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Semi-polar GaN LEDs on Si substrate 被引量:2
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作者 Nobuhiko SAWAKI Yoshio HONDA 《Science China(Technological Sciences)》 SCIE EI CAS 2011年第1期38-41,共4页
Growth of semi-polar (1-101)GaN has been attempted on a patterned (001) silicon substrate adopting selective area MOVPE. The growth was initiated on (111) facets of the Si, which had been prepared by anisotropy ... Growth of semi-polar (1-101)GaN has been attempted on a patterned (001) silicon substrate adopting selective area MOVPE. The growth was initiated on (111) facets of the Si, which had been prepared by anisotropy etching in a KOH solution. A uni- form semi-polar layer was achieved by coalescence of stripes. Since the growth was performed on facets, the surface was atomically fiat in AFM surface analyses. By using a high temperature grown A1N nucleation layer, we achieved low threading dislocation density at the top most surface. Moreover, by tilting the c-axis of the GaN on the Si substrate, the effect of the thermal expansion coefficient mismatch was much reduced. As the result, we achieved a crack free (1-101)GaN template on (001)Si. On the thus prepared (1-101)GaN, a GalnN/GaN LED was fabricated, which showed excellent performance with weak quantum confined Stark effect. 展开更多
关键词 GAN selective epitaxy semi-polar GaN MOVPE LED
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