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High electron mobility of modulation doped GaAs after growing InP by solid source molecular beam epitaxy
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作者 舒永春 皮彪 +4 位作者 林耀望 邢小东 姚江宏 王占国 许京军 《中国有色金属学会会刊:英文版》 EI CSCD 2005年第2期332-335,共4页
Modulation-doped AlGaAs/GaAs structures were grown on GaAs(100) substrate by solid source molecular beam epitaxy(SSMBE) system. The factors which influence the electron mobility were investigated. After growing InP ba... Modulation-doped AlGaAs/GaAs structures were grown on GaAs(100) substrate by solid source molecular beam epitaxy(SSMBE) system. The factors which influence the electron mobility were investigated. After growing InP based materials, growth conditions were deteriorated, but by an appropriate method and using reasonable process high electron mobility(77 K) of more than 1.50×10~5 cm^2/(V·s) can still be obtained. The structures and growth conditions have been studied and optimized via Hall measurements. For a typical sample, 2.0 K electron mobility as high as 1.78×10~6 cm^2/(V·s) is achieved, and the quantum Hall oscillation phenomena can be observed. 展开更多
关键词 电子迁移率 砷化镓 磷化铟掺杂 晶体生长 固态源分子束
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