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Low threading dislocation density in GaN films grown on patterned sapphire substrates
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作者 梁萌 王国宏 +8 位作者 李鸿渐 李志聪 姚然 王兵 李盼盼 李璟 伊晓燕 王军喜 李晋闽 《Journal of Semiconductors》 EI CAS CSCD 2012年第11期24-27,共4页
The growth process of three-dimensional growth mode(3D) switching to two-dimensional growth mode (2D) is investigated when GaN films are grown on cone-shaped patterned sapphire substrates by metal-organic chemical... The growth process of three-dimensional growth mode(3D) switching to two-dimensional growth mode (2D) is investigated when GaN films are grown on cone-shaped patterned sapphire substrates by metal-organic chemical vapor deposition.The growth condition of the 3D-2D growth process is optimized to reduce the threading dislocation density(TDD).It is found that the condition of the 3D layer is critical.The 3D layer keeps growing under the conditions of lowⅤ/Ⅲratio,low temperature,and high pressure until its thickness is comparable to the height of the cone-shaped patterns.Then the 3D layer surrounds the cone-shaped patterns and has inclined side facets and a top(0001) plane.In the following 2D-growth process,inclined side facets coalesce quickly and the interaction of TDs with the side facets causes the TDs to bend over.As a result,the TDD of GaN films can decrease to 1×10~8 cm^(-2),giving full-width at half maximum values of 211 and 219 arcsec for(002) and(102) omega scans, respectively. 展开更多
关键词 threading dislocation GaN pattern sapphire substrate metal organic chemical vapor deposition
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