The Al/a-C nanocomposite thin films are synthesized on Si substrates using a dense plasma focus device with alu- minum fitted anode and operating with CH4/Ar admixture. X-ray diffractometer results confirm the formati...The Al/a-C nanocomposite thin films are synthesized on Si substrates using a dense plasma focus device with alu- minum fitted anode and operating with CH4/Ar admixture. X-ray diffractometer results confirm the formation of metallic crystalline Al phases using different numbers of focus shots. Raman analyses show the formation of D and G peaks for all thin film samples, confirming the presence of a-C in the nanocomposite thin films. The formation of Al/a-C nanocomposite thin films is further confirmed using X-ray photoelectron spectroscopy analysis. The scanning electron microscope results show that the deposited thin films consist of nanoparticles and their agglomerates. The sizes of th agglomerates increase with increasing numbers of focus deposition shots. The nanoindentation results show the variations in hardness and elastic modulus values of nanocomposite thin film with increasing the number of focus shots. Maximum values of hardness and elastic modulus of the composite thin film prepared using 20 focus shots are found to be about 10.7 GPa and 189.2 GPa, respectively.展开更多
A 2.3 kJ Mather type pulsed plasma focus device was used for the synthesis of a TiN/a-Si3N4 thin film at room temperature. The film was characterized using X-ray diffraction （XRD）, X-ray photoelectron spectroscopy ...A 2.3 kJ Mather type pulsed plasma focus device was used for the synthesis of a TiN/a-Si3N4 thin film at room temperature. The film was characterized using X-ray diffraction （XRD）, X-ray photoelectron spectroscopy （XPS）, scanning electron microscopy （SEM）, and atomic force microscopy （AFM）. The XRD pattern confirms the growth of polycrystalline TiN thin film. The XPS results indicate that the synthesized film is non-stoichiometric and contains titanium nitride, silicon nitride, and a phase of silicon oxy-nitride. The SEM and AFM results reveal that the surface of the synthesized film is quite smooth with 0.59 nm roughness （root-mean-square）.展开更多
Effects of deposition angle and axial distance on the structural and mechanical properties of niobium nitride syn- thesized by a dense plasma focus （DPF） system are studied. The x-ray diffraction （XRD） confirms th...Effects of deposition angle and axial distance on the structural and mechanical properties of niobium nitride syn- thesized by a dense plasma focus （DPF） system are studied. The x-ray diffraction （XRD） confirms that the deposition parameters affect the growth of multi-phase niobium nitride. Scanning electron microscopy （SEM） shows the granular surface morphology with strong thermally assisted coagulation effects observed at the 5-cm axial distance. The non-porous granular morphology observed at the 9-cm distance along the anode axis is different from those observed at deposition angles of 10° and 20°. Energy dispersive x-ray （EDX） spectroscopy reveals the maximum nitrogen content at the shortest （5 cm） axial position. Atomic force microscopy （AFM） exhibits that the roughness of coated films varies for coatings synthesized at different axial and angular positions, and the Vickers micro-hardness test shows that a maximum hardness value is （08.44 ±0.01） GPa for niobium nitride synthesized at 5-cm axial distance, which is about 500% more than that of a virgin sample.展开更多
文摘The Al/a-C nanocomposite thin films are synthesized on Si substrates using a dense plasma focus device with alu- minum fitted anode and operating with CH4/Ar admixture. X-ray diffractometer results confirm the formation of metallic crystalline Al phases using different numbers of focus shots. Raman analyses show the formation of D and G peaks for all thin film samples, confirming the presence of a-C in the nanocomposite thin films. The formation of Al/a-C nanocomposite thin films is further confirmed using X-ray photoelectron spectroscopy analysis. The scanning electron microscope results show that the deposited thin films consist of nanoparticles and their agglomerates. The sizes of th agglomerates increase with increasing numbers of focus deposition shots. The nanoindentation results show the variations in hardness and elastic modulus values of nanocomposite thin film with increasing the number of focus shots. Maximum values of hardness and elastic modulus of the composite thin film prepared using 20 focus shots are found to be about 10.7 GPa and 189.2 GPa, respectively.
文摘A 2.3 kJ Mather type pulsed plasma focus device was used for the synthesis of a TiN/a-Si3N4 thin film at room temperature. The film was characterized using X-ray diffraction （XRD）, X-ray photoelectron spectroscopy （XPS）, scanning electron microscopy （SEM）, and atomic force microscopy （AFM）. The XRD pattern confirms the growth of polycrystalline TiN thin film. The XPS results indicate that the synthesized film is non-stoichiometric and contains titanium nitride, silicon nitride, and a phase of silicon oxy-nitride. The SEM and AFM results reveal that the surface of the synthesized film is quite smooth with 0.59 nm roughness （root-mean-square）.
文摘Effects of deposition angle and axial distance on the structural and mechanical properties of niobium nitride syn- thesized by a dense plasma focus （DPF） system are studied. The x-ray diffraction （XRD） confirms that the deposition parameters affect the growth of multi-phase niobium nitride. Scanning electron microscopy （SEM） shows the granular surface morphology with strong thermally assisted coagulation effects observed at the 5-cm axial distance. The non-porous granular morphology observed at the 9-cm distance along the anode axis is different from those observed at deposition angles of 10° and 20°. Energy dispersive x-ray （EDX） spectroscopy reveals the maximum nitrogen content at the shortest （5 cm） axial position. Atomic force microscopy （AFM） exhibits that the roughness of coated films varies for coatings synthesized at different axial and angular positions, and the Vickers micro-hardness test shows that a maximum hardness value is （08.44 ±0.01） GPa for niobium nitride synthesized at 5-cm axial distance, which is about 500% more than that of a virgin sample.
