TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system.The crystalline structures,morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-r...TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system.The crystalline structures,morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction（XRD）,atomic force microscopy（AFM） and ultraviolet spectrophotometer,respectively.The results indicated that working pressure was the key deposition parameter in？uencing the TiO2 film phase composition at room temperature,which directly affected its photocatalytic activity.With increasing working pressure,the target self-bias decreases monotonously.Therefore,low temperature TiO2 phase（anatase） could be deposited with high working pressure.The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution,which the degradation rate reached the maximum（35%） after irradiation by ultraviolet light for 1 h.展开更多
This paper reports that amorphous silicon nitride （a-SiNx） overcoats were deposited at room temperature by microwave ECR plasma enhanced unbalanced magnetron sputtering. The 2 nm a-SiNs overcoat has better anti-corr...This paper reports that amorphous silicon nitride （a-SiNx） overcoats were deposited at room temperature by microwave ECR plasma enhanced unbalanced magnetron sputtering. The 2 nm a-SiNs overcoat has better anti-corrosion properties than that of reference a-CNx overcoats （2 4.5 nm）. The superior anti-corrosion performance is attributed to its stoichiometric bond structure, where 94.8% Si atoms form Si-N asymmetric stretching vibration bonds. The N/Si ratio is 1.33 as in the stoichiometry of Si3N4 and corresponds to the highest hardness of 25.0 GPa. The surface is atomically smooth with RMS 〈 0.2 nm. The ultra-thin a-SiNx overcoats are promising for hard disks and read/write heads protective coatings.展开更多
基金supported by the Dalian Foundation for Development of Science and Technology (No.2006A13GX029)
文摘TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system.The crystalline structures,morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction（XRD）,atomic force microscopy（AFM） and ultraviolet spectrophotometer,respectively.The results indicated that working pressure was the key deposition parameter in？uencing the TiO2 film phase composition at room temperature,which directly affected its photocatalytic activity.With increasing working pressure,the target self-bias decreases monotonously.Therefore,low temperature TiO2 phase（anatase） could be deposited with high working pressure.The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution,which the degradation rate reached the maximum（35%） after irradiation by ultraviolet light for 1 h.
基金Project supported by the Major Program of the National Natural Science Foundation of China (Grant No 50390060)the National Natural Science Foundation of China (Grant Nos 60576022 and 50572012)
文摘This paper reports that amorphous silicon nitride （a-SiNx） overcoats were deposited at room temperature by microwave ECR plasma enhanced unbalanced magnetron sputtering. The 2 nm a-SiNs overcoat has better anti-corrosion properties than that of reference a-CNx overcoats （2 4.5 nm）. The superior anti-corrosion performance is attributed to its stoichiometric bond structure, where 94.8% Si atoms form Si-N asymmetric stretching vibration bonds. The N/Si ratio is 1.33 as in the stoichiometry of Si3N4 and corresponds to the highest hardness of 25.0 GPa. The surface is atomically smooth with RMS 〈 0.2 nm. The ultra-thin a-SiNx overcoats are promising for hard disks and read/write heads protective coatings.
