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Behavior of Deuterium in Boron Films Covered by Oxygen-Containing Layer
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作者 WANG Mingxu H. Miyauchi +4 位作者 T. Nakahata Y. Nishikawa Y. Oya N. Noda K. Okuno 《Southwestern Institute of Physics Annual Report》 2004年第1期50-51,共2页
Boron is an attractive candidate of the first wall coating materials in fusion reactors. The behavior of deuterium implanted into boron films has been studied . This paper reports the effect of thin oxygen-containing ... Boron is an attractive candidate of the first wall coating materials in fusion reactors. The behavior of deuterium implanted into boron films has been studied . This paper reports the effect of thin oxygen-containing boron layer on the behavior of deuterium im- planted into boron film by X-ray photoelectron spectroscopy (XPS) and thermal desorption spectroscopy (TDS). 展开更多
关键词 Boron films Coating materials
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