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Development of a High-PerformanceFlexible Substrate for Flexible Electronics:Joining TAC Films and an Ultra-Thin Glassby Using TEOS-DAC Synthesized by the Sol-Gel Method 被引量:1
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作者 Tomoji Ohishi Hiroaki Kawada +1 位作者 Tsutomu Yoshida Takeshi Ohwada 《Materials Sciences and Applications》 2015年第12期1100-1110,共11页
A new flexible substrate for flexible electronics has been developed. The developed substrate consists of an ultra thin glass and TAC (triacethyl cellulose) film. An ultra thin glass and TAC film were joined with TEOS... A new flexible substrate for flexible electronics has been developed. The developed substrate consists of an ultra thin glass and TAC (triacethyl cellulose) film. An ultra thin glass and TAC film were joined with TEOS-DAC (TEOS: tetraethyl orthosilicate, DAC: diacethy cellulose) adhesive resin synthesized by sol-gel method by means of thermo-compression bonding. This substrate has high transparency in visible-light region (90%), high flexibility (torsion strength and bending strength) and high gas barrier characteristics due to an ultra thin glass. The newly-developed substrate is superior to the substrates fabricated with commercially available adhesive resin in the same way in characteristics of heat resistance, transparency and flexibility. 展开更多
关键词 FLEXIBLE electronics FLEXIBLE Substrate Ultra Thin glass Triacethyl CELLULOSE Film
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ELECTRONIC STRUCTURE OF Pd-Y-Si GLASSES
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作者 LUO Meiqing CHEN Nianyi Shanghai Institute of Metallurgy,Academia Sinica,Shanghai,ChinaYU Zhizhong Shanghai Institute of Testing Technics,Shanghai,ChianNING Yuantao ZHOU Xinming Kunming Institute of Precious Metals,Kunming,China CHEN Nianyi,Professor,Shanghai Institute of Metallurgy,Academia Sinica,Shanghai 200050,China 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 1990年第8期140-141,共2页
The electronic structure of Pd-Y-Si glass has been investigated by ESCA and quantum chem- ical calculation.It was found that the valence electrons of Y transferred to Si atoms in this metallic glass,forming polar cova... The electronic structure of Pd-Y-Si glass has been investigated by ESCA and quantum chem- ical calculation.It was found that the valence electrons of Y transferred to Si atoms in this metallic glass,forming polar covalent bonds.Perhaps these strong covalent bonds link Si and Y atoms to form clusters that hinder the process of crystallization. 展开更多
关键词 Pd-Y-Si glass electronic structure ESCA EHMO
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Visible to deep ultraviolet range optical absorption of electron irradiated borosilicate glass 被引量:3
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作者 王铁山 段丙皇 +4 位作者 田丰 彭海波 陈亮 张利民 袁伟 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第7期345-349,共5页
To study the room-temperature stable defects induced by electron irradiation, commercial borosilicate glasses were irradiated by 1.2 MeV electrons and then ultraviolet(UV) optical absorption(OA) spectra were measu... To study the room-temperature stable defects induced by electron irradiation, commercial borosilicate glasses were irradiated by 1.2 MeV electrons and then ultraviolet(UV) optical absorption(OA) spectra were measured. Two characteristic bands were revealed before irradiation, and they were attributed to silicon dangling bond(E'-center) and Fe^3+species,respectively. The existence of Fe3+was confirmed by electron paramagnetic resonance(EPR) measurements. After irradiation, the absorption spectra revealed irradiation-induced changes, while the content of E'-center did not change in the deep ultraviolet(DUV) region. The slightly reduced OA spectra at 4.9 eV was supposed to transform Fe3+species to Fe^2+species and this transformation leads to the appearance of 4.3 eV OA band. By calculating intensity variation, the transformation of Fe was estimated to be about 5% and the optical absorption cross section of Fe2+species is calculated to be 2.2 times larger than that of Fe^3+species. Peroxy linkage(POL, ≡Si–O–O–Si≡), which results in a 3.7 eV OA band, is speculated not to be from Si–O bond break but from Si–O–B bond, Si–O–Al bond, or Si–O–Na bond break. The co-presence defect with POL is probably responsible for 2.9-eV OA band. 展开更多
关键词 borosilicate glass electron irradiation DEFECT optical absorption
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XPS and Raman studies of electron irradiated sodium silicate glass 被引量:1
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作者 陈亮 王铁山 +3 位作者 张根发 杨坤杰 彭海波 张利民 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第12期352-357,共6页
The microstructure modifications of sodium silicate glass induced by 1.2-MeV electron irradiation are studied by x-ray photoelectron spectroscopy and Raman spectroscopy. Depth profile analyses are also performed on th... The microstructure modifications of sodium silicate glass induced by 1.2-MeV electron irradiation are studied by x-ray photoelectron spectroscopy and Raman spectroscopy. Depth profile analyses are also performed on the irradiated glass at 109 Gy. A sodium-depleted layer with a thickness of a few tens of nanometers and the corresponding increase of network polymerization on the top surface are observed after electron bombardment, while the polymerization in the subsurface region has a negligible variation with the irradiation dose. Moreover, the formation of molecular oxygen after electron irradiation is evidenced, which is mainly aggregated in the first two-micron-thick irradiated glass surface. These modifications are correlated to the network relaxation process as a consequence of the diffusion and desorption of sodium species during electron irradiation. 展开更多
关键词 silicate glass electron irradiation network polymerization oxygen molecule
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Effect of Electron Beam on the Structure and Crystallization Features of BaO-SrO-TiO_2-SiO_2 Glass
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作者 王为 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2002年第2期33-35,共3页
Glasses of BaO-SrO-TiO2-SiO2 after electronic radiation treatment of 50 - 1000 kgy were studied by means of IR spectra, DTA and visible light absorption method. The result shows that the glass structure is changed due... Glasses of BaO-SrO-TiO2-SiO2 after electronic radiation treatment of 50 - 1000 kgy were studied by means of IR spectra, DTA and visible light absorption method. The result shows that the glass structure is changed due to the formation of structure defect from oxygen vacancy and E’ color center, which resultsd in the crystallization process and new precursors, and decreasement of Tg temperature and crystallization peaks by 20 -50℃. 展开更多
关键词 electronic radiation glass structure color center
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Electron Paramagnetic Resonance and Optical Absorption Studies on Copper Ions in Mixed Alkali Cadmium Phosphate Glasses
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作者 G. Giridhar M. Rangacharyulu +1 位作者 R.V.S.S.N. Ravikumar P. Sambasiva Rao 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2009年第4期531-534,共4页
Electron paramagnetic resonance (EPR) and optical absorption studies were carried out at room temperature on copper doped mixed alkali cadmium phosphate (LiNaCdP) glasses to understand the nature and symmetry of d... Electron paramagnetic resonance (EPR) and optical absorption studies were carried out at room temperature on copper doped mixed alkali cadmium phosphate (LiNaCdP) glasses to understand the nature and symmetry of dopant. Three samples with varying concentrations of alkali ions have been prepared. The spin Harniltonian parameters obtained from room temperature EPR spectra are: gli=2.437, 9⊥=2.096, A‖=117×10-4 cm-1, A⊥=26×10-4 cm-1 for LiNaCdP1, g‖=2.441, g⊥=2.088, A‖=121×10-4 cm-1, A⊥=25×10-4 cm-1 for LiNaCdP2and g‖=2.433,g⊥=2.096, A‖=125×10 4cm-1, A⊥=32×10-4cm-1 for LiNaCdP3. TheseEPR results indicate that the dopant Cu2+ ion enters the glass matrix into a tetragonally elongated octahedral site. The bonding parameters evaluated by correlating optical and EPR data suggest that bonding between the central metal ion and ligands is partially covalent. The mixed alkali effect in cadmium phosphate glasses was reported. 展开更多
关键词 glassES electron paramagnetic resonance (EPR) Optical properties
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The charging stability of different silica glasses studied by measuring the secondary electron emission yield
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作者 赵谡玲 Bertrand Poumellec 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第3期473-480,共8页
This paper reports that the charging properties of lead silica, Suprasil silica and Infrasil silica are investigated by measuring the secondary electron emission (SEE) yield. At a primary electron beam energy of 25 ... This paper reports that the charging properties of lead silica, Suprasil silica and Infrasil silica are investigated by measuring the secondary electron emission (SEE) yield. At a primary electron beam energy of 25 keV, the intrinsic SEE yields measured at very low injection dose are 0.54, 0.29 and 0.35, respectively for lead silica, Suprasil and Infrasil silica glass. During the first e-beam irradiation at a high injection current density, the SEE yields of lead silica and Suprasil increase continuously and slowly from their initial values to a steady state. At the steady state, the SEE yields of lead silica and Suprasil are 0.94 and 0.93, respectively. In Infrasil, several charging and discharging processes are observed during the experiment. This shows that Infrasil does not reach its steady state. Two hours later, all samples are irradiated again in the same place as the first irradiation at a low current density and low dose. The SEE yields of lead silica, Suprasil and Infrasil are 0.69, 0.76 and 0.55, respectively. Twenty hours later, the values are 0.62, 0.64 and 0.33, respectively, for lead silica, Suprasil and Infrasil. These results show that Infrasil has poor charging stability. Comparatively, the charging stability of lead silica is better, and Suprasil has the best characteristics. 展开更多
关键词 secondary electron emission yield charging stability nonlinear silica glass
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Electronic Excitation Temperature in DC Positive Streamer Discharge
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作者 王晓臣 王宁会 丁振峰 《Plasma Science and Technology》 SCIE EI CAS CSCD 2007年第5期570-574,共5页
The electronic excitation temperature in a direct current positive streamer discharge based on ultra-thin sheet electrodes was measured by optical emission spectrometry in order to deposit materials for potential futu... The electronic excitation temperature in a direct current positive streamer discharge based on ultra-thin sheet electrodes was measured by optical emission spectrometry in order to deposit materials for potential future applications. It was remarkable that the electronic excitation temperature (Text) did not vary monotonically with the discharge current, but demonstrated a peak at a certain position. In a mixture of oxygen and argon (80% oxygen), the maximum Texc reached about 6300 K at an average current of 600 pA. Both the positive ions accumulation in the discharge region and the increase of the local temperature around the streamer channel caused by Joule heating are considered to be the main reasons for the variations of Texc. 展开更多
关键词 DC positive streamer discharge ultra-thin sheet electrodes array electronic excitation temperature
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Numerical Simulation of a Viscoelastic Thinning Process for Preparing Flexible Glasses by Redrawing Method
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作者 刘冰 袁坚 +5 位作者 GUO Zhenqiang ZHANG Qi HAN Zhuangzhuang TAN Jinqi TIAN Peijing ZHENG Weihong 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS CSCD 2023年第1期65-71,共7页
The forming process of the flexible ultrathin glasses(UTG)prepared by the redrawing method was numerically simulated using ANSYS Polyflow software.In the forming process by the redrawing method,temperature,viscosity,t... The forming process of the flexible ultrathin glasses(UTG)prepared by the redrawing method was numerically simulated using ANSYS Polyflow software.In the forming process by the redrawing method,temperature,viscosity,transverse and longitudinal velocity distribution of the glasses with different compositions were studied.Furthermore,the influence of these factors on the width and thickness of the flexible glass plate was investigated.It is found that the internal and external heat exchange of glass has a dominant influence on the viscosity variation during the UTG forming process,which is inconsistent with the general viscosity-temperature dependence.The glass that first reaches the lower limit of forming viscosity can significantly resist the shrinking effect caused by surface tension,making the glass wider during the forming.If the original glass width remains unchanged,the glass thickness or feeding speed is reduced,wider and thinner flexible glasses can be produced. 展开更多
关键词 flexible ultra-thin glass(UTG) numerical simulation down-draw forming redrawing method
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Thermoluminescent response of gamma irradiated Na^(+)–Cu^(+) ionexchanged silicate glass in large dose range
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作者 Safa Toumi Khaled Farah 《Nuclear Science and Techniques》 SCIE EI CAS CSCD 2023年第5期22-32,共11页
The introduction of metals into vitreous matrices is the origin of various interesting phenomena;in particular,the presence of copper ions in glass has been the subject of considerable research because of its numerous... The introduction of metals into vitreous matrices is the origin of various interesting phenomena;in particular,the presence of copper ions in glass has been the subject of considerable research because of its numerous applications.The ion-exchange process is primarily used to introduce copper ions into glass matrices.The thermoluminescence(TL)of silicate glass was studied to evaluate its potential as gamma-sensitive material for dosimetric applications;the effect of copper doping on the thermoluminescent sensitivity was investigated using the Cu-Na ion-exchange technique for different concentrations and doping conditions,over a wide dose range of 10 mGy to 100 kGy.The results showed that Cu doping significantly improved the sensitivity of the glasses to gamma radiation.After the ion-exchange,two peaks appeared in the glow curves at approximately 175 and 230°C,respectively,which possibly originated from the Cu^(+) centers,along with a weak TL peak at around 320℃.We also attempted to explain the origin of the observed thermoluminescence by exploiting the Electron paramagnetic resonance(EPR)spectra.The results clearly show quenching of the TL emission with increasing copper concentrations.The present work indicates that the thermoluminescence response of these glasses to gamma rays can be reasonably measured in the range of 0.001-100 kGy.This study also facilitates the understanding of the basic TL mechanism in this glass system. 展开更多
关键词 Cu-Na ion-exchange Silicate glass THERMOLUMINESCENCE Gamma irradiation electron paramagnetic resonance
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基于深度卷积神经网络的电子玻璃缺陷分类方法
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作者 李苑 于浩 +5 位作者 金良茂 曹志强 陈家睿 郑际杰 韩高荣 刘涌 《中国建材科技》 CAS 2024年第S01期17-23,共7页
电子玻璃是信息显示产业的关键基础材料之一。近年来,显示产业向大尺寸化、超高清和轻薄化发展,对于电子玻璃基板的质量提出了更高的要求。机器视觉检测具有速度快、精度高、成本低、稳定性好等优点,被广泛应用于各种工业场景中。图像... 电子玻璃是信息显示产业的关键基础材料之一。近年来,显示产业向大尺寸化、超高清和轻薄化发展,对于电子玻璃基板的质量提出了更高的要求。机器视觉检测具有速度快、精度高、成本低、稳定性好等优点,被广泛应用于各种工业场景中。图像处理算法、识别分类算法是机器视觉检测的关键技术。本文针对基于深度卷积神经网络的整图分类方法在电子玻璃表面缺陷检测领域的应用,从图像数据处理、卷积神经网络构建、训练调参、评价标准等方面介绍其研究进展,并总结部分应用实例,对电子玻璃缺陷分类未来的研究方向进行展望。 展开更多
关键词 电子玻璃 机器视觉 深度卷积神经网络 缺陷分类
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超薄电子玻璃冲击检测试验机设计与开发
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作者 张秀礼 武丽华 +1 位作者 查天任 柳婷婷 《玻璃》 2024年第5期5-9,共5页
随着智能产品的不断发展,对超薄电子玻璃的需求越来越多,性能要求也越来越高,对其各项性能检测也就显得越来越重要。智能产品朝着手持式、小型化的方向发展,其往往会发生跌落、冲击等破坏现象,抗冲击强度能直接反映、评价或者判断超薄... 随着智能产品的不断发展,对超薄电子玻璃的需求越来越多,性能要求也越来越高,对其各项性能检测也就显得越来越重要。智能产品朝着手持式、小型化的方向发展,其往往会发生跌落、冲击等破坏现象,抗冲击强度能直接反映、评价或者判断超薄电子玻璃的抵抗冲击能力,是反映超薄电子玻璃应用性的重要指标,因此对超薄电子玻璃的抗冲击检测显得尤其重要。设计与开发了一种新型结构的超薄电子玻璃冲击检测试验机,以适应新标准的冲击强度检测要求,并达到智能化检测的新目标,大幅提高检测效率,对新标准的落地、实施及促进超薄电子玻璃产品质量提升贡献一份力量。 展开更多
关键词 超薄电子玻璃 冲击检测 智能化 结构 效率
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Beryllium-distribution in metallic glass matrix composite containing beryllium 被引量:1
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作者 郭振玺 王永胜 +7 位作者 朱陆军 张跃飞 张振华 柯小行 林均品 郝国建 张泽 隋曼龄 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2017年第1期110-116,共7页
The morphologies, sizes, compositions and volume fractions of dendritic phases in in situ Ti-based metallic glass matrix composites (MGMCs) containing beryllium (Be) with the nominal composition of Tia7Zr19Cu5V12B... The morphologies, sizes, compositions and volume fractions of dendritic phases in in situ Ti-based metallic glass matrix composites (MGMCs) containing beryllium (Be) with the nominal composition of Tia7Zr19Cu5V12Be17 (mole fraction, %) were investigated using XRD, SEM, EBSD, TEM, EDS and three-dimensional reconstruction method. Moreover, visualized at the nanoscale, Be distribution is confirmed to be only present in the matrix using scanning transmission electron microscopy-electron energy loss spectroscopy (STEM-EELS). Based on these findings, it has been obtained that the accurate chemical compositions are Wi28.3Zr19.7Cu8V6.4Be37.6 (mole fraction, %) for glass matrix and Wi62.nZr18.aCu2.6V16.6 (mole fraction, %) for the dendritic phases, and the volume fractions are 38.5% and 61.5%, respectively. It is believed that the results are of particular importance for the designing of Be-containing MGMCs. 展开更多
关键词 metallic glass COMPOSITES microstructure electron energy loss spectroscopy Be-distribution
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具有双重显影特性的多用途单分子树脂化学放大光刻胶
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作者 苑晓冬 陈金平 +2 位作者 于天君 曾毅 李嫕 《应用化学》 CAS CSCD 北大核心 2024年第7期1024-1034,共11页
化学放大光刻胶(CARs)由于其在分辨率和灵敏度方面的出色性能而广泛应用于光刻领域。本文报道了一种基于单分子树脂的多用途化学放大光刻胶SP8-PAG_(AN),可同时用于365 nm光刻和电子束光刻。该体系主要由螺二芴结构的单分子树脂主体材料... 化学放大光刻胶(CARs)由于其在分辨率和灵敏度方面的出色性能而广泛应用于光刻领域。本文报道了一种基于单分子树脂的多用途化学放大光刻胶SP8-PAG_(AN),可同时用于365 nm光刻和电子束光刻。该体系主要由螺二芴结构的单分子树脂主体材料(SP-8Boc)和N-(三氟甲基磺酸酯基)蒽-1,9-二羧酰亚胺非离子型光致产酸剂(PAGAn)组成。测试了产酸剂PAGAN在365 nm紫外光激发下的光致产酸效率ΦH+为23%。研究了SP8-PAG_(AN)光刻胶的365 nm光刻和电子束光刻性能。365 nm光刻中,分别利用四甲基氢氧化胺(TMAH,质量分数2.38%)水溶液和正己烷作为显影液,可实现1μm正性和负性光刻图案。电子束光刻中,可实现50 nm Line/Space(L/S)的正性密集线条图案(曝光剂量110μC/cm^(2)),32 nm L/S的负性密集线条图案(曝光剂量40μC/cm^(2))以及19 nm L/3S负性半密集线条图案(曝光剂量96μC/cm^(2))。本研究工作提供了一种具有双重显影特性的多用途单分子树脂化学放大光刻胶的新范例。 展开更多
关键词 化学放大光刻胶 双重显影 单分子树脂 365 nm光刻 电子束光刻
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残余应力分布对基板玻璃落球冲击强度影响的数值模拟研究
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作者 朱经纬 舒众众 +5 位作者 金良茂 曹志强 张冲 郑际杰 刘涌 韩高荣 《硅酸盐通报》 CAS 北大核心 2024年第4期1267-1273,1291,共8页
落球冲击强度是电子基板玻璃力学性能的重要指标,而残余应力对基板玻璃落球冲击强度有极大的影响。本文结合真实落球冲击试验,使用有限元方法对电子基板玻璃在不同残余应力分布模式下的落球冲击强度进行了数值模拟计算。结果表明,有限... 落球冲击强度是电子基板玻璃力学性能的重要指标,而残余应力对基板玻璃落球冲击强度有极大的影响。本文结合真实落球冲击试验,使用有限元方法对电子基板玻璃在不同残余应力分布模式下的落球冲击强度进行了数值模拟计算。结果表明,有限元数值模拟能够准确地反映落球冲击试验中的真实响应和基板玻璃破碎形貌。数值模拟中电子基板玻璃的落球冲击强度(通过残余质量率表征)和受冲击区域的残余张应力之间存在非线性关系,当残余张应力数值超过阈值时,落球冲击强度迅速下降。冲击区域存在的残余张应力对落球冲击产生的应力具有明显的放大作用,仅1.0 MPa的残余张应力就能使冲击产生的应力较无残余应力时提高约10 MPa,这是造成电子基板玻璃落球冲击强度下降的重要原因。 展开更多
关键词 电子基板玻璃 落球冲击强度 残余应力 数值模拟 落球冲击试验
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扫描电子显微镜和能谱仪在玻璃结石成分分析中的应用 被引量:1
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作者 李总盛 杨启乐 +3 位作者 张海翔 李从英 赵仔叶 穆树兰 《玻璃搪瓷与眼镜》 CAS 2024年第2期7-12,23,共7页
玻璃中常见各种结石缺陷,利用透反偏光显微镜可以初步判定玻璃结石的种类,但无法分析结石的成分,且处理样品效率较低。以硅质析晶结石、铝质耐火材料结石、锆质耐火材料结石为例,利用扫描电子显微镜和能谱仪分析结石,可以快速测定结石成... 玻璃中常见各种结石缺陷,利用透反偏光显微镜可以初步判定玻璃结石的种类,但无法分析结石的成分,且处理样品效率较低。以硅质析晶结石、铝质耐火材料结石、锆质耐火材料结石为例,利用扫描电子显微镜和能谱仪分析结石,可以快速测定结石成分,辨别结石种类,进而推断结石形成的原因。采用该方法可及时准确调整生产,解决玻璃生产中产生结石问题。 展开更多
关键词 玻璃结石 扫描电子显微镜 能谱仪 透反偏光显微镜
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功能玻璃关键材料体系发展战略研究
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作者 彭寿 秦旭升 +2 位作者 洪伟 吴波 黄毅 《中国工程科学》 CSCD 北大核心 2024年第3期10-18,共9页
功能玻璃材料是无机非金属材料的重要组成,主要包括电子信息玻璃、新能源玻璃、特种玻璃等,是信息显示、半导体、新能源、深海、深空等战略性新兴产业的基础性支撑性材料,已成为我国建设智能社会、低碳社会的重要基石。我国近年来在功... 功能玻璃材料是无机非金属材料的重要组成,主要包括电子信息玻璃、新能源玻璃、特种玻璃等,是信息显示、半导体、新能源、深海、深空等战略性新兴产业的基础性支撑性材料,已成为我国建设智能社会、低碳社会的重要基石。我国近年来在功能玻璃领域取得一系列重大成就,但仍存在关键材料短板环节突出、跟踪研发、创新资源分散、体系化发展不足等问题。本文按照主干化、体系化研究思路,围绕电子信息玻璃、新能源玻璃、特种玻璃等关键材料的技术、产业、支撑等体系化发展要素,梳理了国外功能玻璃领域先进国家的发展现状,结合我国的发展现状,凝炼了我国功能玻璃关键材料发展面临的主要问题,提出了我国功能玻璃关键材料的发展思路与近期、中期、远期的发展目标,凝练了我国功能玻璃关键材料领域的重点技术发展方向。研究建议:增强关键原材料保障能力,为产业安全发展提供有力支撑;加速启动功能玻璃关键材料创新滚动规划;强化功能玻璃关键材料政策支撑;完善功能玻璃关键材料的绿色低碳与数字化发展。 展开更多
关键词 无机非金属材料 功能玻璃 电子信息玻璃 新能源玻璃 特种玻璃
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电子玻璃生产中节瘤缺陷的分析与对策
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作者 张云晓 刘明 杨记龙 《中国建材科技》 CAS 2024年第S01期82-83,共2页
本文从节瘤缺陷产生机理和其宏观与微观形态入手,分析导致节瘤缺陷产生的因素。结合实际生产中出现的情况以及进行解决措施进行综合分析,对降低电子玻璃节瘤缺陷,提高电子玻璃品质具有指导意义。
关键词 电子玻璃 节瘤 分析 对策
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玻璃通孔TGV技术的性能优势及应用前景
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作者 赵龙江 杨威 +3 位作者 侯宏荣 徐剑 张志军 王答成 《中国建材科技》 CAS 2024年第S01期29-30,47,共3页
作为封装中所用的中间基板,玻璃虽然具有的高平滑性、和Si同等的热膨胀率等有利条件,但传统的玻璃微孔加工技术无法克服玻璃通孔的微裂纹、碎裂及热应力等问题,因此之前作为电子封装的expansion,CTE材质均为陶瓷或有机材料,近几年随着... 作为封装中所用的中间基板,玻璃虽然具有的高平滑性、和Si同等的热膨胀率等有利条件,但传统的玻璃微孔加工技术无法克服玻璃通孔的微裂纹、碎裂及热应力等问题,因此之前作为电子封装的expansion,CTE材质均为陶瓷或有机材料,近几年随着激光深度诱导刻蚀技术(LIDE)的出现,使得玻璃作为电子封装中间基板的优势又进一步发挥出来,玻璃通孔孔径可以实现10~100μm,纵横比可以根据应用场景实时设计。 展开更多
关键词 电子封装 玻璃通孔 热膨胀性能 玻璃基板
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云母微晶玻璃的研究与应用进展
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作者 杜文浩 肖卓豪 +5 位作者 崔久治 黄新华 李秀英 孔令兵 艾军 付震 《陶瓷学报》 CAS 北大核心 2024年第1期46-57,共12页
云母微晶玻璃是一种独特的玻璃陶瓷复合材料,一般通过对K2O-MgO-MgF2-Al_(2)O_(3)-SiO_(2)体系玻璃进行热处理而获得,这一过程使其主要以云母晶体为主晶相,形成具有特殊片层状结构的微晶玻璃。系统地介绍了云母微晶玻璃的组成体系、制... 云母微晶玻璃是一种独特的玻璃陶瓷复合材料,一般通过对K2O-MgO-MgF2-Al_(2)O_(3)-SiO_(2)体系玻璃进行热处理而获得,这一过程使其主要以云母晶体为主晶相,形成具有特殊片层状结构的微晶玻璃。系统地介绍了云母微晶玻璃的组成体系、制备方法,以及其微观结构与性能的研究进展,特别关注的是其独特的可切削性能,其层片状结构为其赋予了出色的可切削特性,使其能够通过各种加工手段制成精密尺寸、精密配合和复杂形状的构件。重点总结了云母微晶玻璃在生物组织、高精度结构件、真空电子器件等领域展现出是卓越的应用能力,并对云母微晶玻璃的发展趋势进行了展望。 展开更多
关键词 云母微晶玻璃 生物组织 高精度结构件 真空电子器件
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