To improve the energy resolution（？E） of Nb/Al superconducting tunnel junctions（STJs）, an ozone（O3） oxidation process has been developed to fabricate a thin defect-free tunnel barrier that simultaneously shows h...To improve the energy resolution（？E） of Nb/Al superconducting tunnel junctions（STJs）, an ozone（O3） oxidation process has been developed to fabricate a thin defect-free tunnel barrier that simultaneously shows high critical current JC〉 1000 A/cm^2 and high normalized dynamic resistance RDA 〉 100 MΩ·μm^2, where A is the size of the STJ. The 50-μm^2 STJs produced by O3 exposure of 0.26 Pa·min with an indirect spray of O3 gas, which is a much lower level of exposure than the O2 exposure used in a conventional O2 oxidation process, exhibit a maximum JC= 800 A/cm^2 and a high RDA = 372 MΩ ·μm^2. The 100-pixel array of the 100-μm^2STJs produced using the same O3 oxidation conditions exhibits a constant leak current I leak= 14.9 ± 3.2 n A at a bias point around △ /e（where e is half the energy gap of an STJ）,and a high fabrication yield of 87%. Although the I leak values are slightly larger than those of STJs produced using the conventional O2 oxidation process, the STJ produced using O3 oxidation shows a ？E = 10 eV for the C-Kα line, which is the best value of our Nb/Al STJ x-ray detectors.展开更多
Ti-Cu films with different Cu concentrations were fabricated by high-power pulsed magnetron sputtering（HPPMS） to release copper ions and catalyze NO to improve the blood compatibility. The Cu concentrations of films...Ti-Cu films with different Cu concentrations were fabricated by high-power pulsed magnetron sputtering（HPPMS） to release copper ions and catalyze NO to improve the blood compatibility. The Cu concentrations of films were 25.7 at% and 68.8 at%. Pure Ti films were also fabricated. Copper release, catalytic release of nitric oxide（NO）, and blood platelet adhesion of Ti-Cu films were studied. Ti-Cu films released copper ions in PBS solution and more Cu ions were released from films with 68.8 at% Cu. Ti-Cu films had excellent ability of catalytical decomposition of exogenous donor S-nitroso-N-acetyl-DL-penicillamine（SNAP） and as a result, nitric oxide（NO） was generated. The NO generation catalyzed by Ti-Cu films was significantly higher than that by pure Ti films. This was more eminent in the Ti-Cu films with 68.8 at% Cu. The platelet adhesion and activation of Ti-Cu films were significantly inhibited compared to that of pure Ti films in the presence of SNAP. The Ti-Cu film fabricated by HPPMS showed the ability of releasing Cu ions to catalyze SNAP to generate NO to inhibit platelet adhesion and activation.展开更多
文摘To improve the energy resolution（？E） of Nb/Al superconducting tunnel junctions（STJs）, an ozone（O3） oxidation process has been developed to fabricate a thin defect-free tunnel barrier that simultaneously shows high critical current JC〉 1000 A/cm^2 and high normalized dynamic resistance RDA 〉 100 MΩ·μm^2, where A is the size of the STJ. The 50-μm^2 STJs produced by O3 exposure of 0.26 Pa·min with an indirect spray of O3 gas, which is a much lower level of exposure than the O2 exposure used in a conventional O2 oxidation process, exhibit a maximum JC= 800 A/cm^2 and a high RDA = 372 MΩ ·μm^2. The 100-pixel array of the 100-μm^2STJs produced using the same O3 oxidation conditions exhibits a constant leak current I leak= 14.9 ± 3.2 n A at a bias point around △ /e（where e is half the energy gap of an STJ）,and a high fabrication yield of 87%. Although the I leak values are slightly larger than those of STJs produced using the conventional O2 oxidation process, the STJ produced using O3 oxidation shows a ？E = 10 eV for the C-Kα line, which is the best value of our Nb/Al STJ x-ray detectors.
基金Funded by the National Natural Science Foundation of China(No.31300787)the National Natural Science Foundation of China China Academy of Engineering Physics(NSAF No.U1330113)+1 种基金the Overseas Famous Teacher Program of Chinese Education Ministry(MS2010XNJT070)the Qingmiao Plan of SWJTU 2015(No.A0920502051517-6)
文摘Ti-Cu films with different Cu concentrations were fabricated by high-power pulsed magnetron sputtering（HPPMS） to release copper ions and catalyze NO to improve the blood compatibility. The Cu concentrations of films were 25.7 at% and 68.8 at%. Pure Ti films were also fabricated. Copper release, catalytic release of nitric oxide（NO）, and blood platelet adhesion of Ti-Cu films were studied. Ti-Cu films released copper ions in PBS solution and more Cu ions were released from films with 68.8 at% Cu. Ti-Cu films had excellent ability of catalytical decomposition of exogenous donor S-nitroso-N-acetyl-DL-penicillamine（SNAP） and as a result, nitric oxide（NO） was generated. The NO generation catalyzed by Ti-Cu films was significantly higher than that by pure Ti films. This was more eminent in the Ti-Cu films with 68.8 at% Cu. The platelet adhesion and activation of Ti-Cu films were significantly inhibited compared to that of pure Ti films in the presence of SNAP. The Ti-Cu film fabricated by HPPMS showed the ability of releasing Cu ions to catalyze SNAP to generate NO to inhibit platelet adhesion and activation.
