期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
Atomically Smooth Ultrathin Films of Topological Insulator Sb_(2)Te_(3) 被引量:6
1
作者 Guang Wang Xiegang Zhu +9 位作者 Jing Wen Xi Chen Ke He Lili Wang Xucun Ma Ying Liu Xi Dai Zhong Fang Jinfeng Jia Qikun Xue 《Nano Research》 SCIE EI CSCD 2010年第12期874-880,共7页
The growth and characterization of single-crystalline thin films of topological insulators(TIs)is an important step towards their possible applications.Using in situ scanning tunneling microscopy(STM)and angle-resolve... The growth and characterization of single-crystalline thin films of topological insulators(TIs)is an important step towards their possible applications.Using in situ scanning tunneling microscopy(STM)and angle-resolved photoemission spectroscopy(ARPES),we show that moderately thick Sb_(2)Te_(3)films grown layer-by-layer by molecular beam epitaxy(MBE)on Si(111)are atomically smooth,single-crystalline,and intrinsically insulating.Furthermore,these films were found to exhibit a robust TI electronic structure with their Fermi energy lying within the energy gap of the bulk that intersects only the Dirac cone of the surface states.Depositing Cs in situ moves the Fermi energy of the Sb_(2)Te_(3)films without changing the electronic band structure,as predicted by theory.We found that the TI behavior is preserved in Sb_(2)Te_(3)films down to five quintuple layers(QLs). 展开更多
关键词 Topological insulator electronic structure scanning tunneling microscopy angle-resolved photoemission spectroscopy molecular beam epitaxy
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部