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High performance trench MOS barrier Schottky diode with high-k gate oxide 被引量:2
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作者 翟东媛 朱俊 +3 位作者 赵毅 蔡银飞 施毅 郑有炓 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第7期426-428,共3页
A novel trench MOS barrier Schottky diode(TMBS) device with a high-k material introduced into the gate insulator is reported, which is named high-k TMBS. By simulation with Medici, it is found that the high-k TMBS c... A novel trench MOS barrier Schottky diode(TMBS) device with a high-k material introduced into the gate insulator is reported, which is named high-k TMBS. By simulation with Medici, it is found that the high-k TMBS can have 19.8% lower leakage current while maintaining the same breakdown voltage and forward turn-on voltage compared with the conventional regular trench TMBS. 展开更多
关键词 trench mos barrier schottky diode high-k gate oxide leakage current
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