I.INTRODUCTION Electron beam lithography (EBL)is one of the most important methods to fabricate a submicron VLSI device. The ultimate resolution of EBL is limited by electron scattering in resist film and substrate (F...I.INTRODUCTION Electron beam lithography (EBL)is one of the most important methods to fabricate a submicron VLSI device. The ultimate resolution of EBL is limited by electron scattering in resist film and substrate (Fig. 1). E-beam irradiation展开更多
文摘I.INTRODUCTION Electron beam lithography (EBL)is one of the most important methods to fabricate a submicron VLSI device. The ultimate resolution of EBL is limited by electron scattering in resist film and substrate (Fig. 1). E-beam irradiation
