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基于便携式坐标测量机的大齿轮测量方法 被引量:10
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作者 林虎 Frank Hartig +1 位作者 Karin Kniel 石照耀 《光学精密工程》 EI CAS CSCD 北大核心 2013年第7期1763-1770,共8页
针对目前便携式坐标测量机测量大齿轮的采样策略和评定算法存在的不足,设计了两种特殊的辅助标尺-渐开线标尺及螺旋线标尺。利用设计的两种标尺在大齿轮齿面上对齿廓及螺旋线的测量点进行标注,开展了齿轮的在位重复性测量的实验研究。... 针对目前便携式坐标测量机测量大齿轮的采样策略和评定算法存在的不足,设计了两种特殊的辅助标尺-渐开线标尺及螺旋线标尺。利用设计的两种标尺在大齿轮齿面上对齿廓及螺旋线的测量点进行标注,开展了齿轮的在位重复性测量的实验研究。利用关节臂坐标测量机及激光跟踪仪测量系统在德国计量研究院研制的1m外径齿轮样板上开展了测量实验,采用INVOLUTE Pro对采样数据点进行评定,给出了测量结果及测量不确定度。测量实验表明,基于新的齿轮测量方法,关节臂坐标测量机比激光跟踪仪测量系统测量结果更为精确,测试结果与标定值最大相差8.16μm。实验结果验证了提出方法的有效性,为便携式坐标测量机在大齿轮测量领域的应用提供了依据。 展开更多
关键词 大齿轮测量 便携式坐标测量机 大齿轮样板
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计量软件溯源中的TraCIM软件认证系统 被引量:2
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作者 汤洁 Frank Hrtig 石照耀 《工具技术》 北大核心 2017年第12期118-121,共4页
工业计量领域、校准实验室和计量研究机构均需要一致的计算溯源框架以对计量软件进行溯源。计量软件溯源主要是对其算法进行溯源,并与其特定的计算目标相关联。德国国家计量院(PTB)推出了国际计量软件认证系统(TraCIM)实施计量软件溯源... 工业计量领域、校准实验室和计量研究机构均需要一致的计算溯源框架以对计量软件进行溯源。计量软件溯源主要是对其算法进行溯源,并与其特定的计算目标相关联。德国国家计量院(PTB)推出了国际计量软件认证系统(TraCIM)实施计量软件溯源,国际软件认证包括高斯(Gauss)软件认证、切比雪夫(Chebyshev)软件认证和比对(Comparison)软件认证。TraCIM计量软件认证通过在专用网络平台上实施"认证用户—服务器"间的应用来实现。认证流程主要包括索要标准输入数据、提交结果和获得认证报告。计量领域企业三丰(Mitutoyo)、蔡司(Zeiss)均实施并通过认证。 展开更多
关键词 软件认证 TraCIM 软件溯源 国际比对 标准数据
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X射线辐射测量(英文) 被引量:1
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作者 Michael Krumrey 《光学精密工程》 EI CAS CSCD 北大核心 2007年第12期1829-1837,共9页
在过去的几年里,人们使用同步辐射技术在X射线波段实现了基于辐射源和基于探测器的辐射测量,电子储存环被用作主辐射源标准,而低温辐射计(ESR)被用作主探测器标准。因为低温辐射计需要强的单色辐射,所以,这种方式也必须使用同步辐射。... 在过去的几年里,人们使用同步辐射技术在X射线波段实现了基于辐射源和基于探测器的辐射测量,电子储存环被用作主辐射源标准,而低温辐射计(ESR)被用作主探测器标准。因为低温辐射计需要强的单色辐射,所以,这种方式也必须使用同步辐射。文中对能量色散探测器和硅光电二极管的探测效率和响应度做了校准,其相对不确定度约1 %,所得结果与模型计算值做了比较。 展开更多
关键词 X射线辐射测量 同步辐射 辐射源 探测器
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不同流量条件下水表性能的研究与表征 被引量:1
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作者 Gudrun Wendt 张聪 吴湘 《上海计量测试》 2018年第A02期39-46,共8页
利用光学、非侵入式激光技术的优点,研究了在机械水表前端和内部的不同流量条件对水表计量性能的影响。重点用激光多普勒测速计(LDA)测量的三维速度分布与水表在理想、扰动流型及不同流量下的误差曲线进行了比较。文章给出了具体的技术... 利用光学、非侵入式激光技术的优点,研究了在机械水表前端和内部的不同流量条件对水表计量性能的影响。重点用激光多普勒测速计(LDA)测量的三维速度分布与水表在理想、扰动流型及不同流量下的误差曲线进行了比较。文章给出了具体的技术方案以及优化后的LDA数据处理和展示过程。除了通过各种2D和3D图定性描述流态外,还定义了无量纲参数以实现定量描述,目的在于建立一个可以预测水表示值变化的模型。 展开更多
关键词 机械水表 计量性能 流量 表征 激光技术 激光多普勒 无量纲参数 非侵入式
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Model based reference metrology for dimensional characterization of micro- and nanostructures
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作者 B. Bodermann H. Bosse 《Optoelectronics Letters》 EI 2008年第2期81-85,共5页
The requirements on the precision of dimensional metrology are especially stringent in the area of semiconductor manufacturing. This holds in particular for the measurement and control of the linewidths of the smalles... The requirements on the precision of dimensional metrology are especially stringent in the area of semiconductor manufacturing. This holds in particular for the measurement and control of the linewidths of the smallest structures on masks and silicon wafers and their corresponding reference metrology. In this paper we will describe the physical models and the reference instrumentation which were developed for photomask linewidth metrology at the PTB. It will be shown, how the results of the different methods can be used for comparative analyses. Application of these methods will be demonstrated exemplarily on the basis of newly developed photomask linewidth standards. 展开更多
关键词 微纳米技术 计量方法 集成光学 特征
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Uncertainty Calculation of Roundness Assessment by Automatic Differentiation in Coordinate Metrology
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作者 林家春 Michael Krystek 石照耀 《Journal of Measurement Science and Instrumentation》 CAS 2010年第3期224-227,共4页
Recently,Coordinate Measuring Machines(CMMs)are widely used to measure roundness errors.Roundness is calculated from a large number of points collected from the profiles of the parts.According to the Guide to the Expr... Recently,Coordinate Measuring Machines(CMMs)are widely used to measure roundness errors.Roundness is calculated from a large number of points collected from the profiles of the parts.According to the Guide to the Expression of Uncertainty in Measurement(GUM),all measurement results must have a stated uncertainty associated the them.However,no CMMs give the uncertainty value of the roundness,because no suitable measurement uncertainty calculation procedure exists.In the case of roundness measurement in coordinate metrology,this paper suggests the algorithms for the calculation of the measurement uncertainty of the roundness deviation based on the two mainly used association criteria,LSC and MZC.The calculation of the sensitivity coefficients for the uncertainty calculation can be done by automatic differentiation,in order to avoid introducing additional errors by the traditional difference quotient approximations.The proposed methods are exact and need input data only as the measured coordinates of the data points and their associated uncertainties. 展开更多
关键词 不确定度计算 坐标测量机 圆度评定 自动微分 计量学 不确定性 测量不确定度 灵敏度系数
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Cryocooler Operation of a Pulse-Driven AC Josephson Voltage Standard at PTB
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作者 Oliver F. O. Kieler Thomas Scheller Johannes Kohlmann 《World Journal of Condensed Matter Physics》 2013年第4期189-193,共5页
The PTB Josephson Arbitrary Waveform Synthesizer (JAWS) enables the generation of arbitrary waveforms up to voltages of 70 mVRMS (199 mVPP) using two Josephson arrays in series containing 4000 Josephson junctions each... The PTB Josephson Arbitrary Waveform Synthesizer (JAWS) enables the generation of arbitrary waveforms up to voltages of 70 mVRMS (199 mVPP) using two Josephson arrays in series containing 4000 Josephson junctions each. The SNS-like double-stacked junctions are based on NbxSi1-x as barrier material. While the JAWS system is typically operated using a Dewar with liquid helium, the operation in a closed-cycle pulse-tube cryocooler at temperatures around 4.2 K range was here investigated and successfully demonstrated. For this purpose a special designed cryoprobe was used to provide high quality pulses to the Josephson arrays. 展开更多
关键词 JOSEPHSON Voltage Standard JOSEPHSON Arbitrary Waveform SYNTHESIZER (JAWS) SNS JOSEPHSON Junction CRYOCOOLER Helium-Free SETUP
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Towards Quantitative Characterisation of the Small Force Transducer Used in Nanoindentation Instruments
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作者 Zhi Li Uwe Brand 《Modern Instrumentation》 2013年第4期61-67,共7页
Quantitative characterization of the mechanical properties of materials in micro-/nano-scale using depth-sensing indentation technique demands high performance of nanoindentation instruments in use. In this paper, the... Quantitative characterization of the mechanical properties of materials in micro-/nano-scale using depth-sensing indentation technique demands high performance of nanoindentation instruments in use. In this paper, the efforts to calibrate the capacitive force transducer of a commercial nanoindentation instrument are presented, where the quasi-static characteristic of the force transducer has been calibrated by a precise compensation balance with a resolution of ~1 nN. To investigate the dynamic response of the transducer, an electrostatic MEMS (Micro-Electro-Mechanical System) based on nano-force transfer standard with nano-Newton (10-9 Newton) resolution and a bandwidth up to 6 kHz have been employed. Preliminary experimental results indicate that 1) the force transducer under calibration has a probing force uncertainty less than 300 nN (1σ) in the calibration range of 1 mN;2) the transient duration at contact points amounts to 10 seconds;3) the overshoot of engagement is pre-load dependent. 展开更多
关键词 NANOMETROLOGY NANOINDENTATION Instrument Nano-Force TRANSDUCER Microelectromechanical Systems Nano-Force Calibration
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Microwave Design and Performance of PTB 10 V Circuits for the Programmable Josephson Voltage Standard
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作者 Franz Müller Thomas J. Scheller +4 位作者 Jinni Lee Ralf Behr Luis Palafox Marco Schubert Johannes Kohlmann 《World Journal of Condensed Matter Physics》 2014年第3期107-122,共16页
At Physikalisch-Technische Bundesanstalt (PTB), superconducting 10 V circuits for the programmable Josephson voltage standard (PJVS) are routinely manufactured on the basis of NbxSi1-x barrier junctions. This paper de... At Physikalisch-Technische Bundesanstalt (PTB), superconducting 10 V circuits for the programmable Josephson voltage standard (PJVS) are routinely manufactured on the basis of NbxSi1-x barrier junctions. This paper describes in detail the basic design principles for an operating frequency of 70 GHz. It starts with single junctions, discusses their insertion into microstriplines and closes with the whole microwave circuit containing 69,632 NbxSi1-x barrier junctions arranged over 128 microstriplines connected in parallel. The microwave attenuation of this junction type is a key parameter for the 10 V design and we report its experimental determination. Special attention has been devoted to subarrays with just a few Josephson junctions in one of the outermost striplines. The arrangement of these subarrays determines the optimum performance of the complete 10 V series array. The high performance of programmable 10 V circuits fabricated at PTB is characterized by measured operating margins in all subarrays of more than 1 mA centered at the same dc bias current. The observed modulation of the current margins, when changing the frequency around 70 GHz, is explained by microwave reflections caused by the rf waveguide inside the cryoprobe. We determine the current margins in dependence of the output power of a microwave synthesizer and show that 60 mW is sufficient to achieve current margins larger than 1 mA. 展开更多
关键词 JOSEPHSON VOLTAGE STANDARD PROGRAMMABLE JOSEPHSON VOLTAGE STANDARD (PJVS) SNS JOSEPHSON JUNCTION NbxSi1-x JOSEPHSON JUNCTION
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Stabilization of Silica Gel against Hydrolysis by Doping with F^(-) or Zr(Ⅳ)
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作者 Khaled S.Abou-El-Sherbini Peter G.Weidler +4 位作者 Detlef Schiel Mohey H.A.Amr Henning Niemann Shady El-Dafrawy Wolfgang H.Holl 《Green and Sustainable Chemistry》 2014年第1期24-32,共9页
Silica gel (SG) was synthesized via acidification of sodium silicate solution then doped with Fˉ or Zr(IV) in molar ratios of F/Si 3/100, and Zr/Si 0.75/100 and 3.75/100 and sintered at 500°C, 800°C and 100... Silica gel (SG) was synthesized via acidification of sodium silicate solution then doped with Fˉ or Zr(IV) in molar ratios of F/Si 3/100, and Zr/Si 0.75/100 and 3.75/100 and sintered at 500°C, 800°C and 1000°C. The samples were investigated by X-ray diffractometry, infrared absorption and Raman spectra, surface area measurement, and inductively coupled plasma-optical emission spectrometry-monitored silica hydrolysis. All samples are mesoporous with BET surface areas 181.5 - 523.9 m2·gˉ1. The surface area of the silica samples decreases as the sintering temperature increases. The hydrolysis process of silica decreases as the sintering temperature increases and as the surface area decreases. The pH and the type of buffer solution affect the hydrolysis of silica samples due to a SN2 reaction mechanism favored in basic media using ammonia buffer. Zr(IV) increases the stability of silica samples against the hydrolysis as confirmed by the structural investigation, surface area and silica hydrolysis. Fˉ observably decreases the silica hydrolysis process when presenting on the surface of SG. 展开更多
关键词 Silica Gel DOPING HYDROLYSIS FLUORINE ZIRCONIUM
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Free-space interferometer design for optical frequency dissemination and out-of-loop characterization below the 10^(-21)-level
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作者 THOMAS JÜRSS GESINE GROSCHE SEBASTIAN KOKE 《Photonics Research》 SCIE EI CAS CSCD 2023年第6期1113-1124,共12页
For improving the performance of optical frequency dissemination and the resolution of its out-of-loop(OOL)characterization,we investigate a compact free-space interferometer design in which a monolithic assembly form... For improving the performance of optical frequency dissemination and the resolution of its out-of-loop(OOL)characterization,we investigate a compact free-space interferometer design in which a monolithic assembly forms the reference arm.Two interferometer designs are realized,and their environmental sensitivity is analyzed based on the properties of the materials involved.We elucidate that in these designs the temperature sensitivities of the out-of-loop signal paths are greater than for the reference arm.As the estimated temperature-variation-induced frequency transfer errors are observed to be the relevant limitation,the out-of-loop characterization signal can be regarded as a trustworthy upper limit of the frequency transfer error to a remote place.We demonstrate a fractional frequency transfer uncertainty and OOL characterization resolution of≤2.7×10^(-21)over many measurement runs.With a value of(0.23±1.07)×10^(-22)the weighted mean offset is significantly below the best reported results so far. 展开更多
关键词 CHARACTERIZATION FRACTIONAL LIMIT
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Pseudospin-2 in photonic chiral borophene
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作者 PHILIP MENZ HAISSAM HANAFI +2 位作者 DANIEL LEYKAM JÖRG IMBROCK CORNELIA DENZ 《Photonics Research》 SCIE EI CAS CSCD 2023年第5期869-877,共9页
Pseudospin is an angular momentum degree of freedom introduced in analogy to the real electron spin in the effective massless Dirac-like equation used to describe wave evolution at conical intersections such as the Di... Pseudospin is an angular momentum degree of freedom introduced in analogy to the real electron spin in the effective massless Dirac-like equation used to describe wave evolution at conical intersections such as the Dirac cones of graphene.Here,we study a photonic implementation of a chiral borophene allotrope hosting a pseudospin-2 conical intersection in its energy-momentum spectrum.The presence of this fivefold spectral degeneracy gives rise to quasiparticles with pseudospin up to±2.We report on conical diffraction and pseudospin-orbit interaction of light in photonic chiral borophene,which,as a result of topological charge conversion,leads to the generation of highly charged optical phase vortices. 展开更多
关键词 SPECTRUM CHIRAL MOMENTUM
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一种新型的高频半导体量子点单电子泵 被引量:4
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作者 李玲 Kaestner B +7 位作者 Blumenthal M D Giblin S Janssen T J B M Pepper M Anderson D Jones G Ritchie D A 高洁 《物理学报》 SCIE EI CAS CSCD 北大核心 2008年第3期1878-1885,共8页
除了直流负电压外,还在浅法刻蚀出的GaAs/AlGaAs量子线上的两个金属指形门上分别叠加两个相位相差π的正弦信号,从而对形成量子点的两个势垒作不等幅调制.在无源漏偏压的情况下,通过周期形成的量子点实现了单电子的搬运.由于新的半导体... 除了直流负电压外,还在浅法刻蚀出的GaAs/AlGaAs量子线上的两个金属指形门上分别叠加两个相位相差π的正弦信号,从而对形成量子点的两个势垒作不等幅调制.在无源漏偏压的情况下,通过周期形成的量子点实现了单电子的搬运.由于新的半导体量子点单电子泵不是依赖库仑阻塞效应通过隧穿进行单电子输运,因此,该器件就不会受到固定隧穿时间引起的低工作频率限制.在1.7K温度下,频率达到3GHz仍然可以观测到量子化电流平台,对应的电流值达到0.5nA量级.这种新器件提供了实现高速度、高精度搬运单电子的另一种可能途径. 展开更多
关键词 单电子输运 单电子旋转门 单电子泵 量子化电流平台
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^15N(p,n)^15O反应中子源0°角激发函数测量
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作者 齐波 阮锡超 +11 位作者 姚泽恩 R.Nolte 陈国长 黄翰雄 李永明 周斌 马中原 张雅玲 仲启平 聂阳波 陈效先 周祖英 《原子核物理评论》 CAS CSCD 北大核心 2011年第2期251-255,共5页
利用中国原子能科学研究院HI-13串列加速器上的多探测器快中子飞行时间谱仪,测量了38个不同入射质子能量点下15N(p,n)15O反应0°角方向的激发函数。测量数据用蒙特卡罗方法进行了模拟,以进行中子注量衰减和入射窗厚度的不确定度修... 利用中国原子能科学研究院HI-13串列加速器上的多探测器快中子飞行时间谱仪,测量了38个不同入射质子能量点下15N(p,n)15O反应0°角方向的激发函数。测量数据用蒙特卡罗方法进行了模拟,以进行中子注量衰减和入射窗厚度的不确定度修正。实验在入射质子能量位于6.029—8.056 MeV之间时发现了3个共振峰,这一点与DROSG-2000评价数据及PTB数据相符合,但三家的截面数值存在差异,对这些差异需要作进一步深入探讨。 展开更多
关键词 激发函数 蒙特卡罗方法 评价数据 微分截面
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单频干涉仪瞬时相位计算的神经网络模型 被引量:2
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作者 李直 Konrad Herrmann Frank Pohlenz 《光学学报》 EI CAS CSCD 北大核心 2003年第1期121-124,共4页
用反三角函数表述的单频干涉仪瞬时相位的解析计算模型通常是分段或不连续的,不利于系统性能的综合分析.这里提出了基于神经网络的干涉仪瞬时相位的连续型计算模型,给出了网络学习方法.仿真研究结果表明,该模型对干涉仪瞬时相位的辨识... 用反三角函数表述的单频干涉仪瞬时相位的解析计算模型通常是分段或不连续的,不利于系统性能的综合分析.这里提出了基于神经网络的干涉仪瞬时相位的连续型计算模型,给出了网络学习方法.仿真研究结果表明,该模型对干涉仪瞬时相位的辨识精度优于0.5°,同时对干涉仪的光强波动有良好的鲁棒性;实验结果验证了这一点,为进一步提高单频干涉仪信号处理精度奠定了基础.此外,简要述及了该模型在其他测量领域,特别是速度-加速度测量领域的应用前景. 展开更多
关键词 瞬时相位 计算 神经网络模型 信息处理技术 单频干涉仪 条纹细分 纳米测量
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Near-field holography enhanced with antireflection coatings--an improved method for fabricating diffraction gratings 被引量:1
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作者 李媛芳 陈火耀 +8 位作者 Stefanie Kroker Thomas K?sebier 刘正坤 邱克强 刘颖 Ernst-Bernhard Kley 徐向东 洪义麟 付绍军 《Chinese Optics Letters》 SCIE EI CAS CSCD 2016年第9期1-5,共5页
Near-field holography(NFH), with its virtues of precise critical dimensions and high throughput, has a great potential for the realization of soft x-ray diffraction gratings. We show that NFH with reflections reduce... Near-field holography(NFH), with its virtues of precise critical dimensions and high throughput, has a great potential for the realization of soft x-ray diffraction gratings. We show that NFH with reflections reduced by the integration of antireflective coatings(ARCs) simplifies the NFH process relative to that of setups using refractive index liquids. Based on the proposed NFH with ARCs, gold-coated laminar gratings were fabricated using NFH and subsequent ion beam etching. The efficiency angular spectrum shows that the stray light of the gratings is reduced one level of magnitude by the suppression of interface reflections during NFH. 展开更多
关键词 Antireflection coatings COATINGS Gold coatings HOLOGRAPHY Ion beams Refractive index Spectrum analysis Stray light X ray diffraction
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Directly addressable GaN-based nano-LED arrays: fabrication and electro-optical characterization 被引量:2
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作者 Daria D.Bezshlyakh Hendrik Spende +7 位作者 Thomas Weimann Peter Hinze Steffen Bornemann Jan Gulink Joan Canals Joan Daniel Prades Angel Dieguez Andreas Waag 《Microsystems & Nanoengineering》 EI CSCD 2020年第1期275-284,共10页
The rapid development of display technologies has raised interest in arrays of self-emitting,individually controlled light sources atthe microscale.Gallium nitride(GaN)micro-light-emitting diode(LED)technology meets t... The rapid development of display technologies has raised interest in arrays of self-emitting,individually controlled light sources atthe microscale.Gallium nitride(GaN)micro-light-emitting diode(LED)technology meets this demand.However,the current technology is not suitable for the fabrication of arrays of submicron light sources that can be controlled individually.Our approach is based on nanoLED arrays that can directly address each array element and a self-pitch with dimensions below the wavelength of light.The design and fabrication processes are explained in detail and possess two geometries:a 6×6 array with 400 nm LEDs and a 2×32 line array with 200 nm LEDs.These nanoLEDs are developed as core elements of a novel on-chip super-resolution microscope.GaN technology,based on its physical properties,is an ideal platform for such nanoLEDs. 展开更多
关键词 ARRAYS GaN optical
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Dimensional characterization of cadmium selenide nanocrystals via indirect Fourier transform evaluation of small-angle X-ray scattering data
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作者 Julian Cedric Porsiel Bilal Temel +2 位作者 Alfred Schirmacher Egbert Buhr Georg Garnweitner 《Nano Research》 SCIE EI CAS CSCD 2019年第11期2849-2857,共9页
The correlation of single-particle imaging and absorption spectroscopy made the development of sizing curves possible and enabled rapid size determination of semiconductor nanocrystals based solely on optical properti... The correlation of single-particle imaging and absorption spectroscopy made the development of sizing curves possible and enabled rapid size determination of semiconductor nanocrystals based solely on optical properties.The increasing demand and production of such materials has resulted in a question of comparability between existing models and adequate volume-weighted size-determining measurement techniques.Small-angle X-ray scattering(SAXS)is a well-established method for obtaining nanostructural information from particle systems while operating sample quantities up to a commercial scale with a large amount of statistically based data.This work utilizes laboratory SAXS to characterize cadmium selenide nanocrystals with band edge energies between 1.97 and 3.08 eV.The evaluation of the scattering patterns is based on an indirect Fourier transformation(IFT),while dimensional parameters are derived from the model-free pair distance distribution functions(Dmode and Dg),as well as the modeled volume(Dv)and number(Dn)-weighted size-density distributions.We find that comparable data from D̅n agree well with existing X-ray diffraction(XRD)and with transmission electron microscopy(TEM)results described in literature;this qualifies SAXS as an equivalent integral characterization method.Although based on an estimate,the radius of gyration yields equivalent accurate results.Additionally,corresponding volume-weighted data are shown that can be useful when transferring information to other techniques.Dmode parametrization represents the largest estimated size of the sample and implies that particles interact and deviate from the spherical morphology,whereas Dv demonstrates results not considering such effects.A full set of the parameters discussed quantifies the quality of a sample. 展开更多
关键词 quantum dots small angle scattering indirect Fourier transform transmission electron microscopy optical absorption spectroscopy particle size distribution
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Analysis of Line-Edge Roughness Using EUV Scatterometry
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作者 Analía Fernández Herrero Frank Scholze +1 位作者 Gaoliang Dai Victor Soltwisch 《Nanomanufacturing and Metrology》 EI 2022年第2期149-158,共10页
Smaller and more complex three-dimensional periodic nanostructures are part of the next generation of integrated electronic circuits.Additionally,decreasing the dimensions of nanostructures increases the effect of lin... Smaller and more complex three-dimensional periodic nanostructures are part of the next generation of integrated electronic circuits.Additionally,decreasing the dimensions of nanostructures increases the effect of line-edge roughness on the performance of the nanostructures.Efficient methods for characterizing three-dimensional nanostructures are required for process control.Here,extreme-ultraviolet(EUV)scatterometry is exploited for the analysis of line-edge roughness from periodic nanostructures.In line with previous observations,differences are observed between line edge and line width roughness.The angular distribution of the diffuse scattering is an interplay of the line shape,the height of the structure,the roughness along the line,and the correlation between the lines.Unfortunately,existing theoretical methods for characterizing nanostructures using scatterometry do not cover all these aspects.Examples are shown here and the demands for future development of theoretical approaches for computing the angular distribution of the scattered X-rays are discussed. 展开更多
关键词 Line-edge roughness LER LWR EUV scatterometry Debye-Waller factor
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Comparison of EUV Photomask Metrology Between CD-AFM and TEM
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作者 Gaoliang Dai Kai Hahm +1 位作者 Lipfert Sebastian Markus Heidelmann 《Nanomanufacturing and Metrology》 EI 2022年第2期91-100,共10页
Accurate metrology of extreme ultraviolet (EUV) photomask is a crucial task. In this paper, two different methods for reference EUV photomask metrology are compared. One is the critical dimension atomic force microsco... Accurate metrology of extreme ultraviolet (EUV) photomask is a crucial task. In this paper, two different methods for reference EUV photomask metrology are compared. One is the critical dimension atomic force microscopy (CD-AFM). In the measurements, the contribution of its AFM tip geometry is usually the dominant error source, as measured AFM images are the dilated results of measured structures by the AFM tip geometry. To solve this problem, a bottom-up approach has been applied in calibrating the (effective) AFM tip geometry where the result is traceably calibrated to the lattice constant of silicon crystals. The other is transmission electron microscopy (TEM). For achieving measurement traceability, structure features are measured in pairs in TEM images;thus the distance between the structure pair calibrated by a metrological AFM in prior can be applied to determine the magnification of the TEM image. In this study, selected photomask structures are calibrated by the CD-AFM, and then sample prepared and measured by high-resolution TEM nearly at the same location. The results are then compared. Of six feature groups compared, the results agree well within the measurement uncertainty, indicating excellent performance of the developed methodology. This research supports the development of a photomask standard, which is applied as a “reference ruler” with improved low measurement uncertainty in photomask fabs. 展开更多
关键词 Extreme ultraviolet(EUV)photomask standard Traceable calibration METROLOGY Critical dimension(CD) Atomic force microscopy(AFM) Transmission electron microscopy(TEM) High precision Low measurement uncertainty
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