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不断攀登前沿科技顶峰的ASML——访ASML中国区技术行销经理程天风先生
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作者 胡芃 程天风 《中国集成电路》 2006年第3期80-81,共2页
ASML公司致力于为客户提供最佳的光刻设备与技术以支持复杂的集成电路制造。ASML目前在全球欧美和亚洲的50个地区设有分支机构,拥有5000位员工。对于国内代工业水平的不断发展与提升,ASML作出了巨大的贡献。SEMICONChina2006展会召开前... ASML公司致力于为客户提供最佳的光刻设备与技术以支持复杂的集成电路制造。ASML目前在全球欧美和亚洲的50个地区设有分支机构,拥有5000位员工。对于国内代工业水平的不断发展与提升,ASML作出了巨大的贡献。SEMICONChina2006展会召开前夕,记者特意走访了ASML公司,以下是对ASML中国区技术行销经理程天风先生的访谈内容。 展开更多
关键词 技术 经理 行销 中国 ASML公司 科技 攀登 集成电路制造 光刻设备 分支机构
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用于图像传感器制造的光刻技术 被引量:2
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作者 Geoffrey Phillipps Rudy Pellens 《中国集成电路》 2007年第1期47-51,共5页
关键词 图像传感器 制造商 光刻技术 数码相机 数字成像 像素矩阵 需求市场 光转换
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采用双扫描平台技术的ArF浸液式光刻 被引量:2
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作者 Jan Mulkens Bob Streefkerk +1 位作者 Martin Hoogendorp 童志义 《电子工业专用设备》 2005年第2期7-14,共8页
在193nm光刻中,已证明水是一种适于浸液式光刻的液体。浸液式光刻提出了一种可将传统的光学光刻拓展到45nm节点,甚至到32nm节点的潜能。另外,利用现有的透镜,浸液式光刻的选择提出了根据实际的数值孔径和特征图形可增大50%及更大的焦深... 在193nm光刻中,已证明水是一种适于浸液式光刻的液体。浸液式光刻提出了一种可将传统的光学光刻拓展到45nm节点,甚至到32nm节点的潜能。另外,利用现有的透镜,浸液式光刻的选择提出了根据实际的数值孔径和特征图形可增大50%及更大的焦深范围。讨论了采用浸液式光刻获得的成像结果和套刻结果。采用一个0.75数值孔径的ArF透镜,我们用双扫描平台技术(TWINSCANTM)组装一台浸液式扫描光刻机的原理型样机。最初的浸液式曝光实验数据证明了焦深的增加较大,同时以高扫描速度保持了图像的对比度。在初期引入的生产型浸液式光刻中,将采用一个0.85数值孔径的ArF透镜。该系统的分辨率将以大于0.5μm的焦深有效地支持65nm节点半导体器件的加工。这种系统初始的成像技术数据证实有效的增大了其焦深范围。 展开更多
关键词 193nm 浸液式光刻 大数值孔径 双扫描平台
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80nm应用中的高数位孔径,双载具193nm TWINSCAN扫描分步投影机
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作者 程天风 《半导体技术》 CAS CSCD 北大核心 2004年第2期7-11,34,共6页
针对次100nm的生产,ASML研发了一个新光刻系统,其中克服了许多底k1解晰度的挑战。其中包含0.85NA双载具193nmTWINSCAN的设计、性能与一些初步的量测数据。80nm的生产必须要有多方面的量测与控制来达到高准确度的线宽(CD)与对准(Overlay... 针对次100nm的生产,ASML研发了一个新光刻系统,其中克服了许多底k1解晰度的挑战。其中包含0.85NA双载具193nmTWINSCAN的设计、性能与一些初步的量测数据。80nm的生产必须要有多方面的量测与控制来达到高准确度的线宽(CD)与对准(Overlay)的要求水平。本机台拥有高成熟度的双载具平台,稳定的系统动态质(MSD),一惯性的光量递输等功能,幷包含了一个内建侦测回送系统来自动调控投影镜的像差(aberrations),来达到最佳的影像保真度。 展开更多
关键词 光刻技术 TWINSCAN 光量递输 投影机 半导体线宽控制
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光刻永恒
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作者 程天风 《半导体技术》 CAS CSCD 北大核心 2005年第6期23-27,共5页
由于新近的技术突破,先前应用瓶颈在光刻领域得到解决方案。如今浸没式氟化氩(ArF)光刻技术已经被ITRS列为45nm,甚至于32nm节点的关键技术。如果要达到路图指标,新的介面液体,偏振光应用都需要继续研发。实验室的数据也证实了这些理论... 由于新近的技术突破,先前应用瓶颈在光刻领域得到解决方案。如今浸没式氟化氩(ArF)光刻技术已经被ITRS列为45nm,甚至于32nm节点的关键技术。如果要达到路图指标,新的介面液体,偏振光应用都需要继续研发。实验室的数据也证实了这些理论。光刻技术可望继续被延伸到2010年。 展开更多
关键词 光刻技术 2010年 技术突破 解决方案 关键技术 浸没式 偏振光 实验室 应用 延伸
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设计与制造之间的界面优化
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作者 JasonSweis JudyHuckaby +3 位作者 BobNaber TomLaidig DougVanDenBroeke FungChen 《集成电路应用》 2006年第9期34-37,共4页
在设计商和制造商之间构建一种信息交流的平台可以提高产能和良率。
关键词 设计流程 制造行业 界面优化 分辨率增强技术 合作关系 可制造性 合理利用 亚波长 EDA 平台
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以浸没式技术引领光刻设备市场(英文)
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作者 ASML Netherlands 《电子工业专用设备》 2007年第4期19-21,59,共4页
在过去的几年中,ASML公司以创新的浸没式技术引领着光刻设备市场,又一次刷新了半导体制造的路线图。通过对浸没式光刻技术的再现和提升。
关键词 ASML 浸没式光刻 双扫描台 扫描曝光设备 二次成像 双重曝光 极紫外光刻
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掩膜级测量为闪存设计预测成像质量
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作者 E.van Setten O.Wismans +5 位作者 K.Grim J.Finders M.Dusa R.Birkner R.Richter T.Scherübl 《集成电路应用》 2008年第11期26-29,32,共5页
闪存不断推动着器件尺寸等比例缩小的进程,高数值孔径浸没式光刻使得45nm及以下技术节点成为可能。一些掩膜参数对于成像性能有很重要的影响,并且曝光前掩膜的空间成像可以用于定义成像质量。
关键词 成像质量 闪存 掩膜 预测 设计 测量 高数值孔径 器件尺寸
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支持晶圆代工厂光刻设备之经验
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作者 程天风 《集成电路应用》 2003年第7期59-61,共3页
晶圆代工(Wafer Foundry)模式从最早期的填充过剩产能(Capacity Fill)到纯粹代工(PurePlay)而至今日的完全代工(AllPlay,指为用户提供全部解决方案)的时代,历经数次产品替换和产能运转,而今日成为一门颇为复杂的生产技术,也是有很高利... 晶圆代工(Wafer Foundry)模式从最早期的填充过剩产能(Capacity Fill)到纯粹代工(PurePlay)而至今日的完全代工(AllPlay,指为用户提供全部解决方案)的时代,历经数次产品替换和产能运转,而今日成为一门颇为复杂的生产技术,也是有很高利润的投资。但是今天的代工市场上充满了许许多多的代工者。 展开更多
关键词 晶圆代工 光刻设备 阿斯麦光刻设备公司 易用性 科技需求
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应用TWINSCAN平台的ArF浸没式工艺(英文)
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作者 Jan Mulkens Bob Streefkerk Martin Hoogendorp 《集成电路应用》 2005年第1期72-78,共7页
For 193-nm lithography, water proves to be a suitable immersion fluid. ArF immersion offers the potential to extend conventional optical lithography to the 45-nm node and potentially to the 32-nm node. Additionally, w... For 193-nm lithography, water proves to be a suitable immersion fluid. ArF immersion offers the potential to extend conventional optical lithography to the 45-nm node and potentially to the 32-nm node. Additionally, with existing lenses, the immersion option offers the potential to increase the focus window with 50% and more, depending on actual NA and feature type. In this paper we discuss the results on imaging and overlay obtained with immersion. Using a 0.75 NA ArF projection lens,we have built a proto-type immersion scanner using TWINSCANTM technology. First experimental data on imaging demonstrated a large gain of depth of focus (DoF),while maintaining image contrast at high scan speed. For first pilot production with immersion, a 0.85 NA ArF lens will be used. The resolution capabilities of this system will support 65 nm node semiconductor devices with a DOF significantly larger than 0.5 um. Early imaging data of such a system confirms a significant increase in focus window. 展开更多
关键词 TWINSCAN ArF浸没 集成电路 193纳米工艺
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在全视场步进扫描曝光机上进行193nm光刻
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作者 Anne-Marie Goethals Ingrid Pollers +5 位作者 Patrick Jaenen Frieda Van Roey Kurt Ronse Barbra Heskamp Guy Davies 童志义 《电子工业专用设备》 2000年第1期8-16,共9页
评价了先进的 1 93nm抗蚀剂材料在全视场步进扫描系统中的光刻性能。对单层和双层抗蚀剂进行了性能和复杂性的比较。通过对最佳照明条件 (NA ,σ)的研究 ,提出了一种增大工艺窗口和减少疏、密图形偏差的方法。移相掩模的应用证明了1 93n... 评价了先进的 1 93nm抗蚀剂材料在全视场步进扫描系统中的光刻性能。对单层和双层抗蚀剂进行了性能和复杂性的比较。通过对最佳照明条件 (NA ,σ)的研究 ,提出了一种增大工艺窗口和减少疏、密图形偏差的方法。移相掩模的应用证明了1 93nm光刻技术对 1 0 0nm工艺段的拓展能力。 展开更多
关键词 光刻 步进扫描曝光机 抗蚀剂 全视场
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改进缺陷,套刻和聚焦性能的第五世代浸没式曝光系统(英文)
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作者 Jan Mulkens Bob Streefkerk +4 位作者 Hans Jasper Jos de Klerk Fred de Jong Leon Levasier Martijn Leenders 《电子工业专用设备》 2008年第3期13-19,共7页
论述了第五世代双扫描平台浸液式扫描曝光机的性能和进展。表明了在高速扫描状态下有生产价值的套刻和聚焦性能的实现。浸液式设备更多的关键部分与缺陷有关,而且该机的改进是通过有生产价值的缺陷水平方面来体现的。为了保持这种缺陷... 论述了第五世代双扫描平台浸液式扫描曝光机的性能和进展。表明了在高速扫描状态下有生产价值的套刻和聚焦性能的实现。浸液式设备更多的关键部分与缺陷有关,而且该机的改进是通过有生产价值的缺陷水平方面来体现的。为了保持这种缺陷水平的改进效果,需要在圆片应用中进行专门稳定的测量。特加是边缘空泡除去(EBR)设计和圆片斜面良流线性是很重要的。 展开更多
关键词 浸液式扫描曝光机 套刻和聚焦性能 缺陷改进 污染粒子控制
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ArF浸没式光刻在55nm逻辑器件制造中的优势(英文)
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作者 Takayuki Uchiyama Takao Tamura +4 位作者 Kazuyuki Yoshimochi Paul Graupner Hans Bakker Eelco van Setten Kenji Morisaki 《电子工业专用设备》 2007年第11期8-15,共8页
通过比较干法和浸没光刻技术在超越焦深(DOF)提高方面的一些主要特点,举例说明了采用浸没式光刻技术的许多优势。浸没式光刻技术同干法光刻技术比较起来改善了关键尺寸一致性(CDU)又避开了必需而强硬的分辨率提高技术(RET)。因此利用浸... 通过比较干法和浸没光刻技术在超越焦深(DOF)提高方面的一些主要特点,举例说明了采用浸没式光刻技术的许多优势。浸没式光刻技术同干法光刻技术比较起来改善了关键尺寸一致性(CDU)又避开了必需而强硬的分辨率提高技术(RET)。因此利用浸没式光刻技术能够有效地减少光学邻近校正(OPC)的麻烦。就成像技术而言,我们研究了光刻技术对畸变的敏感性和浸没式光刻技术光源光谱带宽对强光相对曝光量对数E95波动性能的优势。去年已经见证了被认为对浸没光刻技术在批量生产中主要难题的套刻精度、缺陷控制和焦平面精度方面有效的改进。如今55nm逻辑器件的生产制造技术要求的挑战已经得到了满足。浸没光刻技术的成就包括抗蚀剂圆片内10nm套刻精度和圆片间20nm的套刻精度,每一圆片上低于10个缺陷以及在整个圆片上40nm以内的焦平面误差。我们形成了一个顶涂层抗蚀剂工艺。总之,浸没光刻技术是55nm节点逻辑器件最有希望的制造生产技术,它可提供与干法ArF光刻技术在CDU控制、套刻性能和焦平面精度方面等效的解决方案,缺陷程度没有增加。NEC电子公司今年采用浸没光刻技术完成了55nm逻辑器件"UX7LS"的开发和试生产并形成这种UX7LS的批量生产光刻技术。 展开更多
关键词 浸没式光刻 55纳米逻辑器件 成像 套刻 关键尺寸一致性
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Meta-analysis of CO_(2) conversion,energy efficiency,and other performance data of plasma-catalysis reactors with the open access PIONEER database 被引量:1
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作者 Antoine Salden Maik Budde +28 位作者 Carolina A.Garcia-Soto Omar Biondo Jairo Barauna Marzia Faedda Beatrice Musig ChloéFromentin Minh Nguyen-Quang Harry Philpott Golshid Hasrack Domenico Aceto Yuxiang Cai Federico Azzolina Jury Annemie Bogaerts Patrick Da Costa Richard Engeln María Elena Gálvez Timo Gans Tomas Garcia Vasco Guerra Carlos Henriques Monika Motak Maria Victoria Navarro Vasile I.Parvulescu Gerard Van Rooij Bogdan Samojeden Ana Sobota Paolo Tosi Xin Tu Olivier Guaitella 《Journal of Energy Chemistry》 SCIE EI CAS CSCD 2023年第11期318-342,I0007,共26页
This paper brings the comparison of performances of CO_(2)conversion by plasma and plasma-assisted catalysis based on the data collected from literature in this field,organised in an open access online database.This t... This paper brings the comparison of performances of CO_(2)conversion by plasma and plasma-assisted catalysis based on the data collected from literature in this field,organised in an open access online database.This tool is open to all users to carry out their own analyses,but also to contributors who wish to add their data to the database in order to improve the relevance of the comparisons made,and ultimately to improve the efficiency of CO_(2)conversion by plasma-catalysis.The creation of this database and database user interface is motivated by the fact that plasma-catalysis is a fast-growing field for all CO_(2)conversion processes,be it methanation,dry reforming of methane,methanolisation,or others.As a result of this rapid increase,there is a need for a set of standard procedures to rigorously compare performances of different systems.However,this is currently not possible because the fundamental mechanisms of plasma-catalysis are still too poorly understood to define these standard procedures.Fortunately however,the accumulated data within the CO_(2)plasma-catalysis community has become large enough to warrant so-called“big data”studies more familiar in the fields of medicine and the social sciences.To enable comparisons between multiple data sets and make future research more effective,this work proposes the first database on CO_(2)conversion performances by plasma-catalysis open to the whole community.This database has been initiated in the framework of a H_(2)0_(2)0 European project and is called the“PIONEER Data Base”.The database gathers a large amount of CO_(2)conversion performance data such as conversion rate,energy efficiency,and selectivity for numerous plasma sources coupled with or without a catalyst.Each data set is associated with metadata describing the gas mixture,the plasma source,the nature of the catalyst,and the form of coupling with the plasma.Beyond the database itself,a data extraction tool with direct visualisation features or advanced filtering functionalities has been developed and is available online to the public.The simple and fast visualisation of the state of the art puts new results into context,identifies literal gaps in data,and consequently points towards promising research routes.More advanced data extraction illustrates the impact that the database can have in the understanding of plasma-catalyst coupling.Lessons learned from the review of a large amount of literature during the setup of the database lead to best practice advice to increase comparability between future CO_(2)plasma-catalytic studies.Finally,the community is strongly encouraged to contribute to the database not only to increase the visibility of their data but also the relevance of the comparisons allowed by this tool. 展开更多
关键词 Open-access database on plasma-catalysis experiment CO_(2) conversion PLASMA-CATALYSIS Carbon capture and utilisation(CCU) Energy efficiency Specific energy input Dielectric barrier discharge Packed bed reactor METHANATION Dry reforming of methane
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Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation
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作者 Yifeng Shao Sven Weerdenburg +3 位作者 Jacob Seifert H.Paul Urbach Allard P.Mosk Wim Coene 《Light(Science & Applications)》 SCIE EI 2024年第10期2156-2167,共12页
Ptychographic extreme ultraviolet(EUV)diffractive imaging has emerged as a promising candidate for the next generationmetrology solutions in the semiconductor industry,as it can image wafer samples in reflection geome... Ptychographic extreme ultraviolet(EUV)diffractive imaging has emerged as a promising candidate for the next generationmetrology solutions in the semiconductor industry,as it can image wafer samples in reflection geometry at the nanoscale.This technique has surged attention recently,owing to the significant progress in high-harmonic generation(HHG)EUV sources and advancements in both hardware and software for computation.In this study,a novel algorithm is introduced and tested,which enables wavelength-multiplexed reconstruction that enhances the measurement throughput and introduces data diversity,allowing the accurate characterisation of sample structures.To tackle the inherent instabilities of the HHG source,a modal approach was adopted,which represents the crossdensity function of the illumination by a series of mutually incoherent and independent spatial modes.The proposed algorithm was implemented on a mainstream machine learning platform,which leverages automatic differentiation to manage the drastic growth in model complexity and expedites the computation using GPU acceleration.By optimising over 2oo million parameters,we demonstrate the algorithm's capacity to accommodate experimental uncertainties and achieve a resolution approaching the diffraction limit in reflection geometry.The reconstruction of wafer samples with 20-nm high patterned gold structures on a silicon substrate highlights our ability to handle complex physical interrelations involving a multitude of parameters.These results establish ptychography as an efficient and accurate metrology tool. 展开更多
关键词 metrology mode approaching
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Investigation on the influence of vortex generator on particle resuspension
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作者 Dongchi Yu Jun-Li Lin Jin-Han Xie 《Particuology》 SCIE EI CAS CSCD 2024年第3期126-136,共11页
The vortex generator(VG)and its well-known effect in flow optimization are widely studied and employed across different engineering sectors.However,while the same working principles of VG may be well suited for the ap... The vortex generator(VG)and its well-known effect in flow optimization are widely studied and employed across different engineering sectors.However,while the same working principles of VG may be well suited for the applications on surface-cleaning technologies,such promising potential is hardly,if any,explored in the published literature.Therefore,in the present study,the influence on flow-induced particle resuspension brought by a rectangular vG in a channel flow is investigated with the help of highfidelity computational fluid dynamics simulations.Substantial increases of particle removal forces and resuspension rates are discovered in long,strip-like regions with reduced boundary-layer thickness resulted from the vG-induced vortices,and the enhancement effect is especially significant for configurations with the VG installed at a greater angle of attack.It is also shown that while the resuspension enhancements on the lower and the upper surfaces of the channel exhibit distinct statistical characteristics,having a VG in the channel improves the overall particle-removing capability of the channel flow by introducing higher surface-averaged removal forces and particle resuspension rates.Last but not least,the increase of resuspension rate is especially significant for the smaller,micron-scale particles which are otherwise hardly disturbed by a VG-less channel flow,and such resuspension-enhancement effectgenerally subsides with increasing particle size. 展开更多
关键词 Particle resuspension Vortexgenerator CFD Surface cleaning
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Spatial Aberrations in High-Order Harmonic Generation
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作者 Marius Plach Federico Vismarra +11 位作者 Elisa Appi Vénus Poulain Jasper Peschel Peter Smorenburg David PO’Dwyer Stephen Edward Yin Tao Rocío Borrego-Varillas Mauro Nisoli Cord LArnold Anne L’Huillier Per Eng-Johnsson 《Ultrafast Science》 2024年第1期35-43,共9页
We investigate the spatial characteristics of high-order harmonic radiation generated in argon and observe cross-like patterns in the far field.An analytical model describing harmonics from an astigmatic driving beam ... We investigate the spatial characteristics of high-order harmonic radiation generated in argon and observe cross-like patterns in the far field.An analytical model describing harmonics from an astigmatic driving beam reveals that these patterns result from the order and generation position-dependent divergence of harmonics.Even small amounts of driving field astigmatism may result in cross-like patterns,coming from the superposition of individual harmonics with spatial profiles elongated in different directions.By correcting the aberrations using a deformable mirror,we show that fine-tuning the driving wavefront is essential for optimal spatial quality of the harmonics. 展开更多
关键词 field. HARMONICS DIRECTIONS
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Research Article Focusing Properties of High-Order Harmonics 被引量:3
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作者 Maria Hoflund Jasper Peschel +10 位作者 Marius Plach Hugo Dacasa Kévin Veyrinas Eric Constant Peter Smorenburg Hampus Wikmark Sylvain Maclot Chen Guo Cord Arnold Anne L'Huillier Per Eng-Johnsson 《Ultrafast Science》 2021年第1期31-38,共8页
Many applications of the extreme ultraviolet(XUV)radiation obtained by high-order harmonic generation(HHG)in gases require a small focus area in order to enable attosecond pulses to reach a high intensity.Here,high-or... Many applications of the extreme ultraviolet(XUV)radiation obtained by high-order harmonic generation(HHG)in gases require a small focus area in order to enable attosecond pulses to reach a high intensity.Here,high-order harmonics generated in Ar with a multiterawatt laser system in a loose focusing geometry are focused to a few micrometers using two toroidal mirrors in a Wolter configuration with a high demagnification factor.Using a knife-edge measurement technique,we determine the position and size of the XUV foci as a function of harmonic order.We show that the focus properties vary with harmonic order and the generation conditions.Simulations,based on a classical description of the harmonic dipole phase and assuming that the individual harmonics can be described as Gaussian beams,reproduce the experimental behavior.We discuss how the generation geometry affects the intensity and duration of the focused attosecond pulses. 展开更多
关键词 HARMONIC HARMONICS GEOMETRY
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Application of resist-profile-aware source optimization in 28 nm full chip optical proximity correction 被引量:1
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作者 Jun Zhu David Wei Zhang +6 位作者 Chinte Kuo Qing Wang Fang Wei Chenming Zhang Han Chen Daquan He Stephen D.Hsu 《Journal of Semiconductors》 EI CAS CSCD 2017年第7期83-88,共6页
As technology node shrinks, aggressive design rules for contact and other back end of line(BEOL)layers continue to drive the need for more effective full chip patterning optimization. Resist top loss is one of the m... As technology node shrinks, aggressive design rules for contact and other back end of line(BEOL)layers continue to drive the need for more effective full chip patterning optimization. Resist top loss is one of the major challenges for 28 nm and below technology nodes, which can lead to post-etch hotspots that are difficult to predict and eventually degrade the process window significantly. To tackle this problem, we used an advanced programmable illuminator(FlexRay) and Tachyon SMO(Source Mask Optimization) platform to make resistaware source optimization possible, and it is proved to greatly improve the imaging contrast, enhance focus and exposure latitude, and minimize resist top loss thus improving the yield. 展开更多
关键词 integrated circuits OPC source optimization lithography resist top loss
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Bubble Dynamics and Heat Transfer on Biphilic Surfaces:Experiments and Numerical Simulation 被引量:1
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作者 Pedro Pontes Ricardo Cautela +3 位作者 Emanuele Teodori Ana Sofia Moita Anastasios Georgoulas António Luís Nobre Moreira Moreira 《Journal of Bionic Engineering》 SCIE EI CSCD 2020年第4期809-821,共13页
Wettability is known to play a major role in enhancing pool boiling heat transfer.In this context bioinspired surfaces can bring significant advantages in pool boiling applications.This work addresses a numerical inve... Wettability is known to play a major role in enhancing pool boiling heat transfer.In this context bioinspired surfaces can bring significant advantages in pool boiling applications.This work addresses a numerical investigation of bubble growth and detachment on a biphilic surface pattern,namely in a superhydrophobic region surrounded by a hydrophilic region.Surface characteristics resemble bioinspired solutions explored in our research group,mainly considering the main topographical characteristics.This numerical approach is intended to provide additional information to an experimental approach,allowing to obtain temperature,pressure and velocity fields in and around the bubble,which help to describe bubble dynamics.The model was validated based on experimental data obtained with extensive image processing of synchronized high-speed video and high-speed thermographic images.The results obtained here clearly evidence that combining enhanced direct numerical simulations with high-resolution transient experimental measurements is a promising tool to describe the complex and intricate hydrodynamic and heat transfer phenomena governing pool boiling on heated biphilic surfaces. 展开更多
关键词 BIOINSPIRED biphilic surfaces bubble dynamics two-phase heat transfer time resolved infrared thermography CFD model
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