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Optimum Indium Concentration for Growth of 1.3 μm InAs/InxGa1-xAs Quantum Dots in a Well 被引量:1
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作者 王茺 刘昭麟 +4 位作者 陈雪梅 夏长生 张曙 杨宇 陆卫 《Chinese Physics Letters》 SCIE CAS CSCD 2007年第11期3260-3263,共4页
Five InAs/InxGa1-xAs quantum dots in a well (DWELL) with different indium concentration x are grown by solid source molecular beam epitaxy. The high quantum dot density is observed in the InAs/In0.3Ga0.7As DWELL. Th... Five InAs/InxGa1-xAs quantum dots in a well (DWELL) with different indium concentration x are grown by solid source molecular beam epitaxy. The high quantum dot density is observed in the InAs/In0.3Ga0.7As DWELL. The photoluminescence (PL) experiments indicate that the ground state peaks of InAs/In0.15 Ga0.85As and InAs/In0.22 Ga0.78As DWELLs shift to 1.31 and 1.33μm, respectively. The optical properties are investigated by using the PL and piezoreflectance spectroscope methods. An abnormal blue shift has been observed with the further increase of x from 0.22 to 0.30. 展开更多
关键词 coated conductor buffer layer self-epitaxy CeO2
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