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Magnetic Field Improvement in End Region of Rectangular Planar DC Magnetron Based on Particle Simulation 被引量:1
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作者 邱清泉 励庆孚 +2 位作者 苏静静 焦余 Jim FINLEY 《Plasma Science and Technology》 SCIE EI CAS CSCD 2008年第6期694-700,共7页
For a rectangular planar direct current (DC) magnetron, anomalous target erosion may occur in the curve-out region and inner side of the curved region. One key factor is that the magnetic field in the end region is ... For a rectangular planar direct current (DC) magnetron, anomalous target erosion may occur in the curve-out region and inner side of the curved region. One key factor is that the magnetic field in the end region is weaker than that in the straight region, and another important factor may be that there is a circumferential component of the magnetic field in the curved region. Through a calculation of three-dimensional magnetic field for the rectangular magnetron, a magnet structure shimmed by permanent magnet bars and ferromagnetic bars is proposed to solve the above problems. Through a three-dimensional non-self-consistent particle simulation and the Yamamura/Tawara formula, the target erosion profile could be predicted. The simulation results show that for an improved uniformity in magnetic field, the entire target utilization could be much enhanced. 展开更多
关键词 magnetron sputtering plasma magnetic field EROSION particle simulation
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