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In-Situ Nitrogen Doping of the TiO2 Photocatalyst Deposited by PEALD for Visible Light Activity 被引量:1
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作者 饶志鹏 万军 +4 位作者 李超波 陈波 刘键 黄成强 夏洋 《Plasma Science and Technology》 SCIE EI CAS CSCD 2014年第3期239-243,共5页
In this paper, an N-doped titanium oxide (TiO2) photocatalyst is deposited by a plasma-enhanced atomic layer deposition (PEALD) system through the in-situ doping method. X-ray photoelectron spectroscopy (XPS) an... In this paper, an N-doped titanium oxide (TiO2) photocatalyst is deposited by a plasma-enhanced atomic layer deposition (PEALD) system through the in-situ doping method. X-ray photoelectron spectroscopy (XPS) analysis indicates that substitutional nitrogen atoms (-395.9 eV) with 1 atom% are effectively doped into TiO2 films. UV-VIS spectrometry shows that the in-situ nitrogen doping method indeed enhances the visible-activity of TiO2 films in the 425-550 nm range, and the results of the performance tests of the N-doped TiO2 films also imply that the photocatalysis activity is improved by in-situ doping. The in-situ doping mechanism of the N-doped TiO2 film is suggested according to the XPS results and the typical atomic layer deposition process. 展开更多
关键词 plasma-enhanced atomic layer deposition IN-SITU nitrogen plasma N-dopedTiO2 PHOTOCATALYST
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Dehydroxylation action on surface of TiO_2 films restrained by nitrogen carrier gas during atomic layer deposition process
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作者 Zhi-Peng Rao Bang-Wu Liu +2 位作者 Chao-Bo Li Yang Xia Jun Wan 《Rare Metals》 SCIE EI CAS CSCD 2014年第5期583-586,共4页
A strong influence of nitrogen gas on the content of surface hydroxyl groups of TiO2 films by atomic layer deposition(ALD) was investigated by X-ray photoelectron spectroscopy(XPS), contact angle measuring system,... A strong influence of nitrogen gas on the content of surface hydroxyl groups of TiO2 films by atomic layer deposition(ALD) was investigated by X-ray photoelectron spectroscopy(XPS), contact angle measuring system, and UV–Vis spectrophotometer. XPS spectra of O 1s indicate that the content of surface hydroxyl groups is varied when using N2 as carrier gas. The results of water contact angles and optical reflection spectra show that the content variation of surface hydroxyl groups influences the wetting properties and optical reflectivity of TiO2 films. A surface reaction model is suggested to explain the ALD reaction process using N2 as carrier gas. 展开更多
关键词 Atomic layer deposition TIO2 N2 Surface hydroxyl groups XPS Reaction model
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