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MOLECULAR DYNAMICS SIMULATION OF POLISHING PROCESS BASED ON COUPLING VIBRATIONS OF LIQUID 被引量:2
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作者 HUANG Zhigang GUO Zhongning +3 位作者 CHENG Xing YU Daming DU Xue LI Rongbing 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 2006年第1期19-24,共6页
Molecular dynamics method is applied to study the machining mechanisms of polishing based on coupling vibrations of liquid. The physical phenomena of abrasive particles bombarding on silicon monocrystal surface are si... Molecular dynamics method is applied to study the machining mechanisms of polishing based on coupling vibrations of liquid. The physical phenomena of abrasive particles bombarding on silicon monocrystal surface are simulated using Tersoff potentials. The effects of vibration parameters, particle size, incident angle and particle material are analyzed and discussed. Material removal mechanisms are studied. Deformation and embedment phenomena are found in the simulations, Bombardment will destroy the crystal structures near the impact point, and adhesion effect is responsible for final removal of material. 展开更多
关键词 Molecular dynamics simulation Ultra-smooth polishing ultrasonic vibration
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