EV Group2008形势如何？您对2009市场有何期望？
2008年对于EVG公司来说是又一个增长年，业绩成长了15．20％，尤其扩大了在纳米压印光刻、3D／TSV封装领域的市场占有率。尽管2009年整体宏观经济和环境预计将更复杂和具有挑战性，特别...EV Group2008形势如何？您对2009市场有何期望？
2008年对于EVG公司来说是又一个增长年，业绩成长了15．20％，尤其扩大了在纳米压印光刻、3D／TSV封装领域的市场占有率。尽管2009年整体宏观经济和环境预计将更复杂和具有挑战性，特别影响在汽车制造与消费类产品市场中，但我们期待有更多新颖的技术，例如后部照明的（英国标准协会）图像传感器或者采用更高功能密度的移动电话，这都将带动EVG在三维集成电路封装设备（例如，光刻以及永久和临时晶圆键合）的市场占有率将会继续成长。展开更多
1 IntroductionAs the nanoscale era progresses, innovative new materials and processes continue to be developed and implemented as a means of keeping the industry
Nanoimprint Lithography has been demon-strated to be one of the most promising next genera-tion techniques for large-area structure replicationin the nanometer scale. This fast and low costmethod becomes an increasing...Nanoimprint Lithography has been demon-strated to be one of the most promising next genera-tion techniques for large-area structure replicationin the nanometer scale. This fast and low costmethod becomes an increasingly important instru-ment for fabrication of biochemistry,m-fluidic, m-TAS and telecommunication devices, as well as for awide variety of fields in the nm range, like biomedical,nano-fluidics,nano-optical applications, datastorage, etc.Due to the restrictions on wavelength and theenormous development works, linked to high pro-cess and equipment costs on standard lithographysystems, nanoimprint lithography might become areal competitive method in mainstream IC industry.There are no physical limitations encountered withimprinting techniques for much smaller replicatedstructures, down to the sub-10nm range [1]. Amongseveral Nanoimprint lithography techniques resultsof two promising methods, hot embossing lithogra-phy (HEL) and UV-nanoimprinting (UV-NIL) will bepresented. Both techniques allow rapid prototypingas well as high volume production of fully patternedsubstrates for a wide range of materials.This paper will present results on HE and UV-NIL, among them full wafer imprints up to 200mmwith high-resolution patterns down to nm range.展开更多
文摘1 IntroductionAs the nanoscale era progresses, innovative new materials and processes continue to be developed and implemented as a means of keeping the industry
文摘Nanoimprint Lithography has been demon-strated to be one of the most promising next genera-tion techniques for large-area structure replicationin the nanometer scale. This fast and low costmethod becomes an increasingly important instru-ment for fabrication of biochemistry,m-fluidic, m-TAS and telecommunication devices, as well as for awide variety of fields in the nm range, like biomedical,nano-fluidics,nano-optical applications, datastorage, etc.Due to the restrictions on wavelength and theenormous development works, linked to high pro-cess and equipment costs on standard lithographysystems, nanoimprint lithography might become areal competitive method in mainstream IC industry.There are no physical limitations encountered withimprinting techniques for much smaller replicatedstructures, down to the sub-10nm range [1]. Amongseveral Nanoimprint lithography techniques resultsof two promising methods, hot embossing lithogra-phy (HEL) and UV-nanoimprinting (UV-NIL) will bepresented. Both techniques allow rapid prototypingas well as high volume production of fully patternedsubstrates for a wide range of materials.This paper will present results on HE and UV-NIL, among them full wafer imprints up to 200mmwith high-resolution patterns down to nm range.
