目的探讨工作气压对管内等离子体放电光学现象以及Si/O-DLC(Si and O Incorporated DLC,Si/O-DLC)薄膜结构与性能的影响,为获得管内高质量、均匀的Si/O-DLC薄膜制备工艺技术提供指导。方法利用空心阴极等离子体增强化学气相沉积(Hollow ...目的探讨工作气压对管内等离子体放电光学现象以及Si/O-DLC(Si and O Incorporated DLC,Si/O-DLC)薄膜结构与性能的影响,为获得管内高质量、均匀的Si/O-DLC薄膜制备工艺技术提供指导。方法利用空心阴极等离子体增强化学气相沉积(Hollow Cathode Plasma Enhanced Chemical Vapor Deposition,HC-PECVD)技术,通过改变工作气压在管内沉积Si/O-DLC薄膜。利用高速摄像机记录并对比不同工作气压下管内等离子体放电光学现象。通过SPM、XPS和Raman光谱仪表征不同工作气压下薄膜的三维立体表面形貌和微观结构,并利用SEM、纳米压痕仪以及划痕测试系统,对比研究管内Si/O-DLC薄膜的硬度、弹性模量、膜基结合力以及沿管轴向的薄膜厚度分布。结果随着工作气压的上升,管径向中心处亮斑面积和光强先增大增强后趋于缩小暗淡。在不同工作气压下,均能够在管内获得表面光滑的Si/O-DLC薄膜,粗糙度为3~10 nm。随着工作气压的上升,管内Si/O-DLC薄膜的平均厚度从1.42μm增大到2.06μm,且沿管轴向的薄膜厚度分布均匀度从24%显著提高到65%;不同工作气压下管内Si/O-DLC薄膜沿管轴向平均硬度呈先增大后减小的趋势,总体平均硬度可达(14±1)GPa。管内Si/O-DLC薄膜在工作气压上升到25 mTorr时获得较高的平均膜基结合力。结论改变工作气压能够显著影响管内壁Si/O-DLC薄膜的结构与性能,当工作气压为25 m Torr时,在管内获得均匀性最优、结合力较高的Si/O-DLC薄膜。展开更多
Carbon nanotubes are a promising candidate for the application of flexible electronics due to the ultrahigh intrinsic conductivity and excellent mechanical flexibility. In the present work, the morphology of the ultra...Carbon nanotubes are a promising candidate for the application of flexible electronics due to the ultrahigh intrinsic conductivity and excellent mechanical flexibility. In the present work, the morphology of the ultrathin (diameter<20 nm) multi-walled carbon nanotubes (MWCNTs) under an axial compression was investigated by using in-situ transmission electron microscopy. Moreover, the overall dynamic deformation processes and the force-displacement (F-D) curves of the MWCNTs were also examined. Interestingly, the MWCNTs almost restored their original morphology after 15 loading-unloading cycles. The deformation and recovery process indicate that the MWCNTs are flexible and exhibit excellent durability against compression. The Young’s modulus of the MWCNTs is estimated with the value of ∽0.655 TPa derived from the F-D curves fitting. Our results suggest that the ultrathin carbon nanotube structures may have great application potentials in flexible devices.展开更多
文摘目的探讨工作气压对管内等离子体放电光学现象以及Si/O-DLC(Si and O Incorporated DLC,Si/O-DLC)薄膜结构与性能的影响,为获得管内高质量、均匀的Si/O-DLC薄膜制备工艺技术提供指导。方法利用空心阴极等离子体增强化学气相沉积(Hollow Cathode Plasma Enhanced Chemical Vapor Deposition,HC-PECVD)技术,通过改变工作气压在管内沉积Si/O-DLC薄膜。利用高速摄像机记录并对比不同工作气压下管内等离子体放电光学现象。通过SPM、XPS和Raman光谱仪表征不同工作气压下薄膜的三维立体表面形貌和微观结构,并利用SEM、纳米压痕仪以及划痕测试系统,对比研究管内Si/O-DLC薄膜的硬度、弹性模量、膜基结合力以及沿管轴向的薄膜厚度分布。结果随着工作气压的上升,管径向中心处亮斑面积和光强先增大增强后趋于缩小暗淡。在不同工作气压下,均能够在管内获得表面光滑的Si/O-DLC薄膜,粗糙度为3~10 nm。随着工作气压的上升,管内Si/O-DLC薄膜的平均厚度从1.42μm增大到2.06μm,且沿管轴向的薄膜厚度分布均匀度从24%显著提高到65%;不同工作气压下管内Si/O-DLC薄膜沿管轴向平均硬度呈先增大后减小的趋势,总体平均硬度可达(14±1)GPa。管内Si/O-DLC薄膜在工作气压上升到25 mTorr时获得较高的平均膜基结合力。结论改变工作气压能够显著影响管内壁Si/O-DLC薄膜的结构与性能,当工作气压为25 m Torr时,在管内获得均匀性最优、结合力较高的Si/O-DLC薄膜。
基金supported by the National Natural Science Foundation of China (No.51573201, No.21773205, No.51501209, and No.201675165)NSFC-Zhejiang Joint Fund for the Integration of Industrialization and Informatization (U1709205)+6 种基金National Key R&D Program of China (2017YFB0406000)the Project of the Chinese Academy of Sciences (YZ201640 and KFZDSW-409)Public Welfare Project of Zhejiang Province (2016C31026)Science and Technology Major Project of Ningbo (2016B10038 and 2016S1002)International S&T Cooperation Program of Ningbo (2017D10016)the 3315 Program of Ningbothe Science and Technology Major Project of Ningbo (2015S1001)
文摘Carbon nanotubes are a promising candidate for the application of flexible electronics due to the ultrahigh intrinsic conductivity and excellent mechanical flexibility. In the present work, the morphology of the ultrathin (diameter<20 nm) multi-walled carbon nanotubes (MWCNTs) under an axial compression was investigated by using in-situ transmission electron microscopy. Moreover, the overall dynamic deformation processes and the force-displacement (F-D) curves of the MWCNTs were also examined. Interestingly, the MWCNTs almost restored their original morphology after 15 loading-unloading cycles. The deformation and recovery process indicate that the MWCNTs are flexible and exhibit excellent durability against compression. The Young’s modulus of the MWCNTs is estimated with the value of ∽0.655 TPa derived from the F-D curves fitting. Our results suggest that the ultrathin carbon nanotube structures may have great application potentials in flexible devices.
