic prope...Gallium-titanium-zinc oxide(GTZO) transparent conducting oxide(TCO) thin films were deposited on glass substrates by radio frequency magnetron sputtering. The dependences of the microstructure and optoelectronic properties of GTZO thin films on Ar gas pressure were observed. The X-ray diffraction(XRD) and scanning electron microscopy(SEM) results show that all the deposited films are polycrystalline with a hexagonal structure and have a preferred orientation along the c-axis perpendicular to the substrate. With the increment of Ar gas pressure, the microstructure and optoelectronic properties of GTZO thin films will be changed. When Ar gas pressure is 0.4 Pa, the deposited films possess the best crystal quality and optoelectronic properties.展开更多
CO2 and O2 were employed as reactive gases to fabricate carbon-doped titanium oxide films using DC reactive magnetron sputtering. Microstructure, composition and optical band gap of the films were investigated by X-ra...CO2 and O2 were employed as reactive gases to fabricate carbon-doped titanium oxide films using DC reactive magnetron sputtering. Microstructure, composition and optical band gap of the films were investigated by X-ray diffraction, X-ray photoelectron spectroscopy, and UV-visible spectrophotometer, respectively. The results showed that carbon-doped titanium monoxide films （C-TiO） with a carbon concentration of 5.8 at.% were obtained in an AffCO2 mixed atmosphere. However, carbon-doped futile and anatase （C-TiO2） with a carbon concentration of about 1.4 at.% were obtained in an Ar/CO2/O2 mixed atmosphere. The optical band gaps of C-TiO and C-TiO2 were about 2.6 and 2.9 eV, respectively. Both of them were narrower than that of pure TiO2 films. Films with narrowed optical band gap energy are promising in promoting their photo-catalytic activity.展开更多
In order to fabricate titania nanotubes on glass substrate, Ti thin films (700-900 nm) were first deposited by radio-frequency(RF) magnetron sputtering and then anodized in an aqueous HF electrolyte solution at room t...In order to fabricate titania nanotubes on glass substrate, Ti thin films (700-900 nm) were first deposited by radio-frequency(RF) magnetron sputtering and then anodized in an aqueous HF electrolyte solution at room temperature. The morphology and structure of the nanotubes were identified by means of field emission scanning electron microscopy(FE-SEM) and X-ray diffractometry(XRD). The effects of anodization parameters (concentration of electrolyte, applied voltage) on nanotube morphology were comprehensively investigated. The results show that the dense and crystalline Ti film can be obtained on the unheated glass substrate under the sputtering power of 150 W, and the anodization current and voltage play significant roles in the formation of titania nanotube with different tube sizes.展开更多
采用磁控溅射法在不同V靶功率下制得一系列不同V含量的TiAlVN膜。通过能谱分析、X射线衍射、硬度测量和高温退火研究了V原子分数对Ti Al VN膜成分、晶相结构、硬度和抗高温氧化性能的影响。结果表明,不同V含量的TiAlVN膜均为面心立方结...采用磁控溅射法在不同V靶功率下制得一系列不同V含量的TiAlVN膜。通过能谱分析、X射线衍射、硬度测量和高温退火研究了V原子分数对Ti Al VN膜成分、晶相结构、硬度和抗高温氧化性能的影响。结果表明,不同V含量的TiAlVN膜均为面心立方结构,呈TiN(111)面择优取向。随V原子分数的增大,TiAlVN膜的硬度增大,抗高温氧化性能变差。当V原子分数为16.96%(即磁控溅射的V靶功率为60 W)时,TiAlVN膜的硬度最高(为31.67 GPa),抗高温氧化性能较好。展开更多
基金Project supported by the Higher Education Commission,Hong Kong Research Grants Council(RGC)General Research Funds(GRF),China(Grant No.112212)the City University of Hong Kong Applied Research Grant(ARG),China(Grant No.9667066)
文摘NiTi shape memory alloys（SMA） have many biomedical applications due to their excellent mechanical and biocompatible properties. However, nickel in the alloy may cause allergic and toxic reactions, which limit some applications. In this work, titanium oxynitride films were deposited on NiTi samples by high vacuum magnetron sputtering for various nitrogen and oxygen gas flow rates. The x-ray diffraction（XRD） and x-ray photoelectron spectroscopy（XPS） results reveal the presence of different phases in the titanium oxynitride thin films. Energy dispersive spectroscopy（EDS） elemental mapping of samples after immersion in simulated body fluids（SBF） shows that Ni is depleted from the surface and cell cultures corroborate the enhanced biocompatibility in vitro.
基金supported by the National Natural Science Foundation of China(No.11504436)the Natural Science Foundation of Hubei Province(No.2015CFB364)the Fundamental Research Funds for the Central Universities(Nos.CZW14019 and CZW15045)
文摘Gallium-titanium-zinc oxide(GTZO) transparent conducting oxide(TCO) thin films were deposited on glass substrates by radio frequency magnetron sputtering. The dependences of the microstructure and optoelectronic properties of GTZO thin films on Ar gas pressure were observed. The X-ray diffraction(XRD) and scanning electron microscopy(SEM) results show that all the deposited films are polycrystalline with a hexagonal structure and have a preferred orientation along the c-axis perpendicular to the substrate. With the increment of Ar gas pressure, the microstructure and optoelectronic properties of GTZO thin films will be changed. When Ar gas pressure is 0.4 Pa, the deposited films possess the best crystal quality and optoelectronic properties.
基金supported by the National Natural Science Foundation of China (Nos.81171462 and 51062002)the Sichuan Youth Science & Technology Foundation for Distinguished Young Scholars (No.2012JQ0001)the Fundamental Research Funds for the Central Universities (Nos.SWJTU11CX078 and SWJTU12ZT08)
文摘CO2 and O2 were employed as reactive gases to fabricate carbon-doped titanium oxide films using DC reactive magnetron sputtering. Microstructure, composition and optical band gap of the films were investigated by X-ray diffraction, X-ray photoelectron spectroscopy, and UV-visible spectrophotometer, respectively. The results showed that carbon-doped titanium monoxide films （C-TiO） with a carbon concentration of 5.8 at.% were obtained in an AffCO2 mixed atmosphere. However, carbon-doped futile and anatase （C-TiO2） with a carbon concentration of about 1.4 at.% were obtained in an Ar/CO2/O2 mixed atmosphere. The optical band gaps of C-TiO and C-TiO2 were about 2.6 and 2.9 eV, respectively. Both of them were narrower than that of pure TiO2 films. Films with narrowed optical band gap energy are promising in promoting their photo-catalytic activity.
文摘In order to fabricate titania nanotubes on glass substrate, Ti thin films (700-900 nm) were first deposited by radio-frequency(RF) magnetron sputtering and then anodized in an aqueous HF electrolyte solution at room temperature. The morphology and structure of the nanotubes were identified by means of field emission scanning electron microscopy(FE-SEM) and X-ray diffractometry(XRD). The effects of anodization parameters (concentration of electrolyte, applied voltage) on nanotube morphology were comprehensively investigated. The results show that the dense and crystalline Ti film can be obtained on the unheated glass substrate under the sputtering power of 150 W, and the anodization current and voltage play significant roles in the formation of titania nanotube with different tube sizes.
文摘采用磁控溅射法在不同V靶功率下制得一系列不同V含量的TiAlVN膜。通过能谱分析、X射线衍射、硬度测量和高温退火研究了V原子分数对Ti Al VN膜成分、晶相结构、硬度和抗高温氧化性能的影响。结果表明,不同V含量的TiAlVN膜均为面心立方结构,呈TiN(111)面择优取向。随V原子分数的增大,TiAlVN膜的硬度增大,抗高温氧化性能变差。当V原子分数为16.96%(即磁控溅射的V靶功率为60 W)时,TiAlVN膜的硬度最高(为31.67 GPa),抗高温氧化性能较好。
