A new system for measuring low-ohmic standard resistors through a dual current sources bridge is introduced.It is used for low resistance measurements from 1 mΩto 1Ωat 1∶1 ratio,which is suitable for the laboratori...A new system for measuring low-ohmic standard resistors through a dual current sources bridge is introduced.It is used for low resistance measurements from 1 mΩto 1Ωat 1∶1 ratio,which is suitable for the laboratories without cryogenic current comparators(CCC)or direct current comparators(DCC)bridges.Behavior of this bridge is evaluated by comparing its measured values with the unknown resistor values obtained by another method.The accuracy of the introduced bridge is in the level of 10-5 for the 1 mΩresistor,and in the level of 10-4 for the 10 mΩ,100 mΩand 1Ωresistors.Moreover,a dual voltage sources system for the measurement of DC standard resistors from 1 kΩto 100 MΩis also presented.In this system,a modification is made on the modified Wheatstone bridge to evaluate its performance by adding another digital multimeter to measure the ratio between the unknown and the standard resistors simultaneously.This bridge is verified by comparing the measured values of 10 kΩresistor obtained by the two methods with its actual value.The bridge accuracy is in the level of 10-6 except for the 1 kΩresistor,and the bridge asymmetry is also evaluated.It is found the asymmetry is in the level of 10-6 for the resistors from 10 kΩto 100 MΩand in the level of 10-5 for 1 kΩresistors.The introduced bridges operations are controlled by LabVIEW programs designed specially for this purpose,and the expanded uncertainty is also evaluated for all measurement results.展开更多
Scanning probe microscopy(SPM)is a branch of microscopy that forms images of surfaces using a physical probe that scans the specimen.Atomic force microscopy is one of the SPM family which is considered as a very versa...Scanning probe microscopy(SPM)is a branch of microscopy that forms images of surfaces using a physical probe that scans the specimen.Atomic force microscopy is one of the SPM family which is considered as a very versatile tool for surface imaging and measurements.A wide range of various samples can be measured regardless of being conductive,no-conductive,in vacuum,in air or in a fluid as a unique feature.One of the most challenges in atomic force microscopes(AFMs)is to evaluate the associated uncertainty during the surface measurements by AFMs.Here,an optical AFM is calibrated through the calibration of XYZ stage.The approach is to overcome difficulties experienced when trying to evaluate some uncertainty components which cannot be experimentally determined i.e.tip surface interaction forces and tip geometry.The Monte Carlo method is then used to determine the associated uncertainties due to such factors by randomly drawing the parameters according to their associated tolerances and their probability density functions(PDFs).The whole process follows supplement 2 to“the guide to the expression of the uncertainty in measurement”(GUM).The approach validated in the paper shows that the evaluated uncertainty in AFM is about 10 nm.展开更多
The new standards for the photometric characterization of light-emitting diode(LED)sources and luminaries require the measurement evaluation of photometric and colorimetric quantities.This present work studies the per...The new standards for the photometric characterization of light-emitting diode(LED)sources and luminaries require the measurement evaluation of photometric and colorimetric quantities.This present work studies the performance of some types of LED light sources in different spectra and different color temperature for photometric and colorimetric applications.The study depends on mixed spectra of these different types of LEDs to enhance the color rendering index(CRI)to be near as possible to standard sources.Characterization of LED sources requires the evaluation of some photometric and colorimetric quantities such as luminous flux(),chromaticity coordinates(x,y)and(u′,v′),correlated color temperature(CCT)and color rending indices(CRI).展开更多
文摘A new system for measuring low-ohmic standard resistors through a dual current sources bridge is introduced.It is used for low resistance measurements from 1 mΩto 1Ωat 1∶1 ratio,which is suitable for the laboratories without cryogenic current comparators(CCC)or direct current comparators(DCC)bridges.Behavior of this bridge is evaluated by comparing its measured values with the unknown resistor values obtained by another method.The accuracy of the introduced bridge is in the level of 10-5 for the 1 mΩresistor,and in the level of 10-4 for the 10 mΩ,100 mΩand 1Ωresistors.Moreover,a dual voltage sources system for the measurement of DC standard resistors from 1 kΩto 100 MΩis also presented.In this system,a modification is made on the modified Wheatstone bridge to evaluate its performance by adding another digital multimeter to measure the ratio between the unknown and the standard resistors simultaneously.This bridge is verified by comparing the measured values of 10 kΩresistor obtained by the two methods with its actual value.The bridge accuracy is in the level of 10-6 except for the 1 kΩresistor,and the bridge asymmetry is also evaluated.It is found the asymmetry is in the level of 10-6 for the resistors from 10 kΩto 100 MΩand in the level of 10-5 for 1 kΩresistors.The introduced bridges operations are controlled by LabVIEW programs designed specially for this purpose,and the expanded uncertainty is also evaluated for all measurement results.
基金National Institute of Standards(NIS),11211,Egypt。
文摘Scanning probe microscopy(SPM)is a branch of microscopy that forms images of surfaces using a physical probe that scans the specimen.Atomic force microscopy is one of the SPM family which is considered as a very versatile tool for surface imaging and measurements.A wide range of various samples can be measured regardless of being conductive,no-conductive,in vacuum,in air or in a fluid as a unique feature.One of the most challenges in atomic force microscopes(AFMs)is to evaluate the associated uncertainty during the surface measurements by AFMs.Here,an optical AFM is calibrated through the calibration of XYZ stage.The approach is to overcome difficulties experienced when trying to evaluate some uncertainty components which cannot be experimentally determined i.e.tip surface interaction forces and tip geometry.The Monte Carlo method is then used to determine the associated uncertainties due to such factors by randomly drawing the parameters according to their associated tolerances and their probability density functions(PDFs).The whole process follows supplement 2 to“the guide to the expression of the uncertainty in measurement”(GUM).The approach validated in the paper shows that the evaluated uncertainty in AFM is about 10 nm.
文摘The new standards for the photometric characterization of light-emitting diode(LED)sources and luminaries require the measurement evaluation of photometric and colorimetric quantities.This present work studies the performance of some types of LED light sources in different spectra and different color temperature for photometric and colorimetric applications.The study depends on mixed spectra of these different types of LEDs to enhance the color rendering index(CRI)to be near as possible to standard sources.Characterization of LED sources requires the evaluation of some photometric and colorimetric quantities such as luminous flux(),chromaticity coordinates(x,y)and(u′,v′),correlated color temperature(CCT)and color rending indices(CRI).
