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利用CSP求解极小碰集的方法 被引量:8
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作者 王艺源 欧阳丹彤 +1 位作者 张立明 张永刚 《计算机研究与发展》 EI CSCD 北大核心 2015年第3期588-595,共8页
基于模型诊断是人工智能领域中具有挑战性的问题,包含了很多人工智能中的关键问题,其研究对整个人工智能领域起着重要推动作用.在基于模型诊断中,候选诊断结果通常由所有极小冲突集对应的所有极小碰集所描述,求出所有极小碰集是其核心... 基于模型诊断是人工智能领域中具有挑战性的问题,包含了很多人工智能中的关键问题,其研究对整个人工智能领域起着重要推动作用.在基于模型诊断中,候选诊断结果通常由所有极小冲突集对应的所有极小碰集所描述,求出所有极小碰集是其核心问题之一.提出一种将极小碰集问题转换为约束满足问题的方法,该方法调用成熟的CSP求解器进行求解,扩展了约束可满足问题的应用领域.首次提出hard-冲突集和soft-冲突集的概念,并给出利用所提的方法分别求解具有一些特征的极小碰集:小于固定长度、不含特定元素及包含hard-冲突集和soft-冲突集.实验结果表明,提出的方法易于实现、扩展性强,对于特定类型极小碰集问题的求解效率较高. 展开更多
关键词 极小碰集 约束可满足问题 基于模型诊断 hard-冲突集 soft-冲突集
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ON A CLASS OF BESICOVITCH FUNCTIONS TO HAVE EXACT BOX DIMENSION: A NECESSARY AND SUFFICIENT CONDITION 被引量:1
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作者 ZhouSongping HeGuolong 《Analysis in Theory and Applications》 2004年第2期175-181,共7页
This paper summarized recent achievements obtained by the authors about the box dimensions of the Besicovitch functions given bywhere 1 < s < 2, λk> tends to infinity as k→∞ and λk satisfies λk+1/λk≥λ... This paper summarized recent achievements obtained by the authors about the box dimensions of the Besicovitch functions given bywhere 1 < s < 2, λk> tends to infinity as k→∞ and λk satisfies λk+1/λk≥λ>1. The results show thatis a necessary and sufficient condition for Graph(B(t)) to have same upper and lower box dimensions. For the fractional Riemann-Liouvtlle differential operator Du and the fractional integral operator D-v, the results show that if A is sufficiently large, then a necessary and sufficient condition for box dimensionof Graph(D-v(B)), 0 < v < s - 1, to be s - v and box dimension of Graph(Du(B)), 0 < u < 2 - s, to bes + u is also lim. 展开更多
关键词 Weierstrass function Besicovitch function fractal dimension box dimension hard- mard condition
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THE INVESTIGATION ON PLASMA ARC TREATMENT OF CHROMIUM PLATED ALLOY STRUCTURE STEEL
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作者 X.M.Fan J.W.Huang K.H.Wang Q.Liu 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2005年第3期289-294,共6页
The technology of plasma arc was used to modify the interface adhesion between c hromium coating and steel substrate. The interface microstructure was studied as a function of plasma arc processing parameters. Microst... The technology of plasma arc was used to modify the interface adhesion between c hromium coating and steel substrate. The interface microstructure was studied as a function of plasma arc processing parameters. Microstructure analysis was per formed by optical microscopy, scanning electron microscopy and electron probe. T he microhardness distribution along the depth of a cross-section of the chromium coating and the substrate was measured. The results show the energy density of transferred plasma arc is obviously higher than plasma non-transferred arc. The molten interface was obtained by plasma transferred arc. Interfaces between chro mium coating and steel substrate can be divided by plasma non-transferred arc in to three classes: non-molten, a little molten and molten. Good interface bonding was obtained by proper process parameters. The microhardness of chromium coatin g decreases with increasing energy density of plasma arc. 展开更多
关键词 plasma transferred arc plasma non-transferred arc COATING hard-
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Multiply Charged Anions,Maximum Charge Acceptance,and Higher Electron Affinities of Molecules,Superatoms,and Clusters
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作者 VON SZENTPáLY László 《物理化学学报》 SCIE CAS CSCD 北大核心 2018年第6期675-682,共8页
The addition of electrons to form gas-phase multiply charged anions(MCAs)normally requires sophisticated experiments or calculations.In this work,the factors stabilizing the MCAs,the maximum electron uptake of gas-pha... The addition of electrons to form gas-phase multiply charged anions(MCAs)normally requires sophisticated experiments or calculations.In this work,the factors stabilizing the MCAs,the maximum electron uptake of gas-phase molecules,X,and the electronic stability of MCAs X^(Q-),are discussed.The drawbacks encountered when applying computational and/or conceptual density functional theory(DFT)to MCAs are highlighted.We develop and test a different model based on the valence-state concept.As in DFT,the electronic energy,E(N,v_(ex)),is a continuous function of the average electron number,N,and the external potential,v_(ex),of the nuclei.The valence-state-parabola is a second-order polynomial that allows extending E(N,v_(ex))to dianions and higher MCAs.The model expresses the maximum electron acceptance,Q_(max),and the higher electron affinities,A_Q,as simple functions of the firstelectron affinity,A_1,and the ionization energy,I,of the"ancestor"system.Thus,the maximum electron acceptance is Q_(max,calc)=1+12A_1/7(I-A_1).The ground-state parabola model of the conceptual DFT yields approximately half of this value,and it is termed Q_(max,GS)=?+A_1/(I-A_1).A large variety of molecules are evaluated including fullerenes,metal clusters,super-pnictogens,super-halogens(OF_3),super-alkali species(OLi_3),and neutral or charged transition-metal complexes,AB_(m )L_n^(0/+/-).The calculated second electron affinity A_(2,calc)=A_1-(7/12)(I-A_1)is linearly correlated to the literature references A_(2,lit) with a correlation coefficient R=0.998.A_2 or A_3 values are predicted for further 24 species.The appearance sizes,n_(ap)^(3-),of triply charged anionic clusters and fullerenes are calculated in agreement with the literature. 展开更多
关键词 Multiply CHARGED negative ions Their appearance sizes Second electron AFFINITY Third electronaffinity Conceptual density-functional theory valence-state PARABOLA model of ELECTRONEGATIVITY
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