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Effects of Dummy Thermal Vias on Interconnect Delay and Power Dissipation of Very Large Scale Integration Circuits
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作者 XU Peng PAN Zhongliang 《Wuhan University Journal of Natural Sciences》 CAS CSCD 2018年第5期438-446,共9页
The interconnect temperature of very large scale integration(VLSI) circuits keeps rising due to self-heating and substrate temperature, which can increase the delay and power dissipation of interconnect wires. The t... The interconnect temperature of very large scale integration(VLSI) circuits keeps rising due to self-heating and substrate temperature, which can increase the delay and power dissipation of interconnect wires. The thermal vias are regarded as a promising method to improve the temperature performance of VLSI circuits. In this paper, the extra thermal vias were used to decrease the delay and power dissipation of interconnect wires of VLSI circuits. Two analytical models were presented for interconnect temperature, delay and power dissipation with adding extra dummy thermal vias. The influence of the number of thermal vias on the delay and power dissipation of interconnect wires was analyzed and the optimal via separation distance was investigated. The experimental results show that the adding extra dummy thermal vias can reduce the interconnect average temperature, maximum temperature, delay and power dissipation. Moreover, this method is also suitable for clock signal wires with a large root mean square current. 展开更多
关键词 very large scale integration (VLSI) circuits interconnect temperature interconnect delay thermal vias interconnect power dissipation
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RF-TSV DESIGN, MODELING AND APPLICATION FOR 3D MULTI-CORE COMPUTER SYSTEMS
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作者 Yu Le Yang Haigang Xie Yuanlu 《Journal of Electronics(China)》 2012年第5期431-444,共14页
The state-of-the-art multi-core computer systems are based on Very Large Scale three Dimensional (3D) Integrated circuits (VLSI). In order to provide high-speed vertical data transmission in such 3D systems, efficient... The state-of-the-art multi-core computer systems are based on Very Large Scale three Dimensional (3D) Integrated circuits (VLSI). In order to provide high-speed vertical data transmission in such 3D systems, efficient Through-Silicon Via (TSV) technology is critically important. In this paper, various Radio Frequency (RF) TSV designs and models are proposed. Specifically, the Cu-plug TSV with surrounding ground TSVs is used as the baseline structure. For further improvement, the dielectric coaxial and novel air-gap coaxial TSVs are introduced. Using the empirical parameters of these coaxial TSVs, the simulation results are obtained demonstrating that these coaxial RF-TSVs can provide two-order higher of cut-off frequencies than the Cu-plug TSVs. Based on these new RF-TSV technologies, we propose a novel 3D multi-core computer system as well as new architectures for manipulating the interfaces between RF and baseband circuit. Taking into consideration the scaling down of IC manufacture technologies, predictions for the performance of future generations of circuits are made. With simulation results indicating energy per bit and area per bit being reduced by 7% and 11% respectively, we can conclude that the proposed method is a worthwhile guideline for the design of future multi-core computer ICs. 展开更多
关键词 Three Dimensional (3D) very large scale integrated circuits (VLSI) Ratio Frequency (RF) Through-Silicon Vias (TSVs) Multi-core computer technology
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