Despite the growing demand for transparent conductive films in smart and wearable electronics for electromagnetic interference(EMI)shielding,achieving a flexible EMI shielding film,while maintaining a high transmittan...Despite the growing demand for transparent conductive films in smart and wearable electronics for electromagnetic interference(EMI)shielding,achieving a flexible EMI shielding film,while maintaining a high transmittance remains a significant challenge.Herein,a flexible,transparent,and conductive copper(Cu)metal mesh film for EMI shielding is fabricated by self-forming crackle template method and electroplating technique.The Cu mesh film shows an ultra-low sheet resistance(0.18Ω□^(-1)),high transmittance(85.8%@550 nm),and ultra-high figure of merit(>13,000).It also has satisfactory stretchability and mechanical stability,with a resistance increases of only 1.3%after 1,000 bending cycles.As a stretchable heater(ε>30%),the saturation temperature of the film can reach over 110°C within 60 s at 1.00 V applied voltage.Moreover,the metal mesh film exhibits outstanding average EMI shielding effectiveness of 40.4 dB in the X-band at the thickness of 2.5μm.As a demonstration,it is used as a transparent window for shielding the wireless communication electromagnetic waves.Therefore,the flexible and transparent conductive Cu mesh film proposed in this work provides a promising candidate for the next-generation EMI shielding applications.展开更多
For the crystalline temperature of BaSnO_(3)(BTO)was above 650℃,the transparent conductive BTO-based films were always deposited above this temperature on epitaxy substrates by pulsed laser deposition or molecular be...For the crystalline temperature of BaSnO_(3)(BTO)was above 650℃,the transparent conductive BTO-based films were always deposited above this temperature on epitaxy substrates by pulsed laser deposition or molecular beam epitaxy till now which limited there application in low temperature device process.In the article,the microstructure,optical and electrical of BTO and In_(2)O_(3) mixed transparent conductive BaInSnO_(x)(BITO)film deposited by filtered cathodic vacuum arc technique(FCVA)on glass substrate at room temperature were firstly reported.The BITO film with thickness of 300 nm had mainly In_(2)O_(3) polycrystalline phase,and minor polycrystalline BTO phase with(001),(011),(111),(002),(222)crystal faces which were first deposited at room temperature on amorphous glass.The transmittance was 70%–80%in the visible light region with linear refractive index of 1.94 and extinction coefficient of 0.004 at 550-nm wavelength.The basic optical properties included the real and imaginary parts,high frequency dielectric constants,the absorption coefficient,the Urbach energy,the indirect and direct band gaps,the oscillator and dispersion energies,the static refractive index and dielectric constant,the average oscillator wavelength,oscillator length strength,the linear and the third-order nonlinear optical susceptibilities,and the nonlinear refractive index were all calculated.The film was the n-type conductor with sheet resistance of 704.7Ω/□,resistivity of 0.02Ω⋅cm,mobility of 18.9 cm2/V⋅s,and carrier electron concentration of 1.6×10^(19) cm^(−3) at room temperature.The results suggested that the BITO film deposited by FCVA had potential application in transparent conductive films-based low temperature device process.展开更多
Transparent and conducting zirconium-doped zinc oxide films with high transparency and relatively low resistivity have been successfully prepared by radio frequency (RF) msgnetron sputtering at room temperature, The...Transparent and conducting zirconium-doped zinc oxide films with high transparency and relatively low resistivity have been successfully prepared by radio frequency (RF) msgnetron sputtering at room temperature, The RF power is varied from 75 to 150 W. At first the crystallinity and conductivity of the film are improved and then both of them show deterioration with the increase of the RF power, The lowest resistivity achieved is 2.07 × 10^-3Ωcm at an RF power of 100W with a Hall mobility of 16cm^2V^-1s^-1 and a carrier concentration of 1.95 × 10^20 cm^-3. The films obtained are polycryetalline with a hexagonal structure and a preferred orientation along the c-axis, All the films have a high transmittance of approximately 92% in the visible range. The optical band gap is about 3.33 eV for the films deposited at different RF powers.展开更多
To obtain high transmittance and low resistivity ZnO transparent conductive thin films,a series of ZnO ceramic targets(ZnO:Al,ZnO:(Al,Dy),ZnO:(Al,Gd),ZnO:(Al,Zr),ZnO:(Al,Nb),and ZnO:(Al,W)) were fabr...To obtain high transmittance and low resistivity ZnO transparent conductive thin films,a series of ZnO ceramic targets(ZnO:Al,ZnO:(Al,Dy),ZnO:(Al,Gd),ZnO:(Al,Zr),ZnO:(Al,Nb),and ZnO:(Al,W)) were fabricated and used to deposit thin films onto glass substrates by radio frequency(RF) magnetron sputtering.X-ray diffraction(XRD) analysis shows that the films are polycrystalline fitting well with hexagonal wurtzite structure and have a preferred orientation of the(002) plane.The transmittance of above 86% as well as the lowest resistivity of 8.43 × 10^-3 Ω·cm was obtained.展开更多
ZnO/Cu/ZnO transparent conductive thin films were prepared by RF sputtering deposition of ZnO target and DC sputtering deposition of Cu target on n-type (001) Si and glass substrates at room temperature. The mor- ph...ZnO/Cu/ZnO transparent conductive thin films were prepared by RF sputtering deposition of ZnO target and DC sputtering deposition of Cu target on n-type (001) Si and glass substrates at room temperature. The mor- phology, structure, optical, and electrical properties of the multilayer films were characterized by field emission scanning electron microscope (FESEM), X-ray diffraction (XRD), UV/Vis spectrophotometer, and Hall effect mea- surement system. The influence of Cu layer thickness and the oxygen pressure in sputtering atmosphere on the film properties were studied. ZnO/Cu/ZnO transparent conduc- tive film fabricated in pure Ar atmosphere with 10 nm Cu layer thickness has the best performance: resistivity of 2.3 × 10^-4 Ω.cm, carrier concentration of 6.44 × 10^16 cm-2, mobility of 4.51 cm2.(V.s)-1, and acceptable aver- age transmittance of 80 % in the visible range. The trans- mittance and conductivity of the films fabricated with oxygen are lower than those of the films fabricated without oxygen, which indicates that oxygen atmosphere does not improve the optical and electrical properties of ZnO/Cu/ ZnO films.展开更多
Transparent conducting F-doped texture SnO2 films with resistivity as low as 5× 10-4 Ω ·cm,with carrier concentrations between 3.5 × 1020 and 7× 1020 cm-3 and Hall mobilities from 15.7 to 20.1 cm2...Transparent conducting F-doped texture SnO2 films with resistivity as low as 5× 10-4 Ω ·cm,with carrier concentrations between 3.5 × 1020 and 7× 1020 cm-3 and Hall mobilities from 15.7 to 20.1 cm2/(V/s) have been prepared by atmosphere pressure chemical vapour deposition (APCVD). These polycrystalline films possess a variable preferred orientation, the polycrystallite sizes and orientations vary with substrate temperature. The substrate temperature and fluorine flow rate dependence of conductivity, Hall mobility and carrier conentration fOr the resultingfilms have been obtained. The temperature dependence of the mobiity and carrier concentrationhave been measured over a temperature range 16~400 K. A systematically theoretical analysis on scattering mechanisms for the highly conductive SnO2 films has been given. Both theoretical analysis and experimental results indicate that for these degenerate, polycrystalline SnO2 :F films in the low temperature range (below 100 K), ionized impurity scattering is main scattering mechanism. However, when the temperature is higher than 100 K, the lattice vibration scattering becomes dominant. The grain boundary scattering makes a small contribution to limit the mobility of the films.展开更多
Transparent conductive cadmium indium oxide films (CdIn2O4) were prepared by r.f. reactive sputtering from Cd-In alloy targets under an Ar-O2 atmosphere. Electrical conductivity of the order of 105Ω-1.m-1 and the opt...Transparent conductive cadmium indium oxide films (CdIn2O4) were prepared by r.f. reactive sputtering from Cd-In alloy targets under an Ar-O2 atmosphere. Electrical conductivity of the order of 105Ω-1.m-1 and the optical transmission as high as 94% are easily attained by postdeposition annealing treatment. The effects of oxygen concentration in the reactive gas mixture and post-deposition annealing treatment on the optical transmittance as well as optical parameters, such as refractive index (n), extinction coefficient (k), real part (ε') and imaginary part (ε') of the dielectric constant, were studied in the visible and near-infrared region. The highfrequency dielectric constant ε∞ the plasma frequency ωP, and the conduction band effective mass mc of different samples were also investigated展开更多
High transparent and conductive thin films of zinc doped tin oxide (ZTO) were deposited on quartz substrates by the radio-frequency (RF) magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic targe...High transparent and conductive thin films of zinc doped tin oxide (ZTO) were deposited on quartz substrates by the radio-frequency (RF) magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic target.The effect of substrate temperature on the structural,electrical and optical performances of ZTO films has been studied.X-ray diffraction (XRD) results show that ZTO films possess tetragonal rutile structure with the preferred orientation of (101).The surface morphology and roughness of the films was investigated by the atomic force microscope (AFM).The electrical characteristic (including carrier concentration,Hall mobility and resistivity) and optical transmittance were studied by the Hall tester and UV- VIS,respectively.The highest carrier concentration of -1.144×1020 cm-3 and the Hall mobility of 7.018 cm2(V ·sec)-1 for the film with an average transmittance of about 80.0% in the visible region and the lowest resistivity of 1.116×10-2 Ω·cm were obtained when the ZTO films deposited at 250 oC.展开更多
Al and Mn co-doped-ZnO films have been prepared at room temperature by DC reacti ve magnetron sputtering technique. The optical absorption coefficient, apparent and fundamental band gap, and work function of the films...Al and Mn co-doped-ZnO films have been prepared at room temperature by DC reacti ve magnetron sputtering technique. The optical absorption coefficient, apparent and fundamental band gap, and work function of the films have been investigated using optical spectroscopy, band structure analyses and ultraviolet photoelectro n spectroscopy (UPS). ZnO films have direct allowed transition band structure, w hich has been confirmed by the character of the optical absorption coefficient. The apparent band gap has been found directly proportional to N2/3, showing that the effect of Burstein-Moss shift on the band gap variations dominates over the many-body effect. With only standard cleaning protocols, the work function of ZnO: (Al, Mn) and ZnO: Al films have been measured to be 4.26 and 4.21eV, respec tively. The incorporation of Mn element into the matrix of ZnO, as a relatively deep donor, can remove some electrons from the conduction band and deplete the d ensity of occupied states at the Fermi energy, which causes a loss in measured p hotoemission intensity and an increase in the surface work function. Based on th e band gap and work function results, the energy band diagram of the ZnO: (Al, M n) film near its surface is also given.展开更多
Ta-doped titanium dioxide films are deposited on fused quartz substrates using the rf magnetron sputtering technique at different substrate temperatures. After post-annealing at 550℃ in a vacuum, all the films are cr...Ta-doped titanium dioxide films are deposited on fused quartz substrates using the rf magnetron sputtering technique at different substrate temperatures. After post-annealing at 550℃ in a vacuum, all the films are crystallized into the polycrystalline anatase TiO2 structure. The effects of substrate temperature from room temperature up to 350℃ on the structure, morphology, and photoelectric properties of Ta-doped titanium dioxide films are analyzed. The average transmittance in the visible region(400-800 nm) of all films is more than 73%.The resistivity decreases firstly and then increases moderately with the increasing substrate temperature. The polycrystalline film deposited at 150℃ exhibits a lowest resistivity of 7.7 × 10^-4Ω·cm with the highest carrier density of 1.1×10^21 cm^-3 and the Hall mobility of 7.4 cm^2·V^-1s^-1.展开更多
High-haze flexible transparent conductive polymethyl methacrylate (PMMA) films embedded with silver nanowires (AgNWs) are fabricated by a low-cost and simple process. The volatilization rate of the solvent in PMMA...High-haze flexible transparent conductive polymethyl methacrylate (PMMA) films embedded with silver nanowires (AgNWs) are fabricated by a low-cost and simple process. The volatilization rate of the solvent in PMMA solution affects the surface microstructures and morphologies, which results in different haze factors of the composite films. The areal mass density of AgNW shows a significant influence on the optical and electrical properties of composite films. The AgNW/PMMA transparent conductive films with the sheet resistance of 5.5Ω sq ^-1 exhibit an excellent performance with a high haze factor of 81.0% at 550?nm.展开更多
Aluminum-doped zinc oxide (ZnO:Al), abbreviated as ZAO, is a novel and widely used transparent conductive material. The ZAO powder was synthesized by chemical coprecipitation. The ZAO ceramic sputtering target mate...Aluminum-doped zinc oxide (ZnO:Al), abbreviated as ZAO, is a novel and widely used transparent conductive material. The ZAO powder was synthesized by chemical coprecipitation. The ZAO ceramic sputtering target materials were fabricated by sintering in air, and ZAO transparent conductive films were prepared by RF magnetron sputtering on glass substrates. XRD proved that such films had an orientation of (002) crystal panel paralleled to the surface of the glass substrate. The average transmittance of the films in the visible region exceeded 80%.展开更多
We fabricate flexible conductive and transparent graphene films on position-emission-tomography substrates and prepare large area graphene films by graphite oxide sheets with the new technical process. The multi-layer...We fabricate flexible conductive and transparent graphene films on position-emission-tomography substrates and prepare large area graphene films by graphite oxide sheets with the new technical process. The multi-layer graphene oxide sheets can be chemically reduced by HNO3 and HI to form a highly conductive graphene film on a substrate at lower temperature. The reduced graphene oxide sheets show a high conductivity sheet with resistance of 476Ω/sq and transmittance of 76% at 550nm (6 layers). The technique used to produce the transparent conductive graphene thin film is facile, inexpensive, and can be tunable for a large area production applied for electronics or touch screens.展开更多
β-Na YF4:Yb3+,Er3+ microrods were synthesized through hydrothermal methods. Polyethylene glycol with molecular weight of 6000 was used as surfactant. A series of transparent silica gel films with upconversion lumines...β-Na YF4:Yb3+,Er3+ microrods were synthesized through hydrothermal methods. Polyethylene glycol with molecular weight of 6000 was used as surfactant. A series of transparent silica gel films with upconversion luminescence property was prepared through sol-gel method; the prepared β-Na YF4:Yb3+,Er3+ microrods were used as activator. The silica gel films show strong upconversion emission under excitation of 980-nm laser beam.展开更多
Recently, a high-performance and low-priced transparent conductive film has been expected to be developed because flexible devices produced using organic materials have been actively studied. An indium tin oxide (ITO)...Recently, a high-performance and low-priced transparent conductive film has been expected to be developed because flexible devices produced using organic materials have been actively studied. An indium tin oxide (ITO) thin film, which has been generally used as a material for a transparent conductive film, has problems, such as fragility to bending stress and depletion of the resource. The present study used poly(3, 4-ethylenedioxythiophene)/poly(styrenesulfonate) (PEDOT:PSS), an organic electroconductive material, and examined the improvement in the resistance value and visible light transmittance of a transparent conductive film produced using the ink-jet method. In previous studies, we reported that, to improve the resistance value and visible light transmittance of a thin film, it was effective to clean the film substrate with ultraviolet/ozone (UV/O<sub>3</sub>) treatment, anneal the film after it was deposited on the substance, and dip the annealed film into a polar solvent. Focusing on the thin film processing between printing operations, the present study improved resistance value and visible light transmittance by examining both the application methods of a polar solvent and the annealing time between printing operations. As a result, the resistance value and visible light transmittance of a PEDOT:PSS thin film were 390.4 Ω and 86.6%, respectively. This film was obtained by applying a polar solvent and performing annealing for 30 min between printing operations. The printing was performed three times.展开更多
Visible transparent yet low infrared-emissivity(ε)polymeric materials are highly anticipated in many applications,whereas the fabrication of which remains a formidable challenge.Herein,visible transparent,flexible,an...Visible transparent yet low infrared-emissivity(ε)polymeric materials are highly anticipated in many applications,whereas the fabrication of which remains a formidable challenge.Herein,visible transparent,flexible,and low-εpolymeric films were fabricated by nanocoating decoration of indium tin oxide(ITO)and MXene on polyethylene terephthalate(PET)film surface through magnetron sputtering and spray coating,respectively.The obtained PET-ITO@MXene(PET-IM)film exhibits lowεof 24.7%and high visible transmittance exceeding 50%,endowing it with excellent visible transparent infrared stealthy by reducing human skin radiation temperature from 32 to 20.8°C,and remarkable zero-energy passive radiative heating capability(5.7°C).Meanwhile,the transparent low-εPET-IM film has high solar absorptivity and electrical conductivity,enabling superior solar/electric to thermal conversion performance.Notably,the three heating modes of passive radiative and active solar/electric can be integrated together to cope with complex heating scenarios.These visible transparent low-εpolymeric films are highly promising in infrared stealth,building daylighting and thermal management,and personal precision heating.展开更多
Transparent conductive films(TCFs)are crucial components of solar cells.In this study,F,Cl,and Ga codoped ZnO(FCGZO)TCFs were deposited onto a glass substrate using the sol-gel spin-coating method and rapid thermal an...Transparent conductive films(TCFs)are crucial components of solar cells.In this study,F,Cl,and Ga codoped ZnO(FCGZO)TCFs were deposited onto a glass substrate using the sol-gel spin-coating method and rapid thermal annealing.The effects of F-doping content on the structural,morphological,electrical,and optical properties of FCGZO films were examined by XRD,TEM,FE-SEM,PL spectroscopy,XPS,Hall effects testing,and UVeviseNIR spectroscopy.All prepared ZnO films exhibited a hexagonal wurtzite structure and preferentially grew along the c axis perpendicular to the substrate.Changes in the doping concentration of F changed the interplanar crystal spacing and O vacancies in the film.At a doping ratio of 2%(in mole),the F,Cl,and Ga co-doped ZnO film exhibited the best photoelectric performance,with a carrier concentration of 2.62×10^(20)cm^(-3),mobility of 14.56 cm^(2)/(V·s),and resistivity of 1.64×10^(-3)Ucm.The average transmittance(AT)in the 380-1600 nm region nearly 90%with air as the reference,and the optical band gap was 3.52 eV.展开更多
Electronic devices that are transparent and flexible have a wide range of applications in the domains of vital sign parameter monitoring,health management,and so on.Ferroelectric memory is a revolutionary nonvolatile ...Electronic devices that are transparent and flexible have a wide range of applications in the domains of vital sign parameter monitoring,health management,and so on.Ferroelectric memory is a revolutionary nonvolatile memory that is ideal for data storage and processing in transparent flexible electronic systems.In this study,Ce-doped hafnium oxide ferroelectric thin film is manufactured on mica substrate by the chemical solution deposition with transparent indium tin oxide(ITO)thin films as the bottom electrodes.The transmittance of mica/ITO/Hf_(0.85)Ce_(0.15)O_(2)thin film is over 80%.The 2Pr of the transparent flexible Hf_(0.85)Ce_(0.15)O_(2)ferroelectric thin film is increased by about 22.4%and the Ec is reduced by 26.7%compared with those of Hf_(0.85)Ce_(0.15)O_(2)ferroelectric thin film grown on p+-Si substrate.The transparent flexible Hf_(0.85)Ce_(0.15)O_(2)ferroelectric thin film can remain keeping good quality when being bent under±2.5 mm bending radius.Additionally,degradation of polarization,retention,and endurance performance was not obvious even at a bending radius of 5.0 mm after 104 bending cycles.This research provides a new strategy and an important experimental basis for the development and implementation of transparent flexible ferroelectric memories.展开更多
Transparent conductive oxide (TCO) thin film is a kind of functional material which has potential applications in solar cells and atomic oxygen (AO) resisting systems in spacecrafts. Of TCO, ZnO:Al (ZAO) and In...Transparent conductive oxide (TCO) thin film is a kind of functional material which has potential applications in solar cells and atomic oxygen (AO) resisting systems in spacecrafts. Of TCO, ZnO:Al (ZAO) and In2O3:Sn (ITO) thin films have been widely used and investigated. In this study, ZAO and ITO thin films were irradiated by AO with different amounts of fluence. The as-deposited samples and irradiated ones were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and Hall-effect measurement to investigate the dependence of the structure, morphology and electrical properties of ZAO or ITO on the amount of fluence of AO irradiation. It is noticed that AO has erosion effects on the surface of ZAO without evident influences upon its structure and conductive properties. Moreover, as the amount of AO fluence rises, the carrier concentration of ITO decreases causing the resistivity to increase by at most 21.7%.展开更多
基金This work was financially supported by the National Natural Science Foundation of China(Grant No.523712475,2072415 and 62101352)Shenzhen Science and Technology Program(RCBS20210706092343016).
文摘Despite the growing demand for transparent conductive films in smart and wearable electronics for electromagnetic interference(EMI)shielding,achieving a flexible EMI shielding film,while maintaining a high transmittance remains a significant challenge.Herein,a flexible,transparent,and conductive copper(Cu)metal mesh film for EMI shielding is fabricated by self-forming crackle template method and electroplating technique.The Cu mesh film shows an ultra-low sheet resistance(0.18Ω□^(-1)),high transmittance(85.8%@550 nm),and ultra-high figure of merit(>13,000).It also has satisfactory stretchability and mechanical stability,with a resistance increases of only 1.3%after 1,000 bending cycles.As a stretchable heater(ε>30%),the saturation temperature of the film can reach over 110°C within 60 s at 1.00 V applied voltage.Moreover,the metal mesh film exhibits outstanding average EMI shielding effectiveness of 40.4 dB in the X-band at the thickness of 2.5μm.As a demonstration,it is used as a transparent window for shielding the wireless communication electromagnetic waves.Therefore,the flexible and transparent conductive Cu mesh film proposed in this work provides a promising candidate for the next-generation EMI shielding applications.
基金Project supported by the Enterprise Science and Technology Correspondent for Guangdong Province,China (Grant No.GDKTP2021015200)。
文摘For the crystalline temperature of BaSnO_(3)(BTO)was above 650℃,the transparent conductive BTO-based films were always deposited above this temperature on epitaxy substrates by pulsed laser deposition or molecular beam epitaxy till now which limited there application in low temperature device process.In the article,the microstructure,optical and electrical of BTO and In_(2)O_(3) mixed transparent conductive BaInSnO_(x)(BITO)film deposited by filtered cathodic vacuum arc technique(FCVA)on glass substrate at room temperature were firstly reported.The BITO film with thickness of 300 nm had mainly In_(2)O_(3) polycrystalline phase,and minor polycrystalline BTO phase with(001),(011),(111),(002),(222)crystal faces which were first deposited at room temperature on amorphous glass.The transmittance was 70%–80%in the visible light region with linear refractive index of 1.94 and extinction coefficient of 0.004 at 550-nm wavelength.The basic optical properties included the real and imaginary parts,high frequency dielectric constants,the absorption coefficient,the Urbach energy,the indirect and direct band gaps,the oscillator and dispersion energies,the static refractive index and dielectric constant,the average oscillator wavelength,oscillator length strength,the linear and the third-order nonlinear optical susceptibilities,and the nonlinear refractive index were all calculated.The film was the n-type conductor with sheet resistance of 704.7Ω/□,resistivity of 0.02Ω⋅cm,mobility of 18.9 cm2/V⋅s,and carrier electron concentration of 1.6×10^(19) cm^(−3) at room temperature.The results suggested that the BITO film deposited by FCVA had potential application in transparent conductive films-based low temperature device process.
基金Project supported by the National Key Basic Research and Development Programme of China (Grant No 2001CB610504) and the National Natural Science Foundation of China (Grant Nos 60576039 and 10374060).Acknowledgments We thank Dr Wang Zhuo and Dr Yang ChangHong for their assistance in the experiment.
文摘Transparent and conducting zirconium-doped zinc oxide films with high transparency and relatively low resistivity have been successfully prepared by radio frequency (RF) msgnetron sputtering at room temperature, The RF power is varied from 75 to 150 W. At first the crystallinity and conductivity of the film are improved and then both of them show deterioration with the increase of the RF power, The lowest resistivity achieved is 2.07 × 10^-3Ωcm at an RF power of 100W with a Hall mobility of 16cm^2V^-1s^-1 and a carrier concentration of 1.95 × 10^20 cm^-3. The films obtained are polycryetalline with a hexagonal structure and a preferred orientation along the c-axis, All the films have a high transmittance of approximately 92% in the visible range. The optical band gap is about 3.33 eV for the films deposited at different RF powers.
文摘To obtain high transmittance and low resistivity ZnO transparent conductive thin films,a series of ZnO ceramic targets(ZnO:Al,ZnO:(Al,Dy),ZnO:(Al,Gd),ZnO:(Al,Zr),ZnO:(Al,Nb),and ZnO:(Al,W)) were fabricated and used to deposit thin films onto glass substrates by radio frequency(RF) magnetron sputtering.X-ray diffraction(XRD) analysis shows that the films are polycrystalline fitting well with hexagonal wurtzite structure and have a preferred orientation of the(002) plane.The transmittance of above 86% as well as the lowest resistivity of 8.43 × 10^-3 Ω·cm was obtained.
基金financially supported by the National Nature Science Foundation of China (No. 21071098)the Project of International Cooperation of the Ministry of Science and Technology of China (No. 2011DFA50530)the Nanotechnology Program of Shanghai Science & Technology Committee (No. 12nm0504800)
文摘ZnO/Cu/ZnO transparent conductive thin films were prepared by RF sputtering deposition of ZnO target and DC sputtering deposition of Cu target on n-type (001) Si and glass substrates at room temperature. The mor- phology, structure, optical, and electrical properties of the multilayer films were characterized by field emission scanning electron microscope (FESEM), X-ray diffraction (XRD), UV/Vis spectrophotometer, and Hall effect mea- surement system. The influence of Cu layer thickness and the oxygen pressure in sputtering atmosphere on the film properties were studied. ZnO/Cu/ZnO transparent conduc- tive film fabricated in pure Ar atmosphere with 10 nm Cu layer thickness has the best performance: resistivity of 2.3 × 10^-4 Ω.cm, carrier concentration of 6.44 × 10^16 cm-2, mobility of 4.51 cm2.(V.s)-1, and acceptable aver- age transmittance of 80 % in the visible range. The trans- mittance and conductivity of the films fabricated with oxygen are lower than those of the films fabricated without oxygen, which indicates that oxygen atmosphere does not improve the optical and electrical properties of ZnO/Cu/ ZnO films.
文摘Transparent conducting F-doped texture SnO2 films with resistivity as low as 5× 10-4 Ω ·cm,with carrier concentrations between 3.5 × 1020 and 7× 1020 cm-3 and Hall mobilities from 15.7 to 20.1 cm2/(V/s) have been prepared by atmosphere pressure chemical vapour deposition (APCVD). These polycrystalline films possess a variable preferred orientation, the polycrystallite sizes and orientations vary with substrate temperature. The substrate temperature and fluorine flow rate dependence of conductivity, Hall mobility and carrier conentration fOr the resultingfilms have been obtained. The temperature dependence of the mobiity and carrier concentrationhave been measured over a temperature range 16~400 K. A systematically theoretical analysis on scattering mechanisms for the highly conductive SnO2 films has been given. Both theoretical analysis and experimental results indicate that for these degenerate, polycrystalline SnO2 :F films in the low temperature range (below 100 K), ionized impurity scattering is main scattering mechanism. However, when the temperature is higher than 100 K, the lattice vibration scattering becomes dominant. The grain boundary scattering makes a small contribution to limit the mobility of the films.
文摘Transparent conductive cadmium indium oxide films (CdIn2O4) were prepared by r.f. reactive sputtering from Cd-In alloy targets under an Ar-O2 atmosphere. Electrical conductivity of the order of 105Ω-1.m-1 and the optical transmission as high as 94% are easily attained by postdeposition annealing treatment. The effects of oxygen concentration in the reactive gas mixture and post-deposition annealing treatment on the optical transmittance as well as optical parameters, such as refractive index (n), extinction coefficient (k), real part (ε') and imaginary part (ε') of the dielectric constant, were studied in the visible and near-infrared region. The highfrequency dielectric constant ε∞ the plasma frequency ωP, and the conduction band effective mass mc of different samples were also investigated
基金Funded by the Program for Changjiang Scholars and Innovative Research Team in University, Ministry of Education, China (No.IRT0547)
文摘High transparent and conductive thin films of zinc doped tin oxide (ZTO) were deposited on quartz substrates by the radio-frequency (RF) magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic target.The effect of substrate temperature on the structural,electrical and optical performances of ZTO films has been studied.X-ray diffraction (XRD) results show that ZTO films possess tetragonal rutile structure with the preferred orientation of (101).The surface morphology and roughness of the films was investigated by the atomic force microscope (AFM).The electrical characteristic (including carrier concentration,Hall mobility and resistivity) and optical transmittance were studied by the Hall tester and UV- VIS,respectively.The highest carrier concentration of -1.144×1020 cm-3 and the Hall mobility of 7.018 cm2(V ·sec)-1 for the film with an average transmittance of about 80.0% in the visible region and the lowest resistivity of 1.116×10-2 Ω·cm were obtained when the ZTO films deposited at 250 oC.
基金This work was supported by the National Nalural Science Foundation of China(No.50172051).
文摘Al and Mn co-doped-ZnO films have been prepared at room temperature by DC reacti ve magnetron sputtering technique. The optical absorption coefficient, apparent and fundamental band gap, and work function of the films have been investigated using optical spectroscopy, band structure analyses and ultraviolet photoelectro n spectroscopy (UPS). ZnO films have direct allowed transition band structure, w hich has been confirmed by the character of the optical absorption coefficient. The apparent band gap has been found directly proportional to N2/3, showing that the effect of Burstein-Moss shift on the band gap variations dominates over the many-body effect. With only standard cleaning protocols, the work function of ZnO: (Al, Mn) and ZnO: Al films have been measured to be 4.26 and 4.21eV, respec tively. The incorporation of Mn element into the matrix of ZnO, as a relatively deep donor, can remove some electrons from the conduction band and deplete the d ensity of occupied states at the Fermi energy, which causes a loss in measured p hotoemission intensity and an increase in the surface work function. Based on th e band gap and work function results, the energy band diagram of the ZnO: (Al, M n) film near its surface is also given.
基金Supported by the National Natural Science Foundation of China under Grant No 11374114
文摘Ta-doped titanium dioxide films are deposited on fused quartz substrates using the rf magnetron sputtering technique at different substrate temperatures. After post-annealing at 550℃ in a vacuum, all the films are crystallized into the polycrystalline anatase TiO2 structure. The effects of substrate temperature from room temperature up to 350℃ on the structure, morphology, and photoelectric properties of Ta-doped titanium dioxide films are analyzed. The average transmittance in the visible region(400-800 nm) of all films is more than 73%.The resistivity decreases firstly and then increases moderately with the increasing substrate temperature. The polycrystalline film deposited at 150℃ exhibits a lowest resistivity of 7.7 × 10^-4Ω·cm with the highest carrier density of 1.1×10^21 cm^-3 and the Hall mobility of 7.4 cm^2·V^-1s^-1.
基金Supported by the International S&T Cooperation Program of China under Grant No 2015DFH60240the Ningbo Municipal Science and Technology Innovative Research Team under Grant No 2016B10005+1 种基金the Zhejiang Provincial Natural Science Foundation of China under Grant No LY15B050003the Ningbo Natural Science Foundation under Grant No 2016A610281
文摘High-haze flexible transparent conductive polymethyl methacrylate (PMMA) films embedded with silver nanowires (AgNWs) are fabricated by a low-cost and simple process. The volatilization rate of the solvent in PMMA solution affects the surface microstructures and morphologies, which results in different haze factors of the composite films. The areal mass density of AgNW shows a significant influence on the optical and electrical properties of composite films. The AgNW/PMMA transparent conductive films with the sheet resistance of 5.5Ω sq ^-1 exhibit an excellent performance with a high haze factor of 81.0% at 550?nm.
文摘Aluminum-doped zinc oxide (ZnO:Al), abbreviated as ZAO, is a novel and widely used transparent conductive material. The ZAO powder was synthesized by chemical coprecipitation. The ZAO ceramic sputtering target materials were fabricated by sintering in air, and ZAO transparent conductive films were prepared by RF magnetron sputtering on glass substrates. XRD proved that such films had an orientation of (002) crystal panel paralleled to the surface of the glass substrate. The average transmittance of the films in the visible region exceeded 80%.
基金Supported by the Basic Research Program of Nanjing University of Posts and Telecommunications under Grant No NY212002the Innovative Research Team in University under Grant No IRT1148the 2014 Shuangchuang Program of Jiangsu Province
文摘We fabricate flexible conductive and transparent graphene films on position-emission-tomography substrates and prepare large area graphene films by graphite oxide sheets with the new technical process. The multi-layer graphene oxide sheets can be chemically reduced by HNO3 and HI to form a highly conductive graphene film on a substrate at lower temperature. The reduced graphene oxide sheets show a high conductivity sheet with resistance of 476Ω/sq and transmittance of 76% at 550nm (6 layers). The technique used to produce the transparent conductive graphene thin film is facile, inexpensive, and can be tunable for a large area production applied for electronics or touch screens.
基金Supported by the National Natural Science Foundation of China(No.61308085)
文摘β-Na YF4:Yb3+,Er3+ microrods were synthesized through hydrothermal methods. Polyethylene glycol with molecular weight of 6000 was used as surfactant. A series of transparent silica gel films with upconversion luminescence property was prepared through sol-gel method; the prepared β-Na YF4:Yb3+,Er3+ microrods were used as activator. The silica gel films show strong upconversion emission under excitation of 980-nm laser beam.
文摘Recently, a high-performance and low-priced transparent conductive film has been expected to be developed because flexible devices produced using organic materials have been actively studied. An indium tin oxide (ITO) thin film, which has been generally used as a material for a transparent conductive film, has problems, such as fragility to bending stress and depletion of the resource. The present study used poly(3, 4-ethylenedioxythiophene)/poly(styrenesulfonate) (PEDOT:PSS), an organic electroconductive material, and examined the improvement in the resistance value and visible light transmittance of a transparent conductive film produced using the ink-jet method. In previous studies, we reported that, to improve the resistance value and visible light transmittance of a thin film, it was effective to clean the film substrate with ultraviolet/ozone (UV/O<sub>3</sub>) treatment, anneal the film after it was deposited on the substance, and dip the annealed film into a polar solvent. Focusing on the thin film processing between printing operations, the present study improved resistance value and visible light transmittance by examining both the application methods of a polar solvent and the annealing time between printing operations. As a result, the resistance value and visible light transmittance of a PEDOT:PSS thin film were 390.4 Ω and 86.6%, respectively. This film was obtained by applying a polar solvent and performing annealing for 30 min between printing operations. The printing was performed three times.
基金This work was financially supported by a grant from the Science Foundation of Guangzhou (2000-Z-076-01) and Laboratory of Rare Earth Chemistry and Physics Changchun Institute of Applied Chemistry Chinese Academy of Science.
基金Financial support of the National Natural Science Foundation of China(No.52003248)the China Postdoctoral Science Foundation(Nos.2018M642780 and 2021T140613)+1 种基金the Opening Project of State Key Laboratory of Polymer Materials Engineering(Sichuan University)(No.sklpme2019-4-31)the Key Research and Development and Promotion projects of Henan Province(No.202102210032)are gratefully acknowledged.
文摘Visible transparent yet low infrared-emissivity(ε)polymeric materials are highly anticipated in many applications,whereas the fabrication of which remains a formidable challenge.Herein,visible transparent,flexible,and low-εpolymeric films were fabricated by nanocoating decoration of indium tin oxide(ITO)and MXene on polyethylene terephthalate(PET)film surface through magnetron sputtering and spray coating,respectively.The obtained PET-ITO@MXene(PET-IM)film exhibits lowεof 24.7%and high visible transmittance exceeding 50%,endowing it with excellent visible transparent infrared stealthy by reducing human skin radiation temperature from 32 to 20.8°C,and remarkable zero-energy passive radiative heating capability(5.7°C).Meanwhile,the transparent low-εPET-IM film has high solar absorptivity and electrical conductivity,enabling superior solar/electric to thermal conversion performance.Notably,the three heating modes of passive radiative and active solar/electric can be integrated together to cope with complex heating scenarios.These visible transparent low-εpolymeric films are highly promising in infrared stealth,building daylighting and thermal management,and personal precision heating.
基金the Key Research and Development Projects of Hebei Province(Grant No.19214301D)the Key Project of Science and Technology Research in Higher Education Institutions of Hebei Province(Grant No.ZD2022024)+3 种基金the Natural Science Foundation of Hebei Province(Grant Nos A2019405059,A2022405002)the Starting Fund for Independent Doctoral Research of Hebei Agricultural University(PY2021005)the General Projects of Hebei North University(Grant No.XJ2021001)the Innovation and Entrepreneurship Training Program for College Students of Hebei North University(Grant Nos 202210092007,S202210092006).
文摘Transparent conductive films(TCFs)are crucial components of solar cells.In this study,F,Cl,and Ga codoped ZnO(FCGZO)TCFs were deposited onto a glass substrate using the sol-gel spin-coating method and rapid thermal annealing.The effects of F-doping content on the structural,morphological,electrical,and optical properties of FCGZO films were examined by XRD,TEM,FE-SEM,PL spectroscopy,XPS,Hall effects testing,and UVeviseNIR spectroscopy.All prepared ZnO films exhibited a hexagonal wurtzite structure and preferentially grew along the c axis perpendicular to the substrate.Changes in the doping concentration of F changed the interplanar crystal spacing and O vacancies in the film.At a doping ratio of 2%(in mole),the F,Cl,and Ga co-doped ZnO film exhibited the best photoelectric performance,with a carrier concentration of 2.62×10^(20)cm^(-3),mobility of 14.56 cm^(2)/(V·s),and resistivity of 1.64×10^(-3)Ucm.The average transmittance(AT)in the 380-1600 nm region nearly 90%with air as the reference,and the optical band gap was 3.52 eV.
基金supported by the National Natural Science Foundation of China(Nos.11902285 and 12072307)the Department of Education Project of Hunan Province,China(Nos.21B0112 and 19A106)+2 种基金the Science and Technology Agency Project of Hunan Province,China(No.2020JJ5526)the China Postdoctoral Science Foundation(No.2019TQ0273)the Outstanding Youth Science Foundation of Hunan Province,China(No.2021JJ20041).
文摘Electronic devices that are transparent and flexible have a wide range of applications in the domains of vital sign parameter monitoring,health management,and so on.Ferroelectric memory is a revolutionary nonvolatile memory that is ideal for data storage and processing in transparent flexible electronic systems.In this study,Ce-doped hafnium oxide ferroelectric thin film is manufactured on mica substrate by the chemical solution deposition with transparent indium tin oxide(ITO)thin films as the bottom electrodes.The transmittance of mica/ITO/Hf_(0.85)Ce_(0.15)O_(2)thin film is over 80%.The 2Pr of the transparent flexible Hf_(0.85)Ce_(0.15)O_(2)ferroelectric thin film is increased by about 22.4%and the Ec is reduced by 26.7%compared with those of Hf_(0.85)Ce_(0.15)O_(2)ferroelectric thin film grown on p+-Si substrate.The transparent flexible Hf_(0.85)Ce_(0.15)O_(2)ferroelectric thin film can remain keeping good quality when being bent under±2.5 mm bending radius.Additionally,degradation of polarization,retention,and endurance performance was not obvious even at a bending radius of 5.0 mm after 104 bending cycles.This research provides a new strategy and an important experimental basis for the development and implementation of transparent flexible ferroelectric memories.
基金National Natural Science Foundation of China (50471004)
文摘Transparent conductive oxide (TCO) thin film is a kind of functional material which has potential applications in solar cells and atomic oxygen (AO) resisting systems in spacecrafts. Of TCO, ZnO:Al (ZAO) and In2O3:Sn (ITO) thin films have been widely used and investigated. In this study, ZAO and ITO thin films were irradiated by AO with different amounts of fluence. The as-deposited samples and irradiated ones were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and Hall-effect measurement to investigate the dependence of the structure, morphology and electrical properties of ZAO or ITO on the amount of fluence of AO irradiation. It is noticed that AO has erosion effects on the surface of ZAO without evident influences upon its structure and conductive properties. Moreover, as the amount of AO fluence rises, the carrier concentration of ITO decreases causing the resistivity to increase by at most 21.7%.