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Characterization of Interface State Density of Ni/p-GaN Structures by Capacitance/Conductance-Voltage-Frequency Measurements 被引量:1
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作者 朱志甫 张贺秋 +4 位作者 梁红伟 彭新村 邹继军 汤彬 杜国同 《Chinese Physics Letters》 SCIE CAS CSCD 2017年第9期82-86,共5页
For the frequency range of I kHz-lOMHz, the interface state density of Ni contacts on p-GaN is studied using capacitance-voltage (C-V) and conductance-frequency-voltage (G-f-V) measurements at room temperature. To... For the frequency range of I kHz-lOMHz, the interface state density of Ni contacts on p-GaN is studied using capacitance-voltage (C-V) and conductance-frequency-voltage (G-f-V) measurements at room temperature. To obtain the real capacitance and interface state density of the Ni/p-GaN structures, the effects of the series resistance (Rs) on high-frequency (SMHz) capacitance values measured at a reverse and a forward bias are investigated. The mean interface state densities obtained from the CHF-CLF capacitance and the conductance method are 2 ×1012 e V-1 cm-2 and 0.94 × 1012 eV-1 cm-2, respectively. Furthermore, the interface state density derived from the conductance method is higher than that reported from the Ni/n-GaN in the literature, which is ascribed to a poor crystal quality and to a large defect density of the Mg-doped p-GaN. 展开更多
关键词 GaN Characterization of Interface State Density of Ni/p-GaN Structures by Capacitance/Conductance-Voltage-Frequency Measurements NI
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Factors Affecting the Top Stripping of GaAs Microwire Array Fabricated by Inductively Coupled Plasma Etching
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作者 程滢 邹继军 +5 位作者 万明 王炜路 彭新村 冯林 邓文娟 朱志甫 《Chinese Physics Letters》 SCIE CAS CSCD 2015年第5期150-152,共3页
The effects of different masks and patterns on the top stripping of GaAs microwire arrays fabricated by inductively coupled plasma etching for 20min and 40min are investigated. The results show that the mask layer is ... The effects of different masks and patterns on the top stripping of GaAs microwire arrays fabricated by inductively coupled plasma etching for 20min and 40min are investigated. The results show that the mask layer is the main affect of the top stripping of the GaAs microwires in 40min. Increasing the mask layers and reducing the photoresist layers can prevent top stripping and result in a suitable GaAs microwire array. 展开更多
关键词 SEM Factors Affecting the Top Stripping of GaAs Microwire Array Fabricated by Inductively Coupled Plasma Etching
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Optimal allocation of hybrid energy storage for microgrids based on multi-attribute utility theory 被引量:11
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作者 Xiaoshan FENG Jie GU Xuefei GUAN 《Journal of Modern Power Systems and Clean Energy》 SCIE EI 2018年第1期107-117,共11页
To satisfy the requirements of high energy density,high power density,quick response and long lifespan for energy storage systems(ESSs),hybrid energy storage systems(HESSs)have been investigated for their complementar... To satisfy the requirements of high energy density,high power density,quick response and long lifespan for energy storage systems(ESSs),hybrid energy storage systems(HESSs)have been investigated for their complementary characteristics of‘high energy density components’and‘high power density components’.To optimize HESS combinations,related indices such as annual cost,fluctuation smoothing ability as well as safety and environmental impact have to be evaluated.The multiattribute utility method investigated in this paper is aimed to draw an overall conclusion for HESS allocation optimization in microgrid.Building on multi-attribute utility theory,this method has significant advantages in solving the incommensurability and contradiction among multiple attributes.Instead of determining the weights of various attributes subjectively,when adopting the multi-attribute utility method,the characteristics of attributes and the relation among them can be investigated objectively.Also,the proper utility function and merging rules are identified to achieve the aggregate utility which can reflect comprehensive qualities of HESSs. 展开更多
关键词 Hybrid energy STORAGE system(HESS) Capacity optimization MULTI-ATTRIBUTE UTILITY theory HESS COMBINATION evaluation UTILITY function
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