Periodic noble metal nanoparticles offer a wide spectrum of applications including chemical and biological sensors,optical devices,and model catalysts due to their extraordinary properties.For sensing purposes and cat...Periodic noble metal nanoparticles offer a wide spectrum of applications including chemical and biological sensors,optical devices,and model catalysts due to their extraordinary properties.For sensing purposes and catalytic studies,substrates made of glass or fused-silica are normally required as supports,without the use of metallic adhesion layers.However,precise patterning of such uniform arrays of silica-supported noble metal nanoparticles,especially at sub-100 nm in diameter,is challenging without adhesion layers.In this paper,we report a robust method to large-scale fabricate highly ordered sub-20 nm noble metal nanoparticles,i.e.,gold and platinum,supported on silica substrates without adhesion layers,combining displacement Talbot lithography(DTL)with dry-etching techniques.Periodic photoresist nanocolumns at diameters of~110 nm are patterned on metal-coated oxidized silicon wafers using DTL,and subsequently transferred at a 1:1 ratio into anti-reflection layer coating(BARC)nanocolumns with the formation of nano-sharp tips,using nitrogen plasma etching.These BARC nanocolumns are then used as a mask for etching the deposited metal layer using inclined argon ion-beam etching.We find that increasing the etching time results in coneshaped silica features with metal nanoparticles on the tips at diameters ranging from 100 nm to sub-30 nm,over large areas of 3×3 cm^(2).Moreover,subsequent annealing these sub-30 nm metal nanoparticle arrays at high-temperature results in sub-20 nm metal nanoparticle arrays with~10^(10) uniform particles.展开更多
基金This work was supported by the Netherlands Center for Multiscale Catalytic Energy Conversion(MCEC)。
文摘Periodic noble metal nanoparticles offer a wide spectrum of applications including chemical and biological sensors,optical devices,and model catalysts due to their extraordinary properties.For sensing purposes and catalytic studies,substrates made of glass or fused-silica are normally required as supports,without the use of metallic adhesion layers.However,precise patterning of such uniform arrays of silica-supported noble metal nanoparticles,especially at sub-100 nm in diameter,is challenging without adhesion layers.In this paper,we report a robust method to large-scale fabricate highly ordered sub-20 nm noble metal nanoparticles,i.e.,gold and platinum,supported on silica substrates without adhesion layers,combining displacement Talbot lithography(DTL)with dry-etching techniques.Periodic photoresist nanocolumns at diameters of~110 nm are patterned on metal-coated oxidized silicon wafers using DTL,and subsequently transferred at a 1:1 ratio into anti-reflection layer coating(BARC)nanocolumns with the formation of nano-sharp tips,using nitrogen plasma etching.These BARC nanocolumns are then used as a mask for etching the deposited metal layer using inclined argon ion-beam etching.We find that increasing the etching time results in coneshaped silica features with metal nanoparticles on the tips at diameters ranging from 100 nm to sub-30 nm,over large areas of 3×3 cm^(2).Moreover,subsequent annealing these sub-30 nm metal nanoparticle arrays at high-temperature results in sub-20 nm metal nanoparticle arrays with~10^(10) uniform particles.
