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A unified charge-based model for SOI MOSFETs applicable from intrinsic to heavily doped channel
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作者 张健 何进 +8 位作者 周幸叶 张立宁 马玉涛 陈沁 张勖凯 杨张 王睿斐 韩雨 陈文新 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第4期478-485,共8页
A unified charge-based model for fully depleted silicon-on-insulator (SOI) metal oxide semiconductor field-effect transistors (MOSFETs) is presented. The proposed model is accurate and applicable from intrinsic to... A unified charge-based model for fully depleted silicon-on-insulator (SOI) metal oxide semiconductor field-effect transistors (MOSFETs) is presented. The proposed model is accurate and applicable from intrinsic to heavily doped channels with various structure parameters. The framework starts from the one-dimensional Poisson Boltzmann equa- tion, and based on the full depletion approximation, an accurate inversion charge density equation is obtained. With the inversion charge density solution, the unified drain current expression is derived, and a unified terminal charge and intrinsic capacitance model is also derived in the quasi-static case. The validity and accuracy of the presented analytic model is proved by numerical simulations. 展开更多
关键词 charge-based model silicon-on-insulator metal-oxide semiconductor field-effect transis- tors compact model double gate
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