Intrinsic stresses of carbon films deposited by direct current （DC） magnetron sputtering were investigated. The bombardments of energetic particles during the growth of films were considered to be the main reason fo...Intrinsic stresses of carbon films deposited by direct current （DC） magnetron sputtering were investigated. The bombardments of energetic particles during the growth of films were considered to be the main reason for compressive intrinsic stresses. The values of intrinsic stresses were determined by measuring the radius of curvature of substrates before and after film deposition. By varying argon pressure and target-substrate distance, energies of neutral carbon atoms impinging on the growing films were optimized to control the intrinsic stresses level. The stress evolution in carbon films as a function of film thickness was investigated and a void-related stress relief mechanism was proposed to interpret this evolution.展开更多
A simple D. C. are plasma jet device has been designed. A 5 mm diameter graphite rod used as a cathode axially and a neutral graphite orifice ring were put together to form a tube as a plasma chamber. Argon is used as...A simple D. C. are plasma jet device has been designed. A 5 mm diameter graphite rod used as a cathode axially and a neutral graphite orifice ring were put together to form a tube as a plasma chamber. Argon is used as the inert tangential swirl sheathing gas. An optimum flow rate of 0.5 l/min was selected. This device could be used directly for powder sample by putting it in the electrode cup as an anode and the cathode above and orifice ring is not soiled by spatterings展开更多
基金the National Natural Sci-ence Foundation of China (No.10435050,10675092,and 10675091)the"863"Project Plan (No.2006AA12Z139)the Program for New Century Excellent Talents in University (No.NCET-04-0376).
文摘Intrinsic stresses of carbon films deposited by direct current （DC） magnetron sputtering were investigated. The bombardments of energetic particles during the growth of films were considered to be the main reason for compressive intrinsic stresses. The values of intrinsic stresses were determined by measuring the radius of curvature of substrates before and after film deposition. By varying argon pressure and target-substrate distance, energies of neutral carbon atoms impinging on the growing films were optimized to control the intrinsic stresses level. The stress evolution in carbon films as a function of film thickness was investigated and a void-related stress relief mechanism was proposed to interpret this evolution.
文摘A simple D. C. are plasma jet device has been designed. A 5 mm diameter graphite rod used as a cathode axially and a neutral graphite orifice ring were put together to form a tube as a plasma chamber. Argon is used as the inert tangential swirl sheathing gas. An optimum flow rate of 0.5 l/min was selected. This device could be used directly for powder sample by putting it in the electrode cup as an anode and the cathode above and orifice ring is not soiled by spatterings
