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Effect of LaNiO_3 Interlayer on the Dielectric Properties of Ba_(0.5)Sr_(0.5)TiO_3 Thin Film on Si Substrate
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作者 张丛春 杨春生 +1 位作者 石金川 饶瑞 《Journal of Shanghai Jiaotong university(Science)》 EI 2009年第2期133-136,共4页
In this study,(100)-oriented growth of Ba_(0.5)Sr_(0.5)TiO_3(BST)/LaNiO_3(LNO) stacks was obtained on Pt(111)/SiO_2/Si substrates by r.f.magnetron sputtering.The orientation of the subsequently deposited Ba_(0.5)Sr_(0... In this study,(100)-oriented growth of Ba_(0.5)Sr_(0.5)TiO_3(BST)/LaNiO_3(LNO) stacks was obtained on Pt(111)/SiO_2/Si substrates by r.f.magnetron sputtering.The orientation of the subsequently deposited Ba_(0.5)Sr_(0.5)TiO_3 thin film was strongly affected by the LNO under layer,and the BST thin film deposited on the(100)LNO-coated Si substrate was also found to have a significant(100)-oriented texture.Effects of LNO interlayer on the dielectric properties of BST thin films were investigated.As a result,the tunability of BST thin film was greatly improved with the insertion of(100)-oriented LNO under layer with proper thickness. 展开更多
关键词 Ba0.5Sr0.5TiO3薄膜 LANIO3 SI衬底 介电性能 BST薄膜 RF磁控溅射 SIO2 薄膜沉积
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