The effects of wet re-oxidation annealing （wet-ROA） on the shallow interface traps of n-type 4H-SiC metal oxide-semiconductor （MOS） capacitors were investigated by Gray-Brown method and angle-dependent X- ray phot...The effects of wet re-oxidation annealing （wet-ROA） on the shallow interface traps of n-type 4H-SiC metal oxide-semiconductor （MOS） capacitors were investigated by Gray-Brown method and angle-dependent X- ray photoelectron spectroscopy technique. The results present the energy distribution of the density of interface traps （Dit） from 0 to 0.2 eV below SiC conduction band edge （Ec） of the sample with wet-ROA for the first time, and indicate that wet-ROA could reduce the Dit in this energy range by more than 60%. The reduction in Dit is attributed to the reaction between the introduced oxygen and the SiOxCy species, which results in C release and SiOxCy transformation into higher oxidation states, thus reducing the SiOxCy content and the SiOxCy interface transition region thickness.展开更多
基金Project supported by the Fundamental Research Funds for the Central Universities,Ministry of Education,China(No.DUT11ZD114)
文摘The effects of wet re-oxidation annealing （wet-ROA） on the shallow interface traps of n-type 4H-SiC metal oxide-semiconductor （MOS） capacitors were investigated by Gray-Brown method and angle-dependent X- ray photoelectron spectroscopy technique. The results present the energy distribution of the density of interface traps （Dit） from 0 to 0.2 eV below SiC conduction band edge （Ec） of the sample with wet-ROA for the first time, and indicate that wet-ROA could reduce the Dit in this energy range by more than 60%. The reduction in Dit is attributed to the reaction between the introduced oxygen and the SiOxCy species, which results in C release and SiOxCy transformation into higher oxidation states, thus reducing the SiOxCy content and the SiOxCy interface transition region thickness.
