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Additive Fine-Line Circuit Process through Catalyst Induced Copper Electroless Plating
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作者 Yi-Wei Lin Yu-Ming Wang +7 位作者 Wan-Ying Lin Lei-Yi Chen Ying-Fang Chang Hung-Yi Lin Jen-Yuan Chang Da-Jeng Yao Ta-Hsin Chou Chien-Hung Lien 《Journal of Mechanics Engineering and Automation》 2020年第1期11-15,共5页
To response the demand for fine line in electronic products,additive manufacturing process integrated printing techniques and deposited methods to reach fine line circuit,with the merits of reduced material wastage,lo... To response the demand for fine line in electronic products,additive manufacturing process integrated printing techniques and deposited methods to reach fine line circuit,with the merits of reduced material wastage,low fabrication costs,and mass production advantage capability.Recently,we have developed additive process in fabricating circuit on flexible substrate through catalyst induced copper electroless deposition(ELD)method.The additive processes that integrated printing,activation,and metallization were applied to produce fine-line circuit with 5μm line width.The sample with ultraviolet(UV)activation shows better conductive property in comparison with the sample without activation after electroless deposited process.Accordingly,the results indicated that the reaction of catalyst induced electroless copper plating strongly depends on UV activation.The fine-line circuit exhibits a narrow line width circuit(around 5μm),lower resistance(6.2μΩ·cm),and mass production with low pollution in comparison with lithographic processes(with photoresist and acid pollution)with a high throughput system(R2R system)for the applications of double side flexible printed circuit board(FPCB). 展开更多
关键词 ADDITIVE PROCESS fine-line CIRCUIT GRAVURE offset printing electroless plating CATALYST
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