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The effect of deposition temperature on the intermixing and microstructure of Fe/Ni thin film 被引量:1
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作者 陈尚达 王涛 +1 位作者 郑德立 周益春 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第12期400-404,共5页
The physical vapour deposition of Ni atoms on α-Fe(001) surface under different deposition temperatures were simulated by molecular dynamics to study the intermixing and microstructure of the interracial region. Th... The physical vapour deposition of Ni atoms on α-Fe(001) surface under different deposition temperatures were simulated by molecular dynamics to study the intermixing and microstructure of the interracial region. The results indicate that Ni atoms hardly penetrate into Fe substrate while Fe atoms easily diffuse into Ni deposition layers. The thickness of the intermixing region is temperature-dependent, with high temperatures yielding larger thicknesses. The deposited layers are mainly composed of amorphous phase due to the abnormal deposition behaviour of Ni and Fe. In the deposited Ni-rich phase, the relatively stable metallic compound B2 structured FeNi is found under high deposition temperature conditions. 展开更多
关键词 molecular dynamics physical vapour deposition Ni/Fe thin film temperature effect
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