对分子束外延生长的 Ga NAs外延层进行了拉曼散射研究 ,观测到了由于导带中的 E+态所引起的共振散射和由此产生的布里渊区非Γ点声子的拉曼峰 .清晰地观测到了随氮含量增大 ,氮在 Ga As中的局域模振动演变为Ga NAs中的类 Ga N晶格声子带...对分子束外延生长的 Ga NAs外延层进行了拉曼散射研究 ,观测到了由于导带中的 E+态所引起的共振散射和由此产生的布里渊区非Γ点声子的拉曼峰 .清晰地观测到了随氮含量增大 ,氮在 Ga As中的局域模振动演变为Ga NAs中的类 Ga N晶格声子带模 .通过样品在 850度快速热退火前后拉曼谱的对比 。展开更多
A high performance AlAs/In0.53 Ga0.47 As/InAs resonant tunneling diode （RTD） on InP substrate is fabricated by inductively coupled plasma etching. This RTD has a peak-to-valley current ratio （PVCR） of 7. 57 and a ...A high performance AlAs/In0.53 Ga0.47 As/InAs resonant tunneling diode （RTD） on InP substrate is fabricated by inductively coupled plasma etching. This RTD has a peak-to-valley current ratio （PVCR） of 7. 57 and a peak current density Jp = 39.08kA/cm^2 under forward bias at room temperature. Under reverse bias, the corresponding values are 7.93 and 34.56kA/cm^2 . A resistive cutoff frequency of 18.75GHz is obtained with the effect of a parasitic probe pad and wire. The slightly asymmetrical current-voltage characteristics with a nominally symmetrical structure are also discussed.展开更多
A new material structure with Al 0.22Ga 0.78As/In 0.15Ga 0.85As/GaAs emitter spacer layer and GaAs/In 0.15- Ga 0.85As/GaAs well for resonant tunneling diodes is designed and the corresponding device...A new material structure with Al 0.22Ga 0.78As/In 0.15Ga 0.85As/GaAs emitter spacer layer and GaAs/In 0.15- Ga 0.85As/GaAs well for resonant tunneling diodes is designed and the corresponding device is fabricated.RTDs DC characteristics are measured at room temperature. Peak-to-valley current ratio and the available current density for RTDs at room temperature are computed.Analysis on these results suggests that adjusting material structure and optimizing fabrication processes will be an effective means to improve the quality of RTDs.展开更多
文摘对分子束外延生长的 Ga NAs外延层进行了拉曼散射研究 ,观测到了由于导带中的 E+态所引起的共振散射和由此产生的布里渊区非Γ点声子的拉曼峰 .清晰地观测到了随氮含量增大 ,氮在 Ga As中的局域模振动演变为Ga NAs中的类 Ga N晶格声子带模 .通过样品在 850度快速热退火前后拉曼谱的对比 。
基金Supported by National Basic Research Program of China(2014 CB643903,2013 CB932904)National Natural Science Foundation of China(61435012,61274125,and 61274013)+1 种基金National Special funds for the Development of Major Research Equipment and Instruments,China(2012YQ140005)Strategic Priority Research Program(B)of Chinese Academy of Sciences(XDB01010200)
文摘A high performance AlAs/In0.53 Ga0.47 As/InAs resonant tunneling diode （RTD） on InP substrate is fabricated by inductively coupled plasma etching. This RTD has a peak-to-valley current ratio （PVCR） of 7. 57 and a peak current density Jp = 39.08kA/cm^2 under forward bias at room temperature. Under reverse bias, the corresponding values are 7.93 and 34.56kA/cm^2 . A resistive cutoff frequency of 18.75GHz is obtained with the effect of a parasitic probe pad and wire. The slightly asymmetrical current-voltage characteristics with a nominally symmetrical structure are also discussed.
文摘A new material structure with Al 0.22Ga 0.78As/In 0.15Ga 0.85As/GaAs emitter spacer layer and GaAs/In 0.15- Ga 0.85As/GaAs well for resonant tunneling diodes is designed and the corresponding device is fabricated.RTDs DC characteristics are measured at room temperature. Peak-to-valley current ratio and the available current density for RTDs at room temperature are computed.Analysis on these results suggests that adjusting material structure and optimizing fabrication processes will be an effective means to improve the quality of RTDs.
